Predicted protein targets (top 5)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | CA2 | P00918 | 2/20 | 0.38 |
| ▸ | CA1 | P00915 | 1/20 | 0.36 |
| ▸ | GPR3 | P46089 | 1/20 | 0.35 |
| ▸ | PTPN1 | P18031 | 1/20 | 0.32 |
| ▸ | ACHE | P22303 | 1/20 | 0.31 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL1483805 | 0.83 | CA2 (0.35) | CA2CA1GPR3 | |
| SCHEMBL2475711 | 0.81 | VDR (0.36) | CA2CA1GPR3ACHE | |
| SCHEMBL31121006 | 0.81 | PTGS2 (0.31) | — | |
| Trifluoromethanesulfonic Acid SCHEMBL37032 | 0.80 | GPR3 (0.50) | CA2CA1GPR3PTPN1ACHE | |
| Trifluoromethanesulfonic Acid SCHEMBL31155703 | 0.80 | GPR3 (0.50) | CA2CA1GPR3PTPN1ACHE | |
| Trifluoromethanesulfonic Acid SCHEMBL10008137 | 0.78 | GPR3 (0.48) | CA2CA1GPR3PTPN1ACHE | |
| Trifluoromethanesulfonic Acid SCHEMBL6118365 | 0.78 | GPR3 (0.48) | CA2CA1GPR3PTPN1ACHE | |
| SCHEMBL501411 | 0.78 | GPR3 (0.35) | CA2CA1GPR3PTPN1 | |
| SCHEMBL501906 | 0.76 | KMT2A (0.36) | — | |
| SCHEMBL246810 | 0.75 | HTT (0.33) | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-8940471-B2 | Actinic-ray- or radiation-sensitive resin composition and method of forming pattern using the composition | FUJIFILM CORPORATION (JP) | 2015-01-27 | — | — | US | disclosed |
| US-20110076615-A1 | ACTINIC-RAY- OR RADIATION-SENSITIVE RESIN COMPOSITION AND METHOD OF FORMING PATTERN USING THE COMPOSITION | FUJIFILM CORPORATION (JP) | 2011-03-31 | — | — | US | disclosed |