SCHEMBL14749064

SCHEMBL14749064

O=C1OC(c2ccc(O)c3ccccc23)(c2ccc(O)c3ccccc23)c2ccc([N+](=O)[O-])cc21

nearest known ligand 0.54

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
GNG2 P59768 1/20 0.43
GNB1 P62873 1/20 0.43
CTSB P07858 1/20 0.42
ALDH1A1 P00352 2/20 0.41
MAPT P10636 4/20 0.40
MEN1 O00255 4/20 0.40
KMT2A Q03164 4/20 0.40
PTPRC P08575 2/20 0.40
S100A4 P26447 2/20 0.40
HPGD P15428 2/20 0.40
LMNA P02545 2/20 0.40
POLB P06746 2/20 0.40
TDP1 Q9NUW8 2/20 0.40
BCHE P06276 1/20 0.40
ACHE P22303 1/20 0.40
CES1 P23141 1/20 0.40
ALOX12 P18054 1/20 0.40
NPSR1 Q6W5P4 1/20 0.40
GPR55 Q9Y2T6 1/20 0.40
CYP2C19 P33261 1/20 0.40

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL14749055 0.81 FTO (0.56) GNG2GNB1ALDH1A1MAPTMEN1
SCHEMBL29381676 0.80 GNG2 (0.64) GNG2GNB1ALDH1A1MAPTMEN1
SCHEMBL63922 0.80 GNG2 (0.64) GNG2GNB1ALDH1A1MAPTMEN1
SCHEMBL14749085 0.79 LMNA (0.50) GNG2GNB1ALDH1A1MAPTMEN1
SCHEMBL14749040 0.79 GNG2 (0.47) GNG2GNB1ALDH1A1MAPTMEN1
SCHEMBL3708020 0.78 FTO (0.66) ALDH1A1MAPTMEN1KMT2AHPGD
SCHEMBL23604740 0.77 GAA (0.50) GNG2GNB1MAPTMEN1KMT2A
SCHEMBL9538480 0.76 FTO (0.46) GNG2GNB1ALDH1A1MAPTMEN1
SCHEMBL14750979 0.76 GNG2 (0.44) GNG2GNB1ALDH1A1MAPTMEN1
SCHEMBL14749066 0.76 MEN1 (0.47) GNG2GNB1ALDH1A1MAPTMEN1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 3 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-8574816-B2 Positive resist composition and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2013-11-05 US disclosed
US-20130056653-A1 POSITIVE RESIST COMPOSITION AND PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2013-03-07 US disclosed
US-20130056653-A1 POSITIVE RESIST COMPOSITION AND PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2013-03-07 US disclosed