SCHEMBL1506789

SCHEMBL1506789

C=Cc1cccc2cc(O)ccc12

nearest known ligand 0.49

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
CYP1A2 P05177 2/20 0.43
ESR1 P03372 10/20 0.43
ESR2 Q92731 10/20 0.43
ESRRB O95718 1/20 0.42
ESRRA P11474 1/20 0.42
HSD17B1 P14061 3/20 0.42
HSD17B2 P37059 3/20 0.42
TLR8 Q9NR97 1/20 0.41
NQO2 P16083 1/20 0.39
MEN1 O00255 2/20 0.38
KMT2A Q03164 2/20 0.38
LMNA P02545 1/20 0.38
POLB P06746 1/20 0.38
DHODH Q02127 1/20 0.37
CYP3A4 P08684 1/20 0.37
CYP2D6 P10635 1/20 0.37
CYP2C9 P11712 1/20 0.37
CYP2B6 P20813 1/20 0.37
CYP2C19 P33261 1/20 0.37
CLK1 P49759 1/20 0.37

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL30365636 1.00 CYP1A2 (0.43) CYP1A2ESR1ESR2ESRRBESRRA
SCHEMBL24204877 0.86 CYP1A2 (0.47) CYP1A2ESR1ESR2ESRRBESRRA
SCHEMBL1506773 0.85 MCL1 (0.49) CYP1A2ESR1ESR2ESRRBESRRA
SCHEMBL29956684 0.81 ERN1 (0.44) CYP1A2ESR1ESR2HSD17B1HSD17B2
SCHEMBL3067367 0.81 ERN1 (0.44) CYP1A2ESR1ESR2HSD17B1HSD17B2
SCHEMBL19719084 0.80 ESR1 (0.42) CYP1A2ESR1ESR2ESRRBESRRA
Hydrochloric Acid SCHEMBL11130190 0.79 ESR1 (0.44) CYP1A2ESR1ESR2HSD17B1HSD17B2
SCHEMBL24609679 0.79 ESR1 (0.37) CYP1A2ESR1ESR2ESRRBESRRA
SCHEMBL1506780 0.78 NQO2 (0.55) CYP1A2ESR1ESR2ESRRBESRRA
SCHEMBL29592963 0.78 TP53 (0.41) CYP1A2MEN1KMT2ACYP2C9

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 120 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-109072043-B Allergen activity reducing agent composition 太阳星光齿磨公司 2021-07-30 CN claimed
CN-109072043-A Allergenic activity depressant composition 太阳星光齿磨公司 2018-12-21 CN claimed
US-20240027904-A1 PHOTOACTIVE COMPOUNDS, PHOTORESIST COMPOSITIONS INCLUDING THE SAME, AND PATTERN FORMATION METHODS U.S. BANK TRUST COMPANY, NATIONAL ASSOCIATION, AS NOTES COLLATERAL AGENT 2024-01-25 US disclosed
US-20240027905-A1 PHOTOACID GENERATORS, PHOTORESIST COMPOSITIONS, AND PATTERN FORMATION METHODS U.S. BANK TRUST COMPANY, NATIONAL ASSOCIATION, AS NOTES COLLATERAL AGENT 2024-01-25 US disclosed
US-20240027905-A1 PHOTOACID GENERATORS, PHOTORESIST COMPOSITIONS, AND PATTERN FORMATION METHODS U.S. BANK TRUST COMPANY, NATIONAL ASSOCIATION, AS NOTES COLLATERAL AGENT 2024-01-25 US disclosed
US-20240027904-A1 PHOTOACTIVE COMPOUNDS, PHOTORESIST COMPOSITIONS INCLUDING THE SAME, AND PATTERN FORMATION METHODS U.S. BANK TRUST COMPANY, NATIONAL ASSOCIATION, AS NOTES COLLATERAL AGENT 2024-01-25 US disclosed
US-20240019779-A1 COMPOUNDS AND PHOTORESIST COMPOSITIONS INCLUDING THE SAME U.S. BANK TRUST COMPANY, NATIONAL ASSOCIATION, AS NOTES COLLATERAL AGENT 2024-01-18 US disclosed
US-20240019779-A1 COMPOUNDS AND PHOTORESIST COMPOSITIONS INCLUDING THE SAME U.S. BANK TRUST COMPANY, NATIONAL ASSOCIATION, AS NOTES COLLATERAL AGENT 2024-01-18 US disclosed
US-20230314934-A1 PHOTOACTIVE COMPOUNDS, PHOTORESIST COMPOSITIONS INCLUDING THE SAME, AND PATTERN FORMATION METHODS U.S. BANK TRUST COMPANY, NATIONAL ASSOCIATION, AS NOTES COLLATERAL AGENT 2023-10-05 US disclosed
US-20230314934-A1 PHOTOACTIVE COMPOUNDS, PHOTORESIST COMPOSITIONS INCLUDING THE SAME, AND PATTERN FORMATION METHODS U.S. BANK TRUST COMPANY, NATIONAL ASSOCIATION, AS NOTES COLLATERAL AGENT 2023-10-05 US disclosed
US-20230161257-A1 PHOTORESIST COMPOSITIONS AND PATTERN FORMATION METHODS U.S. BANK TRUST COMPANY, NATIONAL ASSOCIATION, AS NOTES COLLATERAL AGENT 2023-05-25 US disclosed
US-20070122740-A1 Resist undercoat-forming material and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2007-05-31 US disclosed
CN-1902352-A Allergen suppressor, allergen-suppression processed fiber and method of producing the same SEKISUI CHEMICAL CO LTD (JP) 2007-01-24 CN disclosed
EP-1703014-A1 ALLERGEN SUPPRESSOR, ALLERGEN-SUPPRESSION PROCESSED FIBER AND METHOD OF PRODUCING THE SAME Sekisui Chemical Co., Ltd. (JP) 2006-09-20 EP disclosed
US-20050095222-A1 Allergen inhibitor, allergen-inhibiting method, allergen-inhibiting fiber and allergen-inhibiting sheet SEKISUI CHEMICAL CO., LTD. (JP) 2005-05-05 US disclosed
EP-0849634-B1 Radiation sensitive resin composition JSR CORP (JP) 2004-03-31 EP disclosed
US-6322949-B2 SULFONIUM COMPOUND AS PHOTOACID GENERATOR JAPAN SYNTHETIC RUBBER CO., LTD. (JP) 2001-11-27 US disclosed
US-20010014427-A1 Radiation sensitive resin composition JAPAN SYNTHETIC RUBBER CO., LTD. (JP) 2001-08-16 US disclosed
US-6187504-B1 PHOTOSENSITIVE BLEND CONTAINING A NAPHTHALENE SULFONIUM SULFONATE DERIVATIVE PHOTOACID GENERATOR, RESIN HAVING ALKALI INSOLUBLE GROUPS CLEAVABLE BY ACID, AN ALKALI SOLUBLE RESIN AND A SOLUBILITY CONTROL AGENT; POSITIVES, RESOLUTION JSR CORPORATION (JP) 2001-02-13 US disclosed
EP-0849634-A1 Radiation sensitive resin composition JAPAN SYNTHETIC RUBBER CO., LTD. (JP) 1998-06-24 EP disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (4 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-20240019779-A1 COMPOUNDS AND PHOTORESIST COMPOSITIONS INCLUDING THE SAME CRY1, CCNT1, CCNA1 CYP1A2 902/4885ESR1 182/4885ESR2 410/4885
US-20230314934-A1 PHOTOACTIVE COMPOUNDS, PHOTORESIST COMPOSITIONS INCLUDING THE SAME, AND PATTERN FORMATION METHODS CRY1, CBR3, C1S CYP1A2 49/4885ESR1 266/4885ESR2 837/4885
US-20050095222-A1 Allergen inhibitor, allergen-inhibiting method, allergen-inhibiting fiber and allergen-inhibiting sheet CMA1, HLA-DRB1, ITCH CYP1A2 2947/4885ESR1 3305/4885ESR2 3404/4885
US-20240027904-A1 PHOTOACTIVE COMPOUNDS, PHOTORESIST COMPOSITIONS INCLUDING THE SAME, AND PATTERN FORMATION METHODS C1S, C1R, CRY2 CYP1A2 41/4885ESR1 269/4885ESR2 678/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.