SCHEMBL1592402

SCHEMBL1592402

C=CC(=O)OCc1cccc(C)c1

nearest known ligand 0.51

Predicted protein targets (top 17)

geneUniProtsupporting neighboursconfidence
MMP2 P08253 1/20 0.51
MMP9 P14780 1/20 0.51
MMP12 P39900 1/20 0.51
IDO1 P14902 2/20 0.50
MAOB P27338 4/20 0.49
POLB P06746 1/20 0.48
THRA P10827 1/20 0.46
THRB P10828 1/20 0.46
HCAR2 Q8TDS4 4/20 0.46
MAOA P21397 1/20 0.46
MEN1 O00255 1/20 0.44
KMT2A Q03164 1/20 0.44
LMNA P02545 1/20 0.44
HSP90AA1 P07900 1/20 0.43
FFAR4 Q5NUL3 1/20 0.43
MRGPRX4 Q96LA9 1/20 0.43
ALOX5 P09917 1/20 0.42

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL227301 0.88 HCAR2 (0.51) THRBHCAR2LMNA
SCHEMBL8893773 0.85 MMP2 (0.52) MMP2MMP9MMP12IDO1MAOB
SCHEMBL146120 0.84 ALOX5 (0.58) THRBHCAR2ALOX5
SCHEMBL29716477 0.84 ALOX5 (0.58) THRBHCAR2ALOX5
SCHEMBL21244248 0.84 HCAR2 (0.46) MMP2MMP9MMP12THRBHCAR2
SCHEMBL19487306 0.84 ALDH1A1 (0.56) THRBHCAR2LMNA
SCHEMBL1898363 0.83 HCAR2 (0.48) THRBHCAR2LMNA
SCHEMBL21244244 0.83 MET (0.42) THRBLMNAFFAR4
SCHEMBL22667466 0.83 MET (0.42) THRBHCAR2LMNA
SCHEMBL28592782 0.83 HCAR2 (0.51) MMP2MMP9MMP12IDO1MAOB

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 17 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-12186974-B2 Method of manufacturing a heat-shrink elastomeric element HALLIBURTON ENERGY SERVICES, INC. (US) 2025-01-07 US disclosed
US-20230056225-A1 PHOTOSENSITIVE COMPOSITION, CURED PRODUCT, AND METHOD FOR PRODUCING CURED PRODUCT TOKYO OHKA KOGYO CO., LTD. (JP) 2023-02-23 US disclosed
US-20230038195-A1 PHOTOSENSITIVE COMPOSITION, CURED PRODUCT, AND METHOD FOR PRODUCING CURED PRODUCT TOKYO OHKA KOGYO CO., LTD. (JP) 2023-02-09 US disclosed
US-20230028822-A1 PHOTOSENSITIVE INK COMPOSITION, CURED PRODUCT, DISPLAY PANEL, AND METHOD FOR PRODUCING CURED PRODUCT TOKYO OHKA KOGYO CO., LTD. (JP) 2023-01-26 US disclosed
US-20230002520-A1 CURABLE COMPOSITION, CURED PRODUCT, AND METHOD FOR PRODUCING CURED PRODUCT TOKYO OHKA KOGYO CO., LTD. (JP) 2023-01-05 US disclosed
US-20220404709-A1 PHOTOSENSITIVE INK COMPOSITION, CURED PRODUCT, DISPLAY PANEL, AND METHOD FOR PRODUCING CURED PRODUCT TOKYO OHKA KOGYO CO., LTD. (JP) 2022-12-22 US disclosed
US-20210323217-A1 METHOD OF MANUFACTURING A HEAT-SHRINK ELASTOMERIC ELEMENT HALLIBURTON ENERGY SERVICES, INC. 2021-10-21 US disclosed
US-11065807-B2 Method of manufacturing a heat-shrink elastomeric element THE UNIVERSITY OF TEXAS SYSTEM BOARD OF REGENTS (US) 2021-07-20 US disclosed
US-20190250510-A1 PHOTOSENSITIVE COMPOSITION AND ORGANIC THIN-FILM TRANSISTOR SUMITOMO CHEMICAL COMPANY, LIMITED. (JP) 2019-08-15 US disclosed
US-20190250509-A1 PHOTOSENSITIVE COMPOSITION AND ORGANIC THIN-FILM TRANSISTOR SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2019-08-15 US disclosed
US-20190077070-A1 HEAT-SHRINK ELASTOMERIC ELEMENTS MADE FROM SHAPE MEMORY POLYMERS HALLIBURTON ENERGY SERVICES, INC. 2019-03-14 US disclosed
WO-2017142343-A1 SILOXANE MONOMER, COMPOSITION FOR PREPARATION OF SILICONE HYDROGEL LENS CONTAINING SAME, AND SILICONE HYDROGEL LENS 주식회사 인터로조 2017-08-24 WO disclosed
US-8299191-B2 Shape memory polymers and process for preparing GEORGIA TECH RESEARCH CORP. (US) 2012-10-30 US disclosed
EP-2491082-A1 SHAPE MEMORY POLYMERS AND PROCESS FOR PREPARING Georgia Tech Research Corporation (US) 2012-08-29 EP disclosed
WO-2011049879-A1 SHAPE MEMORY POLYMERS AND PROCESS FOR PREPARING GEORGIA TECH RESEARCH CORPORATION (US) 2011-04-28 WO disclosed
US-20110092652-A1 SHAPE MEMORY POLYMERS AND PROCESS FOR PREPARING GEORGIA TECH RESEARCH CORPORATION 2011-04-21 US disclosed
US-4625009-A POLYMER OF N,N-DIMETHYLACRYLAMIDE, UNSATURATED CARBOXYLIC ACID, HYDROPHOBIC (METH)ACRYLATE ESTER, POLYALKYLENE GLYCOL DI(METH)ACRYLATE HOYA CORPORATION (JP) 1986-11-25 US disclosed