SCHEMBL1635567

SCHEMBL1635567

C=Cc1ccccc1O.OC=Cc1ccccc1

nearest known ligand 0.60

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
TRPA1 O75762 1/20 0.60
NFKB1 P19838 2/20 0.43
CA1 P00915 1/20 0.43
CA2 P00918 1/20 0.43
CA4 P22748 1/20 0.43
ALDH1A1 P00352 1/20 0.41
TSHR P16473 1/20 0.41
TRIM24 O15164 1/20 0.41
TRIM33 Q9UPN9 1/20 0.41
NFE2L2 Q16236 2/20 0.40
CDK4 P11802 1/20 0.40
CCND1 P24385 1/20 0.40
JUN P05412 1/20 0.40
MAPT P10636 2/20 0.40
BCHE P06276 1/20 0.40
CYP2C19 P33261 1/20 0.40
MAOB P27338 3/20 0.39
LMNA P02545 1/20 0.38
ABL1 P00519 1/20 0.37
ABCB1 P08183 1/20 0.37

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL3360362 0.88 ALDH1A1 (0.48) TRPA1CA1ALDH1A1TSHRNFE2L2
Styrene SCHEMBL4633239 0.85 ALDH1A1 (0.56) TRPA1CA1ALDH1A1TSHRNFE2L2
Styrene SCHEMBL2928107 0.84 ALDH1A1 (0.61) TRPA1NFKB1CA1CA2CA4
Benzene SCHEMBL23581564 0.84 TRIM24 (0.54) TRPA1NFKB1CA1CA2CA4
SCHEMBL20076 0.82
SCHEMBL29511549 0.82
SCHEMBL14685993 0.80 ALDH1A1 (0.64) TRPA1ALDH1A1TSHRNFE2L2MAPT
Styrene SCHEMBL546105 0.80 ALDH1A1 (0.67) TRPA1CA1ALDH1A1TSHRNFE2L2
Bromide SCHEMBL2361069 0.80 TRIM24 (0.54) TRPA1NFKB1CA1CA2CA4
Methane SCHEMBL2951846 0.80 TRIM24 (0.54) TRPA1NFKB1CA1CA2CA4

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 3 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-7932014-B2 Photosensitive compound, photosensitive composition, resist pattern forming method, and device production process CANON KABUSHIKI KAISHA (JP) 2011-04-26 US disclosed
US-7615332-B2 Photosensitive compound, photosensitive composition, resist pattern forming method, and device production process CANON KABUSHIKI KAISHA (JP) 2009-11-10 US disclosed
US-20080187864-A1 PHOTOSENSITIVE COMPOUND, PHOTOSENSITIVE COMPOSITION, RESIST PATTERN FORMING METHOD, AND DEVICE PRODUCTION PROCESS CANON KABUSHIKI KAISHA (JP) 2008-08-07 US disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-20080187864-A1 PHOTOSENSITIVE COMPOUND, PHOTOSENSITIVE COMPOSITION, RESIST PATTERN FORMING METHOD, AND DEVICE PRODUCTION PROCESS FRG1, PAH, RER1 TRPA1 5/4885NFKB1 3218/4885CA1 4291/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.