SCHEMBL15869202

SCHEMBL15869202

CCOC(C)Oc1ccc(C2(c3ccc(OC(C)OCC)cc3)CCCC2)cc1

nearest known ligand 0.43

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
▸ ADORA3 P0DMS8 1/20 0.43
▸ PSMB1 P20618 1/20 0.40
▸ PSMB5 P28074 1/20 0.40
▸ PSMB2 P49721 1/20 0.40
▸ ESR1 P03372 4/20 0.39
▸ ESR2 Q92731 4/20 0.39
▸ SLC6A4 P31645 6/20 0.38
▸ ALDH1A1 P00352 2/20 0.38
▸ L3MBTL1 Q9Y468 1/20 0.38
▸ PPARA Q07869 1/20 0.36
▸ SLC6A3 Q01959 5/20 0.36
▸ LMNA P02545 2/20 0.34
▸ SLC6A2 P23975 2/20 0.34
▸ BACE1 P56817 2/20 0.34
▸ MEN1 O00255 1/20 0.33
▸ KMT2A Q03164 1/20 0.33
▸ TSHR P16473 1/20 0.33
▸ MAPT P10636 1/20 0.33
▸ ALOX12 P18054 1/20 0.33
▸ HTT P42858 1/20 0.33

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL15869191 0.98 ADORA3 (0.45) ADORA3PSMB1PSMB5PSMB2ESR1
SCHEMBL15869192 0.83 DRD2 (0.33) ADORA3ESR2SLC6A4SLC6A3SLC6A2
SCHEMBL15869181 0.82 ADORA3 (0.34) ADORA3
SCHEMBL3852488 0.80 LMNA (0.52) L3MBTL1PPARALMNAKMT2ATSHR
SCHEMBL21164190 0.79 PSMB1 (0.48) ADORA3PSMB1PSMB5PSMB2ESR1
SCHEMBL9320720 0.75 MMP1 (0.35) ADORA3PSMB1PSMB5PSMB2SLC6A4
SCHEMBL4059616 0.75 LMNA (0.46) PPARALMNAMAPT
SCHEMBL7026652 0.75 ESR1 (0.50) ADORA3PSMB1PSMB5PSMB2ESR1
SCHEMBL19034764 0.74 PSMB1 (0.43) ADORA3PSMB1PSMB5PSMB2ESR1
SCHEMBL9320644 0.74 MMP1 (0.33) ADORA3PSMB1PSMB5PSMB2SLC6A4

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-9377690-B2 Compositon for forming metal oxide-containing film and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2016-06-28 — — US disclosed
US-9377690-B2 Compositon for forming metal oxide-containing film and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2016-06-28 — — US disclosed
US-20140193757-A1 COMPOSITON FOR FORMING METAL OXIDE-CONTAINING FILM AND PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2014-07-10 — — US disclosed
US-20140193757-A1 COMPOSITON FOR FORMING METAL OXIDE-CONTAINING FILM AND PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2014-07-10 — — US disclosed
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