SCHEMBL15216306

SCHEMBL15216306

O=C(OC(C(F)(F)F)C(F)(F)S(=O)(=O)O)c1cc2ccccc2cn1

nearest known ligand 0.51

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
GABRA1 P14867 10/20 0.50
GABRG2 P18507 10/20 0.50
GABRB3 P28472 10/20 0.50
GABRA5 P31644 10/20 0.50
GABRA3 P34903 10/20 0.50
GABRA2 P47869 10/20 0.50
GABRA4 P48169 5/20 0.50
GABRA6 Q16445 5/20 0.50
EGLN1 Q9GZT9 1/20 0.36
TRPM8 Q7Z2W7 1/20 0.35
HDAC3 O15379 1/20 0.34
HDAC1 Q13547 1/20 0.34
PPARD Q03181 1/20 0.33
MCHR1 Q99705 1/20 0.33
GABRP O00591 1/20 0.33
GABRD O14764 1/20 0.33
GABRB1 P18505 1/20 0.33
GABRB2 P47870 1/20 0.33
GABRE P78334 1/20 0.33
GABRG1 Q8N1C3 1/20 0.33

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL382734 0.78 CES2 (0.42) GABRB1GABRB2MEN1KMT2A
SCHEMBL11991276 0.77 KDM4E (0.39) GABRA1GABRG2GABRB3GABRA5GABRA3
SCHEMBL1671650 0.77 CES2 (0.41) GABRB1GABRB2MEN1KMT2A
SCHEMBL15216308 0.76 GABRA1 (0.46) GABRA1GABRG2GABRB3GABRA5GABRA3
SCHEMBL12216084 0.75 KDM4E (0.44) GABRA1GABRG2GABRB3GABRA5GABRA3
SCHEMBL4000637 0.74 EGLN1 (0.41) GABRA1GABRG2GABRB3GABRA5GABRA3
SCHEMBL3834448 0.74 KDM4E (0.48) GABRA1GABRG2GABRB3GABRA5GABRA3
SCHEMBL382685 0.74 TSHR (0.47) GABRA1GABRG2GABRB3GABRA5GABRA3
SCHEMBL382735 0.73 KMT2A (0.43) GABRA1GABRG2GABRB3GABRA5GABRA3
SCHEMBL15216299 0.73 P2RX7 (0.38) GABRA1GABRG2GABRB3GABRA5GABRA3

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 6 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-11579529-B2 Positive resist composition and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-02-14 US disclosed
US-20200285152-A1 POSITIVE RESIST COMPOSITION AND PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2020-09-10 US disclosed
US-8900796-B2 Acid generator, chemically amplified resist composition, and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2014-12-02 US disclosed
US-8900796-B2 Acid generator, chemically amplified resist composition, and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2014-12-02 US disclosed
US-20130224657-A1 ACID GENERATOR, CHEMICALLY AMPLIFIED RESIST COMPOSITION, AND PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2013-08-29 US disclosed
US-20130224657-A1 ACID GENERATOR, CHEMICALLY AMPLIFIED RESIST COMPOSITION, AND PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2013-08-29 US disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (2 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-20200285152-A1 POSITIVE RESIST COMPOSITION AND PATTERNING PROCESS POLR1C, EWSR1, LBR GABRA1 2282/4885GABRG2 1123/4885GABRB3 969/4885
US-11579529-B2 Positive resist composition and patterning process POLR1C, EWSR1, LBR GABRA1 2282/4885GABRG2 1123/4885GABRB3 969/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.