SCHEMBL14701246

SCHEMBL14701246

C=C(C)C(=O)OCOC(=O)c1c2ccccc2c(C(C)(O)C(F)(F)F)c2ccccc12

nearest known ligand 0.33

Predicted protein targets (top 15)

geneUniProtsupporting neighboursconfidence
KDM4E B2RXH2 2/20 0.33
ALDH1A1 P00352 2/20 0.33
MEN1 O00255 1/20 0.33
HPGD P15428 1/20 0.33
KMT2A Q03164 1/20 0.33
L3MBTL1 Q9Y468 1/20 0.33
TXNRD1 Q16881 1/20 0.31
ABCC9 O60706 2/20 0.31
ABCC8 Q09428 2/20 0.31
KCNJ11 Q14654 2/20 0.31
KCNJ8 Q15842 2/20 0.31
POLB P06746 1/20 0.31
MAPT P10636 1/20 0.31
GPR55 Q9Y2T6 1/20 0.31
TSHR P16473 1/20 0.31

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL14701245 0.88 KDM4E (0.32) KDM4EALDH1A1MEN1HPGDKMT2A
SCHEMBL14701232 0.79 ALDH1A1 (0.38) KDM4EALDH1A1MEN1HPGDKMT2A
SCHEMBL14701229 0.79 POLB (0.39) KDM4EALDH1A1MEN1HPGDKMT2A
SCHEMBL14701251 0.79 KCNJ11 (0.35) KDM4EKMT2AABCC9ABCC8KCNJ11
SCHEMBL14701243 0.78 MAPK1 (0.35) KDM4EALDH1A1MEN1HPGDKMT2A
SCHEMBL14701231 0.76 ALDH1A1 (0.46) KDM4EALDH1A1MEN1HPGDKMT2A
SCHEMBL14701252 0.75 ELANE (0.33) ALDH1A1POLBMAPTTSHR
SCHEMBL14701241 0.71 ADRB2 (0.33) KDM4EALDH1A1HPGDMAPTTSHR
SCHEMBL28886899 0.70 TSHR (0.53) ALDH1A1L3MBTL1TSHR
SCHEMBL18906408 0.69 THRB (0.42) KDM4EALDH1A1HPGDPOLBTSHR

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 5 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-9040225-B2 Developable bottom antireflective coating composition and pattern forming method using thereof INTERNATIONAL BUSINESS MACHINES CORPORATION (US) 2015-05-26 US disclosed
US-8999624-B2 Developable bottom antireflective coating composition and pattern forming method using thereof INTERNATIONAL BUSINESS MACHINES CORPORATION (US) 2015-04-07 US disclosed
US-20150050601-A1 DEVELOPABLE BOTTOM ANTIREFLECTIVE COATING COMPOSITION AND PATTERN FORMING METHOD USING THEREOF GLOBALFOUNDRIES U.S. INC. 2015-02-19 US disclosed
US-8715907-B2 Developable bottom antireflective coating compositions for negative resists INTERNATIONAL BUSINESS MACHINES CORPORATION (US) 2014-05-06 US disclosed
US-20130040238-A1 DEVELOPABLE BOTTOM ANTIREFLECTIVE COATING COMPOSITIONS FOR NEGATIVE RESISTS INTERNATIONAL BUSINESS MACHINES CORPORATION (US) 2013-02-14 US disclosed