Predicted protein targets (top 19)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | TDP1 | Q9NUW8 | 2/20 | 0.39 |
| ▸ | TSHR | P16473 | 2/20 | 0.38 |
| ▸ | KDM4E | B2RXH2 | 8/20 | 0.36 |
| ▸ | SMN1; SMN2 | Q16637 | 3/20 | 0.36 |
| ▸ | ALDH1A1 | P00352 | 2/20 | 0.36 |
| ▸ | MEN1 | O00255 | 2/20 | 0.36 |
| ▸ | KMT2A | Q03164 | 2/20 | 0.36 |
| ▸ | GAA | P10253 | 2/20 | 0.36 |
| ▸ | LMNA | P02545 | 1/20 | 0.36 |
| ▸ | USP2 | O75604 | 1/20 | 0.36 |
| ▸ | L3MBTL1 | Q9Y468 | 1/20 | 0.34 |
| ▸ | HSD17B10 | Q99714 | 1/20 | 0.33 |
| ▸ | NPY1R | P25929 | 1/20 | 0.33 |
| ▸ | NPY2R | P49146 | 1/20 | 0.33 |
| ▸ | CYP1A2 | P05177 | 1/20 | 0.33 |
| ▸ | CYP2D6 | P10635 | 1/20 | 0.33 |
| ▸ | CYP2C9 | P11712 | 1/20 | 0.33 |
| ▸ | CYP2C19 | P33261 | 1/20 | 0.33 |
| ▸ | AKR1B1 | P15121 | 1/20 | 0.33 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL150208 | 0.85 | TDP1 (0.38) | TDP1TSHRKDM4ESMN1; SMN2ALDH1A1 | |
| SCHEMBL453710 | 0.78 | HTR1B (0.52) | TDP1KDM4ESMN1; SMN2ALDH1A1MEN1 | |
| SCHEMBL3787371 | 0.77 | TDP1 (0.36) | TDP1KDM4ESMN1; SMN2ALDH1A1MEN1 | |
| SCHEMBL452884 | 0.77 | KDM4E (0.53) | KDM4ESMN1; SMN2ALDH1A1MEN1KMT2A | |
| SCHEMBL449703 | 0.75 | THRA (0.44) | TDP1KDM4ESMN1; SMN2ALDH1A1MEN1 | |
| SCHEMBL11542962 | 0.74 | TDP1 (0.61) | TDP1KDM4ESMN1; SMN2ALDH1A1L3MBTL1 | |
| SCHEMBL3177108 | 0.72 | THRA (0.38) | KDM4EALDH1A1MEN1KMT2ANPY1R | |
| SCHEMBL3187267 | 0.70 | RAB9A (0.49) | KDM4ESMN1; SMN2ALDH1A1MEN1KMT2A | |
| SCHEMBL15169906 | 0.70 | THRB (0.49) | TDP1TSHRKDM4ESMN1; SMN2ALDH1A1 | |
| SCHEMBL150087 | 0.70 | MAPT (0.38) | TDP1TSHRKDM4ESMN1; SMN2ALDH1A1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 78 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-10591816-B2 | Photosensitive resin composition, color filter, and liquid crystal display element thereof | CHI MEI CORPORATION (TW) | 2020-03-17 | — | — | US | disclosed |
| US-9939568-B2 | Photosensitive resin composition for color filter and application of the same | CHI MEI CORPORATION (TW) | 2018-04-10 | — | — | US | disclosed |
| US-20170235224-A1 | PHOTOSENSITIVE RESIN COMPOSITION, COLOR FILTER, AND LIQUID CRYSTAL DISPLAY ELEMENT THEREOF | CHI MEI CORPORATION (TW) | 2017-08-17 | — | — | US | disclosed |
| US-9676899-B2 | Radiation curable resin composition and rapid three dimensional imaging process using the same | DSM IP ASSETS B.V. (NL) | 2017-06-13 | — | — | US | disclosed |
| US-9557443-B2 | Photosensitive resin composition, black matrix, color filter, and liquid crystal display device | CHI MEI CORPORATION (TW) | 2017-01-31 | — | — | US | disclosed |
| US-9557444-B2 | Alkali-soluble resin, photosensitive resin composition, color filter, method for manufacturing the same, and liquid crystal display apparatus | CHI MEI CORPORATION (TW) | 2017-01-31 | — | — | US | disclosed |
| US-20170003586-A1 | PHOTOSENSITIVE RESIN COMPOSITION AND USES THEREOF | CHI MEI CORPORATION (TW) | 2017-01-05 | — | — | US | disclosed |
| US-9529116-B2 | Photosensitive resin composition and application of the same | CHI MEI CORPORATION (TW) | 2016-12-27 | — | — | US | disclosed |
| US-9519208-B2 | Photosensitive resin composition for color filters and uses thereof | CHI MEI CORPORATION (TW) | 2016-12-13 | — | — | US | disclosed |
| US-20160327863-A1 | PHOTOSENSITIVE RESIN COMPOSITION FOR COLOR FILTER AND APPLICATION OF THE SAME | CHI MEI CORPORATION (TW) | 2016-11-10 | — | — | US | disclosed |
| US-20070232713-A1 | Radiation Curable Liquid Resin Composition for Optical Three-Dimensional Molding and Optical Molded Article Obtained by Photocuring Same | JSR CORPORATION (JP) | 2007-10-04 | — | — | US | disclosed |
| US-20070043138-A1 | Resin composition for photofabrication of three dimensional objects | YAMAMURA TETSUYA | 2007-02-22 | — | — | US | disclosed |
| US-20060194038-A1 | Abrasive articles and methods for making same | SAINT-GOBAIN ABRASIVES, INC. (US) | 2006-08-31 | — | — | US | disclosed |
| US-20060172230-A1 | hazardous waste reduction in stereolithography; nonhazardous: photosensitizer 4-benzoyl-4-methyldiphenyl sulfide, photoacid diffusion inhibitor, an oxetane, and boron containing cationic photoinitiator; fluorinated surfactants or polymers increase curing rate; antimony-free | DSM IP ASSETS B.V. (NL) | 2006-08-03 | — | — | US | disclosed |
| US-20050287470-A1 | Curable compositions and rapid prototyping process using the same | DSM IP ASSETS B.V. (NL) | 2005-12-29 | — | — | US | disclosed |
| US-20050209357-A1 | Flame retardant radiation curable compositions | DSM IP ASSETS B.V. (NL) | 2005-09-22 | — | — | US | disclosed |
| US-20050175930-A1 | Photosensitive resin composition for black matrix | CHI MEI CORPORATION (TW) | 2005-08-11 | — | — | US | disclosed |
| US-20050171255-A1 | Resin composition for photofabrication of three dimensional objects | YAMAMURA TETSUYA (JP) | 2005-08-04 | — | — | US | disclosed |
| US-20050158659-A1 | Photosensitive resin composition for black matrix | CHI MEI CORPORATION (TW) | 2005-07-21 | — | — | US | disclosed |
| US-20050101684-A1 | Curable compositions and rapid prototyping process using the same | YOU XIAORONG (US) | 2005-05-12 | — | — | US | disclosed |