SCHEMBL14701243

SCHEMBL14701243

C=C(C)C(=O)OCOC(=O)c1c2ccccc2c(NS(=O)(=O)C(F)(F)F)c2ccccc12

nearest known ligand 0.35

Predicted protein targets (top 14)

geneUniProtsupporting neighboursconfidence
MAPK1 P28482 1/20 0.35
SMN1; SMN2 Q16637 1/20 0.35
KDM4E B2RXH2 2/20 0.34
MEN1 O00255 1/20 0.34
ALDH1A1 P00352 1/20 0.34
HPGD P15428 1/20 0.34
KMT2A Q03164 1/20 0.34
L3MBTL1 Q9Y468 1/20 0.34
TXNRD1 Q16881 1/20 0.32
LMNA P02545 1/20 0.31
MAPT P10636 1/20 0.31
ALOX12 P18054 1/20 0.31
CA2 P00918 1/20 0.30
GAA P10253 1/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL14701264 0.81 KMT2A (0.34) MAPK1SMN1; SMN2KDM4EMEN1KMT2A
SCHEMBL14701246 0.78 KDM4E (0.33) KDM4EMEN1ALDH1A1HPGDKMT2A
SCHEMBL14701252 0.77 ELANE (0.33) ALDH1A1MAPT
SCHEMBL14701229 0.77 POLB (0.39) MAPK1SMN1; SMN2KDM4EMEN1ALDH1A1
SCHEMBL14701232 0.77 ALDH1A1 (0.38) KDM4EMEN1ALDH1A1HPGDKMT2A
SCHEMBL14701245 0.75 KDM4E (0.32) MAPK1KDM4EMEN1ALDH1A1HPGD
SCHEMBL14701231 0.73 ALDH1A1 (0.46) MAPK1KDM4EMEN1ALDH1A1HPGD
SCHEMBL2876125 0.68 TSHR (0.33) MAPK1SMN1; SMN2ALDH1A1
SCHEMBL28886899 0.68 TSHR (0.53) MAPK1ALDH1A1L3MBTL1LMNACA2
SCHEMBL14701275 0.68 THRB (0.35) MAPK1SMN1; SMN2CA2

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 5 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-9040225-B2 Developable bottom antireflective coating composition and pattern forming method using thereof INTERNATIONAL BUSINESS MACHINES CORPORATION (US) 2015-05-26 US disclosed
US-8999624-B2 Developable bottom antireflective coating composition and pattern forming method using thereof INTERNATIONAL BUSINESS MACHINES CORPORATION (US) 2015-04-07 US disclosed
US-20150050601-A1 DEVELOPABLE BOTTOM ANTIREFLECTIVE COATING COMPOSITION AND PATTERN FORMING METHOD USING THEREOF GLOBALFOUNDRIES U.S. INC. 2015-02-19 US disclosed
US-8715907-B2 Developable bottom antireflective coating compositions for negative resists INTERNATIONAL BUSINESS MACHINES CORPORATION (US) 2014-05-06 US disclosed
US-20130040238-A1 DEVELOPABLE BOTTOM ANTIREFLECTIVE COATING COMPOSITIONS FOR NEGATIVE RESISTS INTERNATIONAL BUSINESS MACHINES CORPORATION (US) 2013-02-14 US disclosed