SCHEMBL7533236

SCHEMBL7533236

Cc1nc2ccccc2c(=O)n1OS(=O)(=O)c1ccccc1

nearest known ligand 0.56

Predicted protein targets (top 16)

geneUniProtsupporting neighboursconfidence
KDM4E B2RXH2 1/20 0.51
CYP1A2 P05177 2/20 0.50
ALDH1A1 P00352 2/20 0.47
L3MBTL1 Q9Y468 2/20 0.47
LMNA P02545 1/20 0.47
CYP2C9 P11712 1/20 0.45
CYP2C19 P33261 1/20 0.45
MEN1 O00255 1/20 0.45
KMT2A Q03164 1/20 0.45
SMN1; SMN2 Q16637 2/20 0.44
GLA P06280 1/20 0.44
TSHR P16473 1/20 0.44
GAA P10253 1/20 0.44
ALOX15 P16050 1/20 0.44
POLB P06746 1/20 0.44
HTT P42858 1/20 0.43

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL7528390 0.93 VDR (0.49) KDM4ECYP1A2ALDH1A1L3MBTL1LMNA
SCHEMBL14620106 0.91 KMT2A (0.51) KDM4ECYP1A2ALDH1A1L3MBTL1LMNA
SCHEMBL9811319 0.84 KMT2A (0.52) KDM4EALDH1A1LMNAMEN1KMT2A
SCHEMBL14620107 0.83 KDM4E (0.51) KDM4ECYP1A2ALDH1A1L3MBTL1LMNA
SCHEMBL7531474 0.82 L3MBTL1 (0.50) KDM4ECYP1A2ALDH1A1L3MBTL1LMNA
SCHEMBL9013659 0.81 KDM4E (0.49) KDM4ECYP1A2ALDH1A1L3MBTL1LMNA
SCHEMBL7534483 0.80 SMN1; SMN2 (0.53) KDM4EALDH1A1LMNAMEN1KMT2A
SCHEMBL14620230 0.80 CYP1A2 (0.61) KDM4ECYP1A2ALDH1A1LMNACYP2C9
SCHEMBL14620220 0.78 F11 (0.43) CYP1A2ALDH1A1LMNACYP2C9CYP2C19
SCHEMBL9811167 0.78 NPC1 (0.56) KDM4ELMNAMEN1KMT2ASMN1; SMN2

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 8 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-7157205-B2 Intermediate layer composition for multilayer resist process, pattern-forming process using the same, and laminate FUJI PHOTO FILM CO., LTD. (JP) 2007-01-02 US disclosed
EP-0801329-B1 RADIATION-SENSITIVE COMPOSITION AND RECORDING MEDIUM PRODUCED THEREFROM CLARIANT FINANCE BVI LTD (VG) 2002-03-27 EP disclosed
US-6110639-A Radiation-sensitive composition and recording medium using the same HOECHST JAPAN LIMITED (JP) 2000-08-29 US disclosed
EP-0458485-B1 Image forming layer FUJI PHOTO FILM CO LTD (JP) 1998-07-29 EP disclosed
EP-0801329-A1 RADIATION-SENSITIVE COMPOSITION AND RECORDING MEDIUM PRODUCED THEREFROM HOECHST JAPAN LIMITED (JP) 1997-10-15 EP disclosed
US-5395733-A Unsaturated polymer layer that can be decarboxylated on exposure to light and sensitizers FUJI PHOTO FILM CO., LTD. (JP) 1995-03-07 US disclosed
EP-0458485-A2 Image forming layer Fuji Photo Film Co., Ltd. (JP) 1991-11-27 EP disclosed
US-4946761-A POLYMER CONTAINING CARBOXYL END GROUPS FUJI PHOTO FILM CO., LTD. (JP) 1990-08-07 US disclosed