Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | CA1 | P00915 | 4/20 | 0.55 |
| ▸ | CA2 | P00918 | 4/20 | 0.55 |
| ▸ | ALDH1A1 | P00352 | 4/20 | 0.47 |
| ▸ | KDM4E | B2RXH2 | 2/20 | 0.47 |
| ▸ | HSD17B10 | Q99714 | 2/20 | 0.44 |
| ▸ | CYP2A6 | P11509 | 1/20 | 0.44 |
| ▸ | TSHR | P16473 | 1/20 | 0.44 |
| ▸ | TDP1 | Q9NUW8 | 1/20 | 0.44 |
| ▸ | HPRT1 | P00492 | 1/20 | 0.41 |
| ▸ | MCL1 | Q07820 | 1/20 | 0.41 |
| ▸ | IMPDH2 | P12268 | 2/20 | 0.40 |
| ▸ | IMPDH1 | P20839 | 2/20 | 0.40 |
| ▸ | SLC22A12 | Q96S37 | 2/20 | 0.40 |
| ▸ | PAX8 | Q06710 | 1/20 | 0.39 |
| ▸ | MEN1 | O00255 | 1/20 | 0.38 |
| ▸ | CYP1A2 | P05177 | 1/20 | 0.38 |
| ▸ | CYP3A4 | P08684 | 1/20 | 0.38 |
| ▸ | GAA | P10253 | 1/20 | 0.38 |
| ▸ | MAPT | P10636 | 1/20 | 0.38 |
| ▸ | HPGD | P15428 | 1/20 | 0.38 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL13948301 | 0.78 | CA1 (0.53) | CA1CA2ALDH1A1KDM4EHSD17B10 | |
| SCHEMBL646163 | 0.77 | CA1 (0.52) | CA1CA2ALDH1A1KDM4EHSD17B10 | |
| SCHEMBL3245559 | 0.76 | CA1 (0.52) | CA1CA2ALDH1A1KDM4EHSD17B10 | |
| SCHEMBL5950662 | 0.75 | CA1 (0.50) | CA1CA2ALDH1A1KDM4EHSD17B10 | |
| SCHEMBL6235232 | 0.75 | CA1 (0.50) | CA1CA2ALDH1A1KDM4EHSD17B10 | |
| SCHEMBL11556490 | 0.75 | CYP2A6 (0.54) | CA1CA2ALDH1A1KDM4EHSD17B10 | |
| SCHEMBL16581281 | 0.75 | CA1 (0.50) | CA1CA2ALDH1A1KDM4EHSD17B10 | |
| SCHEMBL2680262 | 0.75 | CA1 (0.50) | CA1CA2ALDH1A1KDM4EHSD17B10 | |
| SCHEMBL5950664 | 0.75 | TSHR (0.54) | CA1CA2ALDH1A1KDM4EHSD17B10 | |
| SCHEMBL1644197 | 0.75 | CA1 (0.50) | CA1CA2ALDH1A1KDM4EHSD17B10 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 27 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-10745372-B2 | Compound, resin, material for forming underlayer film for lithography, underlayer film for lithography, pattern forming method, and purification method | MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) | 2020-08-18 | — | — | US | claimed |
| WO-2024135508-A1 | COMPOUND, ORGANIC THIN FILM, PHOTOELECTRIC CONVERSION ELEMENT, IMAGING ELEMENT, PHOTOSENSOR AND SOLID-STATE IMAGING DEVICE | 三菱瓦斯化学株式会社 | 2024-06-27 | — | — | WO | disclosed |
| WO-2023167234-A1 | COMPOUND, ORGANIC THIN FILM, PHOTOELECTRIC CONVERSION ELEMENT, IMAGING ELEMENT, PHOTOSENSOR AND SOLID-STATE IMAGING DEVICE | 三菱瓦斯化学株式会社 | 2023-09-07 | — | — | WO | disclosed |
| US-10745372-B2 | Compound, resin, material for forming underlayer film for lithography, underlayer film for lithography, pattern forming method, and purification method | MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) | 2020-08-18 | — | — | US | disclosed |
| US-20180029968-A1 | COMPOUND, RESIN, MATERIAL FOR FORMING UNDERLAYER FILM FOR LITHOGRAPHY, COMPOSITION FOR FORMING UNDERLAYER FILM FOR LITHOGRAPHY, UNDERLAYER FILM FOR LITHOGRAPHY, RESIST PATTERN FORMING METHOD, CIRCUIT PATTERN FORMING METHOD, AND PURIFICATION METHOD OF COMPOUND OR RESIN | MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) | 2018-02-01 | — | — | US | disclosed |
| EP-3257835-A1 | COMPOUND, RESIN, LITHOGRAPHY UNDERLAYER FILM FORMING MATERIAL, LITHOGRAPHY UNDERLAYER FILM FORMING COMPOSITION, LITHOGRAPHY UNDERLAYER FILM, METHOD FOR FORMING RESIST PATTERN, METHOD FOR FORMING CIRCUIT PATTERN, AND METHOD FOR PURIFYING COMPOUND OR RESIN | Mitsubishi Gas Chemical Company, Inc. (JP) | 2017-12-20 | — | — | EP | disclosed |
| US-20170349564-A1 | COMPOUND, RESIN, MATERIAL FOR FORMING UNDERLAYER FILM FOR LITHOGRAPHY, UNDERLAYER FILM FOR LITHOGRAPHY, PATTERN FORMING METHOD, AND PURIFICATION METHOD | MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) | 2017-12-07 | — | — | US | disclosed |
| EP-3239141-A1 | COMPOUND, RESIN, UNDERLAYER FILM FORMING MATERIAL FOR LITHOGRAPHY, UNDERLAYER FILM FOR LITHOGRAPHY, PATTERN FORMING METHOD AND PURIFICATION METHOD | Mitsubishi Gas Chemical Company, Inc. (JP) | 2017-11-01 | — | — | EP | disclosed |
| US-8467018-B2 | Color filter and liquid crystal display device | TOPPAN PRINTING CO., LTD. (JP) | 2013-06-18 | — | — | US | disclosed |
| US-7977670-B2 | Organic transistor | TOYO INK MFG. CO., LTD. (JP) | 2011-07-12 | — | — | US | disclosed |
| EP-1354602-B1 | MEDICINAL COMPOSITIONS CONTAINING DIURETIC AND INSULIN RESISTANCE-IMPROVING AGENT | SANKYO CO (JP) | 2006-10-04 | — | — | EP | disclosed |
| EP-1695716-A2 | Medicinal compositions containing diuretics and insulin sensitizers | Sankyo Company, Limited (JP) | 2006-08-30 | — | — | EP | disclosed |
| US-20050288339-A1 | Medicinal compositions containing diuretic and insulin resistance-improving agent | SANKYO COMPANY, LIMITED (JP) | 2005-12-29 | — | — | US | disclosed |
| US-20040053974-A1 | Medicinal compositions containing diuretic and insulin resistance-improving agent | SANKYO COMPANY, LIMITED (JP) | 2004-03-18 | — | — | US | disclosed |
| US-20040006141-A1 | Amidocarboxylic acid compounds | SANKYO COMPANY, LTD (JP) | 2004-01-08 | — | — | US | disclosed |
| EP-1354602-A1 | MEDICINAL COMPOSITIONS CONTAINING DIURETIC AND INSULIN RESISTANCE-IMPROVING AGENT | Sankyo Company, Limited (JP) | 2003-10-22 | — | — | EP | disclosed |
| US-6528525-B1 | Amidocarboxylic acid derivatives | SANKYO COMPANY, LIMITED (JP) | 2003-03-04 | — | — | US | disclosed |
| EP-1026149-A1 | AMIDOCARBOXYLIC ACID DERIVATIVES | Sankyo Company Limited (JP) | 2000-08-09 | — | — | EP | disclosed |
| US-5629406-A | AMINO ACID DERIVATIVES | SANKYO COMPANY, LIMITED (JP) | 1997-05-13 | — | — | US | disclosed |
| EP-0587311-A1 | Peptides capable of inhibiting the activity of HIV protease, their preparation and their therapeutic use | SANKYO COMPANY LIMITED (JP) | 1994-03-16 | — | — | EP | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (6 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-20040053974-A1 | Medicinal compositions containing diuretic and insulin resistance-improving agent | GPR119, INSR, IRS1 | CA1 3597/4885CA2 1808/4885ALDH1A1 2128/4885 |
| US-20040006141-A1 | Amidocarboxylic acid compounds | NR1H2, AGK, APOL1 | CA1 3246/4885CA2 2273/4885ALDH1A1 3508/4885 |
| US-20170349564-A1 | COMPOUND, RESIN, MATERIAL FOR FORMING UNDERLAYER FILM FOR LITHOGRAPHY, UNDERLAYER FILM FOR LITHOGRAPHY, PATTERN FORMING METHOD, AND PURIFICATION METHOD | ASH2L, MLLT1, FRG1 | CA1 500/4885CA2 1178/4885ALDH1A1 1912/4885 |
| US-20050288339-A1 | Medicinal compositions containing diuretic and insulin resistance-improving agent | GPR119, INSR, IRS1 | CA1 3597/4885CA2 1808/4885ALDH1A1 2128/4885 |
| US-20180029968-A1 | COMPOUND, RESIN, MATERIAL FOR FORMING UNDERLAYER FILM FOR LITHOGRAPHY, COMPOSITION FOR FORMING UNDERLAYER FILM FOR LITHOGRAPHY, UNDERLAYER FILM FOR LITHOGRAPHY, RESIST PATTERN FORMING METHOD, CIRCUIT PATTERN FORMING METHOD, AND PURIFICATION METHOD OF COMPOUND OR RESIN | PRMT9, ARGLU1, MLLT1 | CA1 208/4885CA2 1172/4885ALDH1A1 1309/4885 |
| US-10745372-B2 | Compound, resin, material for forming underlayer film for lithography, underlayer film for lithography, pattern forming method, and purification method | ASH2L, MLLT1, FRG1 | CA1 500/4885CA2 1178/4885ALDH1A1 1912/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.