Predicted protein targets (top 13)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | KDM4E | B2RXH2 | 1/20 | 0.49 |
| ▸ | L3MBTL1 | Q9Y468 | 2/20 | 0.48 |
| ▸ | ALDH1A1 | P00352 | 2/20 | 0.48 |
| ▸ | LMNA | P02545 | 1/20 | 0.48 |
| ▸ | GLA | P06280 | 1/20 | 0.45 |
| ▸ | SMN1; SMN2 | Q16637 | 1/20 | 0.45 |
| ▸ | POLB | P06746 | 2/20 | 0.45 |
| ▸ | CYP1A2 | P05177 | 1/20 | 0.45 |
| ▸ | HSD17B10 | Q99714 | 1/20 | 0.44 |
| ▸ | MAPK1 | P28482 | 1/20 | 0.44 |
| ▸ | ALOX12 | P18054 | 1/20 | 0.44 |
| ▸ | NPSR1 | Q6W5P4 | 1/20 | 0.44 |
| ▸ | TSHR | P16473 | 1/20 | 0.43 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL14620107 | 0.81 | KDM4E (0.51) | KDM4EL3MBTL1ALDH1A1LMNACYP1A2 | |
| SCHEMBL7533236 | 0.81 | KDM4E (0.51) | KDM4EL3MBTL1ALDH1A1LMNAGLA | |
| SCHEMBL7531474 | 0.80 | L3MBTL1 (0.50) | KDM4EL3MBTL1ALDH1A1LMNAGLA | |
| SCHEMBL7528390 | 0.77 | VDR (0.49) | KDM4EL3MBTL1ALDH1A1LMNASMN1; SMN2 | |
| SCHEMBL14620106 | 0.75 | KMT2A (0.51) | KDM4EL3MBTL1ALDH1A1LMNASMN1; SMN2 | |
| SCHEMBL27370760 | 0.73 | ALDH1A1 (0.66) | KDM4EL3MBTL1ALDH1A1LMNACYP1A2 | |
| SCHEMBL14588659 | 0.70 | ALDH1A1 (0.63) | KDM4EL3MBTL1ALDH1A1LMNASMN1; SMN2 | |
| SCHEMBL13319273 | 0.70 | MEN1 (0.56) | KDM4EL3MBTL1ALDH1A1LMNASMN1; SMN2 | |
| SCHEMBL2731836 | 0.69 | TDP1 (0.62) | KDM4EL3MBTL1ALDH1A1LMNASMN1; SMN2 | |
| SCHEMBL2611780 | 0.69 | KDM4E (0.50) | KDM4EL3MBTL1ALDH1A1LMNASMN1; SMN2 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 6 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-0410606-B1 | Siloxane polymers and positive working light-sensitive compositions comprising the same | FUJI PHOTO FILM CO LTD (JP) | 1996-11-13 | — | — | EP | disclosed |
| US-5338640-A | Alkali-developable; resistance to oxygen etching; multilayer photoresists; photolithographic printing plates | FUJI PHOTO FILM CO., LTD. (JP) | 1994-08-16 | — | — | US | disclosed |
| US-5276124-A | Ladder polymers, photoresists, lithographic printing plates | FUJI PHOTO FILM CO., LTD. (JP) | 1994-01-04 | — | — | US | disclosed |
| US-5252686-A | Siloxane polymers and positive working light-sensitive compositions comprising the same | FUJI PHOTO FILM CO., LTD. (JP) | 1993-10-12 | — | — | US | disclosed |
| US-5216105-A | SILICONE POLYMERS AND POSITIVE WORKING LIGHT-SENSITIVE COMPOSITIONS COMPRISING THE SAME | FUJI PHOTO FILM CO., LTD. (JP) | 1993-06-01 | — | — | US | disclosed |
| EP-0410606-A2 | Siloxane polymers and positive working light-sensitive compositions comprising the same | FUJI PHOTO FILM CO., LTD. (JP) | 1991-01-30 | — | — | EP | disclosed |