SCHEMBL14907284

SCHEMBL14907284

COC(=O)c1cc(Oc2ccc(C)c(C(=O)OC)c2)ccc1C

nearest known ligand 0.49

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
KDM4E B2RXH2 2/20 0.49
CYP1A2 P05177 2/20 0.49
CYP2D6 P10635 2/20 0.49
CYP2C9 P11712 2/20 0.49
CYP2C19 P33261 2/20 0.49
P2RX3 P56373 1/20 0.44
TDP1 Q9NUW8 2/20 0.43
GAA P10253 4/20 0.43
CA1 P00915 3/20 0.43
CA2 P00918 3/20 0.43
LMNA P02545 3/20 0.43
CA12 O43570 2/20 0.43
CA7 P43166 2/20 0.43
CA9 Q16790 2/20 0.43
CA14 Q9ULX7 2/20 0.43
MAPT P10636 2/20 0.43
PDK2 Q15119 1/20 0.43
PDK4 Q16654 1/20 0.43
NR1H4 Q96RI1 1/20 0.42
NPC1 O15118 2/20 0.42

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL15028056 0.92 NR1H4 (0.53) KDM4ECYP1A2CYP2C9CYP2C19TDP1
SCHEMBL2427949 0.90 HPGD (0.51) KDM4ECYP1A2CYP2D6CYP2C9CYP2C19
SCHEMBL29502160 0.89 KDM4E (0.62) KDM4ECYP1A2CYP2D6CYP2C9CYP2C19
SCHEMBL146258 0.89 KDM4E (0.62) KDM4ECYP1A2CYP2D6CYP2C9CYP2C19
SCHEMBL31557892 0.85 MEN1 (0.51) KDM4ETDP1GAAMAPTNPC1
SCHEMBL31440549 0.85 GLO1 (0.39) KDM4ECYP1A2CYP2D6CYP2C9CYP2C19
SCHEMBL9550314 0.84 KDM4E (0.51) KDM4ECYP1A2CYP2D6CYP2C9CYP2C19
SCHEMBL31063581 0.84 TDP1 (0.43) KDM4ECYP1A2CYP2D6CYP2C9CYP2C19
SCHEMBL21994466 0.84 ACHE (0.54) KDM4ECYP1A2CYP2D6CYP2C9CYP2C19
SCHEMBL28365855 0.84 ALDH1A1 (0.54) KDM4ECYP1A2CYP2D6CYP2C9CYP2C19

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 1 patent. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20130108963-A1 PHOTOSENSITIVE RESIN COMPOSITION AND METHOD FOR PREPARING PHOTOSENSITIVE COMPOSITION SUMITOMO BAKELITE CO., LTD. (JP) 2013-05-02 US disclosed