Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | KDM4E | B2RXH2 | 6/20 | 0.57 |
| ▸ | ALDH1A1 | P00352 | 4/20 | 0.57 |
| ▸ | HPGD | P15428 | 3/20 | 0.57 |
| ▸ | GAA | P10253 | 2/20 | 0.57 |
| ▸ | POLB | P06746 | 4/20 | 0.55 |
| ▸ | GLA | P06280 | 4/20 | 0.46 |
| ▸ | MAOA | P21397 | 2/20 | 0.45 |
| ▸ | CASP1 | P29466 | 2/20 | 0.45 |
| ▸ | CASP7 | P55210 | 2/20 | 0.45 |
| ▸ | SMN1; SMN2 | Q16637 | 2/20 | 0.45 |
| ▸ | HSD17B10 | Q99714 | 2/20 | 0.45 |
| ▸ | NQO2 | P16083 | 2/20 | 0.45 |
| ▸ | CHRM2 | P08172 | 1/20 | 0.45 |
| ▸ | ADRA2A | P08913 | 1/20 | 0.45 |
| ▸ | ADORA3 | P0DMS8 | 1/20 | 0.45 |
| ▸ | CHRM1 | P11229 | 1/20 | 0.45 |
| ▸ | DRD1 | P21728 | 1/20 | 0.45 |
| ▸ | ACHE | P22303 | 1/20 | 0.45 |
| ▸ | SLC6A2 | P23975 | 1/20 | 0.45 |
| ▸ | ADRA1A | P35348 | 1/20 | 0.45 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL600291 | 0.83 | KDM4E (0.55) | KDM4EALDH1A1HPGDGAAPOLB | |
| SCHEMBL29450719 | 0.83 | KDM4E (0.55) | KDM4EALDH1A1HPGDGAAPOLB | |
| SCHEMBL29808111 | 0.82 | ALDH1A1 (0.43) | KDM4EALDH1A1POLBSMN1; SMN2TDP1 | |
| SCHEMBL1334758 | 0.82 | ALDH1A1 (0.43) | KDM4EALDH1A1POLBSMN1; SMN2TDP1 | |
| SCHEMBL4646633 | 0.77 | HTR2A (0.54) | KDM4EALDH1A1HPGDPOLBGLA | |
| SCHEMBL3343183 | 0.76 | KDM4E (0.69) | KDM4EALDH1A1HPGDGAAPOLB | |
| SCHEMBL29446776 | 0.75 | KDM4E (0.75) | KDM4EALDH1A1HPGDGAAPOLB | |
| SCHEMBL321444 | 0.75 | KDM4E (0.75) | KDM4EALDH1A1HPGDGAAPOLB | |
| SCHEMBL15037542 | 0.75 | ALDH1A1 (0.42) | KDM4EALDH1A1HPGDPOLBSMN1; SMN2 | |
| SCHEMBL14130585 | 0.75 | KDM4E (0.61) | KDM4EALDH1A1HPGDGAAPOLB |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 19 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-106233205-B | Photosensitive element, laminate, permanent mask resist, method for producing same, and method for producing semiconductor package | 日立化成株式会社 | 2020-06-23 | — | — | CN | claimed |
| EP-4388020-A1 | POLYMER, PHOTOSENSITIVE RESIN COMPOSITION, PHOTOSENSITIVE ELEMENT, METHOD FOR FORMING RESIST PATTERN, AND METHOD FOR FORMING WIRING PATTERN | Resonac Corporation (JP) | 2024-06-26 | — | — | EP | disclosed |
| CN-118131567-A | Photosensitive resin composition, photosensitive element, method for forming resist pattern, and method for manufacturing printed wiring board | 株式会社力森诺科 | 2024-06-04 | — | — | CN | disclosed |
| CN-118043365-A | Polymer, photosensitive resin composition, photosensitive element, method for forming resist pattern, and method for forming wiring pattern | 株式会社力森诺科 | 2024-05-14 | — | — | CN | disclosed |
| CN-113412289-B | Photosensitive resin composition, photosensitive element, method for forming resist pattern, and method for manufacturing printed wiring board | 株式会社力森诺科 | 2024-04-05 | — | — | CN | disclosed |
| CN-117099044-A | Photosensitive resin film, method for forming resist pattern, and method for forming wiring pattern | 株式会社力森诺科 | 2023-11-21 | — | — | CN | disclosed |
| CN-117083568-A | Photosensitive element and method for manufacturing photosensitive element | 株式会社力森诺科 | 2023-11-17 | — | — | CN | disclosed |
| WO-2023050062-A1 | POLYMER, PHOTOSENSITIVE RESIN COMPOSITION, PHOTOSENSITIVE ELEMENT, METHOD FOR FORMING RESIST PATTERN, AND METHOD FOR FORMING WIRING PATTERN | SHOWA DENKO MATERIALS CO., LTD. (JP) | 2023-04-06 | — | — | WO | disclosed |
| CN-115087929-A | Alkali-soluble resin, photosensitive resin composition, photosensitive element, method for forming resist pattern, and method for forming wiring pattern | 昭和电工材料株式会社 | 2022-09-20 | — | — | CN | disclosed |
| CN-114901454-A | Photosensitive element, method for forming resist pattern, and method for manufacturing printed wiring board | 昭和电工材料株式会社 | 2022-08-12 | — | — | CN | disclosed |
| CN-114585974-A | Photosensitive resin film, method for forming resist pattern, and method for forming wiring pattern | 昭和电工材料株式会社 | 2022-06-03 | — | — | CN | disclosed |
| CN-113412289-A | Photosensitive resin composition, photosensitive element, method for forming resist pattern, and method for producing printed wiring board | 昭和电工材料株式会社 | 2021-09-17 | — | — | CN | disclosed |
| WO-2021132699-A1 | ENERGY RAY-CURABLE COATING MATERIAL FOR THREE-DIMENSIONAL MOLDING, ENERGY RAY-CURABLE MATERIAL KIT FOR THREE-DIMENSIONAL MOLDING CONTAINING SAID SAME, THREE-DIMENSIONAL MOLDED PRODUCT OBTAINED USING SAME, AND METHOD FOR PRODUCING SAME | クラレノリタケデンタル株式会社 | 2021-07-01 | — | — | WO | disclosed |
| WO-2021029039-A1 | PHOTOSENSITIVE RESIN COMPOSITION, PHOTOSENSITIVE ELEMENT, METHOD FOR FORMING RESIST PATTERN, AND METHOD FOR PRODUCING PRINTED WIRING BOARD | 昭和電工マテリアルズ株式会社 | 2021-02-18 | — | — | WO | disclosed |
| CN-106233205-B | Photosensitive element, laminate, permanent mask resist, method for producing same, and method for producing semiconductor package | 日立化成株式会社 | 2020-06-23 | — | — | CN | disclosed |
| CN-102037406-A | Photosensitive resin composition, photosensitive element, method for producing resist pattern, and method for producing printed wiring board | HITACHI CHEMICAL CO LTD | 2011-04-27 | — | — | CN | disclosed |
| US-20100290992-A1 | NANOPARTICLE NUCLEIC ACID BINDING COMPOUND CONJUGATES FORMING I-MOTIFS | ROCHE DIAGNOSTICS GMBH (DE) | 2010-11-18 | — | — | US | disclosed |
| US-7485421-B2 | Polyamide-oligonucleotide derivatives, their preparation and use | HOECHST GMBH (DE) | 2009-02-03 | — | — | US | disclosed |
| US-5334484-A | Using an acridine compound as photoinitiator | HITACHI CHEMICAL CO., LTD. (JP) | 1994-08-02 | — | — | US | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-20100290992-A1 | NANOPARTICLE NUCLEIC ACID BINDING COMPOUND CONJUGATES FORMING I-MOTIFS | POLM, IGF2BP1, POLRMT | KDM4E 3791/4885ALDH1A1 1225/4885HPGD 4341/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.