SCHEMBL14749066

SCHEMBL14749066

COc1ccc2c(c1)C(=O)OC2(c1ccc(O)c2ccccc12)c1ccc(O)c2ccccc12

nearest known ligand 0.55

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
MEN1 O00255 5/20 0.47
KMT2A Q03164 5/20 0.47
GAA P10253 2/20 0.47
MAPT P10636 7/20 0.44
LMNA P02545 5/20 0.44
POLB P06746 3/20 0.44
NPSR1 Q6W5P4 2/20 0.44
GNG2 P59768 1/20 0.44
GNB1 P62873 1/20 0.44
ALOX12 P18054 1/20 0.44
GPR55 Q9Y2T6 1/20 0.44
HTT P42858 4/20 0.44
ALDH1A1 P00352 3/20 0.44
GUSB P08236 1/20 0.44
USP2 O75604 1/20 0.44
SMN1; SMN2 Q16637 3/20 0.43
TDP1 Q9NUW8 2/20 0.43
L3MBTL1 Q9Y468 2/20 0.43
KDM4E B2RXH2 3/20 0.42
ALOX15 P16050 3/20 0.42

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL14749085 0.83 LMNA (0.50) MEN1KMT2AGAAMAPTLMNA
SCHEMBL14749055 0.82 FTO (0.56) MEN1KMT2AMAPTLMNAPOLB
SCHEMBL63922 0.81 GNG2 (0.64) MEN1KMT2AGAAMAPTLMNA
SCHEMBL29381676 0.81 GNG2 (0.64) MEN1KMT2AGAAMAPTLMNA
SCHEMBL14749040 0.80 GNG2 (0.47) MEN1KMT2AMAPTLMNAPOLB
SCHEMBL23604740 0.78 GAA (0.50) MEN1KMT2AGAAMAPTLMNA
SCHEMBL14750979 0.77 GNG2 (0.44) MEN1KMT2AMAPTLMNAPOLB
SCHEMBL14749064 0.76 GNG2 (0.43) MEN1KMT2AGAAMAPTLMNA
SCHEMBL14749014 0.75 GNG2 (0.56) MEN1KMT2AGAAMAPTLMNA
SCHEMBL20194305 0.75 GNG2 (0.57) MEN1KMT2AMAPTLMNAPOLB

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 3 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-8574816-B2 Positive resist composition and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2013-11-05 US disclosed
US-20130056653-A1 POSITIVE RESIST COMPOSITION AND PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2013-03-07 US disclosed
US-20130056653-A1 POSITIVE RESIST COMPOSITION AND PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2013-03-07 US disclosed