Predicted protein targets (top 3)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | LMNA | P02545 | 1/20 | 0.34 |
| ▸ | CYP3A4 | P08684 | 1/20 | 0.34 |
| ▸ | ALOX15 | P16050 | 1/20 | 0.34 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL15470579 | 0.92 | LMNA (0.33) | LMNACYP3A4ALOX15 | |
| SCHEMBL15470580 | 0.89 | LMNA (0.43) | LMNACYP3A4ALOX15 | |
| SCHEMBL15470548 | 0.85 | LMNA (0.38) | LMNACYP3A4ALOX15 | |
| SCHEMBL15470576 | 0.81 | ALOX15 (0.30) | ALOX15 | |
| SCHEMBL15470540 | 0.78 | LMNA (0.51) | LMNACYP3A4ALOX15 | |
| SCHEMBL15470575 | 0.78 | ALOX15 (0.31) | ALOX15 | |
| SCHEMBL674286 | 0.77 | ALDH1A1 (0.39) | — | |
| SCHEMBL15470578 | 0.76 | LMNA (0.42) | LMNACYP3A4ALOX15 | |
| SCHEMBL15470570 | 0.76 | ALDH1A1 (0.35) | — | |
| SCHEMBL15470553 | 0.76 | ALDH1A1 (0.32) | LMNACYP3A4ALOX15 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-9075308-B2 | Positive resist composition and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2015-07-07 | — | — | US | disclosed |
| US-9075308-B2 | Positive resist composition and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2015-07-07 | — | — | US | disclosed |
| US-20140045122-A1 | POSITIVE RESIST COMPOSITION AND PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2014-02-13 | — | — | US | disclosed |
| US-20140045122-A1 | POSITIVE RESIST COMPOSITION AND PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2014-02-13 | — | — | US | disclosed |