SCHEMBL14749040

SCHEMBL14749040

O=C1OC(c2ccc(O)c3ccccc23)(c2ccc(O)c3ccccc23)c2ccc(F)cc21

nearest known ligand 0.59

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
GNG2 P59768 1/20 0.47
GNB1 P62873 1/20 0.47
MAPT P10636 5/20 0.44
LMNA P02545 4/20 0.44
FTO Q9C0B1 4/20 0.44
MEN1 O00255 3/20 0.44
KMT2A Q03164 3/20 0.44
TDP1 Q9NUW8 3/20 0.44
POLB P06746 2/20 0.44
NPSR1 Q6W5P4 2/20 0.44
CYP2C19 P33261 2/20 0.44
GPR55 Q9Y2T6 2/20 0.44
ALOX12 P18054 1/20 0.44
HPGD P15428 1/20 0.44
HTT P42858 1/20 0.44
RECQL P46063 1/20 0.44
BLM P54132 1/20 0.44
SMAD3 P84022 1/20 0.44
PRMT1 Q99873 1/20 0.44
ACE2 Q9BYF1 1/20 0.44

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL14749055 0.86 FTO (0.56) GNG2GNB1MAPTLMNAFTO
SCHEMBL29381676 0.84 GNG2 (0.64) GNG2GNB1MAPTLMNAFTO
SCHEMBL63922 0.84 GNG2 (0.64) GNG2GNB1MAPTLMNAFTO
SCHEMBL14749085 0.83 LMNA (0.50) GNG2GNB1MAPTLMNAFTO
SCHEMBL23604740 0.81 GAA (0.50) GNG2GNB1MAPTLMNAFTO
SCHEMBL16305290 0.81 GNG2 (0.54) GNG2GNB1MAPTLMNAFTO
SCHEMBL14749066 0.80 MEN1 (0.47) GNG2GNB1MAPTLMNAFTO
SCHEMBL14750979 0.80 GNG2 (0.44) GNG2GNB1MAPTLMNAFTO
SCHEMBL14749064 0.79 GNG2 (0.43) GNG2GNB1MAPTLMNAFTO
SCHEMBL14749014 0.78 GNG2 (0.56) GNG2GNB1MAPTLMNAFTO

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 3 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-8574816-B2 Positive resist composition and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2013-11-05 US disclosed
US-20130056653-A1 POSITIVE RESIST COMPOSITION AND PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2013-03-07 US disclosed
US-20130056653-A1 POSITIVE RESIST COMPOSITION AND PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2013-03-07 US disclosed