Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | GPR3 | P46089 | 1/20 | 0.35 |
| ▸ | PTPN1 | P18031 | 1/20 | 0.35 |
| ▸ | RIPK1 | Q13546 | 1/20 | 0.33 |
| ▸ | HSD11B1 | P28845 | 1/20 | 0.32 |
| ▸ | CA2 | P00918 | 2/20 | 0.32 |
| ▸ | CA9 | Q16790 | 2/20 | 0.32 |
| ▸ | CA1 | P00915 | 1/20 | 0.32 |
| ▸ | CA5A | P35218 | 1/20 | 0.32 |
| ▸ | CES1 | P23141 | 1/20 | 0.31 |
| ▸ | NR1I2 | O75469 | 1/20 | 0.31 |
| ▸ | ABCC9 | O60706 | 1/20 | 0.31 |
| ▸ | ABCC8 | Q09428 | 1/20 | 0.31 |
| ▸ | KCNJ11 | Q14654 | 1/20 | 0.31 |
| ▸ | KCNJ8 | Q15842 | 1/20 | 0.31 |
| ▸ | MEN1 | O00255 | 1/20 | 0.31 |
| ▸ | CYP1A2 | P05177 | 1/20 | 0.31 |
| ▸ | CYP3A4 | P08684 | 1/20 | 0.31 |
| ▸ | CYP2D6 | P10635 | 1/20 | 0.31 |
| ▸ | TSHR | P16473 | 1/20 | 0.31 |
| ▸ | CYP2C19 | P33261 | 1/20 | 0.31 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL1484122 | 0.83 | PTPN1 (0.33) | GPR3PTPN1HSD11B1CA2CA9 | |
| Trifluoromethanesulfonic Acid SCHEMBL31155703 | 0.81 | GPR3 (0.50) | GPR3PTPN1HSD11B1CA2CA9 | |
| Trifluoromethanesulfonic Acid SCHEMBL37032 | 0.81 | GPR3 (0.50) | GPR3PTPN1HSD11B1CA2CA9 | |
| SCHEMBL2437867 | 0.80 | GPR3 (0.40) | GPR3PTPN1HSD11B1CA2CA9 | |
| Trifluoromethanesulfonic Acid SCHEMBL6118365 | 0.80 | GPR3 (0.48) | GPR3PTPN1HSD11B1CA2CA9 | |
| Trifluoromethanesulfonic Acid SCHEMBL10008137 | 0.80 | GPR3 (0.48) | GPR3PTPN1HSD11B1CA2CA9 | |
| SCHEMBL29745863 | 0.80 | GPR3 (0.40) | GPR3PTPN1HSD11B1CA2CA9 | |
| Trifluoromethanesulfonic Acid SCHEMBL3249775 | 0.79 | GPR3 (0.44) | GPR3PTPN1HSD11B1CA2CA9 | |
| SCHEMBL1656348 | 0.78 | PTPN1 (0.32) | GPR3PTPN1 | |
| SCHEMBL1484262 | 0.78 | CA2 (0.38) | GPR3PTPN1CA2CA1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 62 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-118401893-A | Novel photoacid generator, photoresist composition, and photoresist pattern forming method | 株式会社东进世美肯 | 2024-07-26 | — | — | CN | disclosed |
| CN-117945957-A | Photoacid generating compounds and related polymers, photoresist compositions, and methods of forming photoresist relief images | 罗门哈斯电子材料有限责任公司 | 2024-04-30 | — | — | CN | disclosed |
| US-9921475-B1 | Photoacid-generating compound, polymer derived therefrom, photoresist composition including the photoacid-generating compound or polymer, and method of forming a photoresist relief image | ROHM AND HAAS ELECTRONIC MATERIALS LLC (US) | 2018-03-20 | — | — | US | disclosed |
| US-20180059542-A1 | PHOTOACID-GENERATING COMPOUND, POLYMER DERIVED THEREFROM, PHOTORESIST COMPOSITION INCLUDING THE PHOTOACID-GENERATING COMPOUND OR POLYMER, AND METHOD OF FORMING A PHOTORESIST RELIEF IMAGE | U.S. BANK TRUST COMPANY, NATIONAL ASSOCIATION, AS NOTES COLLATERAL AGENT | 2018-03-01 | — | — | US | disclosed |
| US-9851639-B2 | Photoacid generating polymers containing a urethane linkage for lithography | INTERNATIONAL BUSINESS MACHINES CORPORATION (US) | 2017-12-26 | — | — | US | disclosed |
| US-9488914-B2 | Fluorine-containing sulfonic acid salt, fluorine-containing sulfonic acid salt resin, resist composition, and pattern forming method using same | CENTRAL GLASS COMPANY, LIMITED (JP) | 2016-11-08 | — | — | US | disclosed |
| US-9244345-B1 | Non-ionic photo-acid generating polymers for resist applications | INTERNATIONAL BUSINESS MACHINES CORPORATION (US) | 2016-01-26 | — | — | US | disclosed |
| US-9221928-B2 | Fluorine-containing sulfonate resin, fluorine-containing N-sulfonyloxyimide resin, resist composition and pattern formation method | CENTRAL GLASS COMPANY, LIMITED (JP) | 2015-12-29 | — | — | US | disclosed |
| US-9182664-B2 | Polymerizable fluorine-containing sulfonate, fluorine-containing sulfonate resin, resist composition and pattern-forming method using same | CENTRAL GLASS COMPANY, LIMITED (JP) | 2015-11-10 | — | — | US | disclosed |
| US-9164384-B2 | Patterning process and resist composition | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2015-10-20 | — | — | US | disclosed |
| US-20090246694-A1 | NOVEL PHOTOACID GENERATOR, RESIST COMPOSITION, AND PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2009-10-01 | — | — | US | disclosed |
| EP-2105794-A1 | Novel photoacid generator, resist composition, and patterning process | Shin-Etsu Chemical Co., Ltd. (JP) | 2009-09-30 | — | — | EP | disclosed |
| EP-2090931-A1 | Positive resist composition and patterning process | Shin-Etsu Chemical Co., Ltd. (JP) | 2009-08-19 | — | — | EP | disclosed |
| US-20090202943-A1 | POSITIVE RESIST COMPOSITION AND PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2009-08-13 | — | — | US | disclosed |
| US-20090186297-A1 | POSITIVE RESIST COMPOSITIONS AND PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2009-07-23 | — | — | US | disclosed |
| US-20090186298-A1 | POSITIVE RESIST COMPOSITIONS AND PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2009-07-23 | — | — | US | disclosed |
| US-20090186296-A1 | POSITIVE RESIST COMPOSITIONS AND PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2009-07-23 | — | — | US | disclosed |
| EP-2081083-A1 | Positive resist compositions and patterning process | Shin-Etsu Chemical Co., Ltd. (JP) | 2009-07-22 | — | — | EP | disclosed |
| EP-2081085-A1 | Positive resist compositions and patterning process | Shin-Etsu Chemical Co., Ltd. (JP) | 2009-07-22 | — | — | EP | disclosed |
| EP-2081084-A1 | Positive resist compositions and patterning process | Shin-Etsu Chemical Co., Ltd. (JP) | 2009-07-22 | — | — | EP | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (2 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-20090246694-A1 | NOVEL PHOTOACID GENERATOR, RESIST COMPOSITION, AND PATTERNING PROCESS | ASIC1, HAO2, HRH3 | GPR3 408/4885PTPN1 4384/4885RIPK1 2318/4885 |
| US-20180059542-A1 | PHOTOACID-GENERATING COMPOUND, POLYMER DERIVED THEREFROM, PHOTORESIST COMPOSITION INCLUDING THE PHOTOACID-GENERATING COMPOUND OR POLYMER, AND METHOD OF FORMING A PHOTORESIST RELIEF IMAGE | QRFPR, RXFP1, PBRM1 | GPR3 345/4885PTPN1 2818/4885RIPK1 1387/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.