Known targets — ChEMBL curated mechanism
ABCC9ABL1ACEACHEACVR1ADORA1ADORA2AADORA2BADORA3ADRA1AADRA1BADRA1DADRA2AADRA2BADRA2CADRB1ADRB2ADRB3AGTR1ALOX5ATP4AATP4BBCRBTKCACNA1ACACNA1BCACNA1CCACNA1DCACNA1ECACNA1FCACNA1GCACNA1HCACNA1ICACNA1SCACNA2D1CACNA2D2CACNA2D3CACNA2D4CACNB1CACNB2CACNB3CACNB4CACNG1CACNG2CACNG3CACNG4CACNG5CACNG6CACNG7CACNG8CALCRLCFBCHRM1CHRM2CHRM3CHRM4CHRM5CHRNA1CHRNB1CHRNDCHRNECHRNGCRBNCUL4ACXCR1CXCR2DDB1DDCDHFRDPP4DRD2DRD3DRD4EGFRERBB2ERBB4ESR1ESR2FDPSFKBP1AFLT1FLT3FLT4GARTGHSRGRIA1GRIA2GRIA3GRIA4GRIK1GRIK2GRIK3GRIK4GRIK5GRIN2AGSK3AGSK3BHDAC1HDAC10HDAC11HDAC2HDAC3HDAC4HDAC5HDAC6HDAC7HDAC8HDAC9HRH1HTR1AHTR1BHTR1DHTR1EHTR1FHTR2AHTR2BHTR2CHTR3AHTR3BHTR3CHTR3DHTR3EHTR4HTR5AHTR6HTR7IDH1IDH2IMPA1ITGA2BITGB3JAK1JAK2JAK3KCNJ11KCNK3KCNK9KDRKITMEN1METMMP1MMP13MMP7MMP8NANOD2NS5bODC1OPG057OPRD1OPRK1OPRM1PPARP1PARP2PDE3APDE3BPDE4APDE4BPDE4CPDE4DPDGFRBPIK3CAPIK3CBPIK3CDPIK3CGPIK3R1PIK3R2PIK3R3PIK3R5PKLRPPARDPPATPTGS1PTGS2RBX1ROCK1ROCK2RRM1RRM2RRM2BSCN10ASCN11ASCN1ASCN2ASCN3ASCN4ASCN5ASCN7ASCN8ASCN9ASCNN1ASCNN1BSCNN1GSIGMAR1SLC10A2SLC5A2SLC6A2SLC6A3SLC6A4SLC9A3SYKTACR1THRATHRBTOP1TUBA1ATUBA1BTUBA1CTUBA3CTUBA3ETUBA4ATUBBTUBB1TUBB2ATUBB2BTUBB3TUBB4ATUBB4BTUBB6TUBB8TYK2TYMSVDRampCblablaT-3blaT-4blaT-5blaT-6blaUOE-1dacAdacBdacCfolAfolPftsIgyrAgyrBileSmecAmrcAmrcBmrdAparCparEpbp2pbp4pbpApbpFrplArplBrplCrplDrplErplFrplIrplJrplKrplLrplMrplNrplOrplPrplQrplRrplSrplTrplUrplVrplWrplXrplYrpmArpmBrpmCrpmDrpmErpmE2rpmFrpmGrpmG1rpmG2rpmG3rpmHrpmIrpmJrpsArpsBrpsCrpsDrpsErpsFrpsGrpsHrpsIrpsJrpsKrpsLrpsMrpsNrpsOrpsPrpsQrpsRrpsSrpsTrpsUthyAykgMykgO
The experimentally established mechanism targets of Water. The predicted profile below is derived independently by chemical similarity — agreement is a validation signal, a miss is honest.
Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | MEN1 known ✓ | O00255 | 1/20 | 0.42 |
| ▸ | VDR known ✓ | P11473 | 1/20 | 0.41 |
| ▸ | KDM4E | B2RXH2 | 2/20 | 0.54 |
| ▸ | HSD17B10 | Q99714 | 2/20 | 0.54 |
| ▸ | CYP1A2 | P05177 | 2/20 | 0.54 |
| ▸ | GLA | P06280 | 1/20 | 0.54 |
| ▸ | CYP2C9 | P11712 | 1/20 | 0.54 |
| ▸ | HPGD | P15428 | 1/20 | 0.54 |
| ▸ | CYP2C19 | P33261 | 1/20 | 0.54 |
| ▸ | SIRT1 | Q96EB6 | 1/20 | 0.54 |
| ▸ | MAPT | P10636 | 1/20 | 0.51 |
| ▸ | KMT2A | Q03164 | 1/20 | 0.42 |
| ▸ | ALDH1A1 | P00352 | 2/20 | 0.41 |
| ▸ | CYP2A6 | P11509 | 1/20 | 0.41 |
| ▸ | TSHR | P16473 | 1/20 | 0.41 |
| ▸ | TDP1 | Q9NUW8 | 1/20 | 0.41 |
| ▸ | ITGB2 | P05107 | 1/20 | 0.38 |
| ▸ | ICAM1 | P05362 | 1/20 | 0.38 |
| ▸ | ITGAL | P20701 | 1/20 | 0.38 |
| ▸ | HPRT1 | P00492 | 1/20 | 0.38 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL7473565 | 0.98 | KDM4E (0.56) | KDM4EHSD17B10CYP1A2GLACYP2C9 | |
| SCHEMBL30830197 | 0.98 | KDM4E (0.56) | KDM4EHSD17B10CYP1A2GLACYP2C9 | |
| SCHEMBL29269339 | 0.89 | HPRT1 (0.50) | KDM4EHSD17B10CYP1A2GLACYP2C9 | |
| SCHEMBL29670013 | 0.87 | KDM4E (0.53) | KDM4EHSD17B10CYP1A2GLACYP2C9 | |
| SCHEMBL30003445 | 0.87 | KDM4E (0.53) | KDM4EHSD17B10CYP1A2GLACYP2C9 | |
| SCHEMBL371993 | 0.87 | KDM4E (0.53) | KDM4EHSD17B10CYP1A2GLACYP2C9 | |
| Acetic Acid SCHEMBL11711913 | 0.87 | KDM4E (0.50) | KDM4EHSD17B10CYP1A2GLACYP2C9 | |
| SCHEMBL14158873 | 0.83 | KDM4E (0.41) | KDM4EHSD17B10CYP1A2GLACYP2C9 | |
| SCHEMBL1123737 | 0.79 | KDM4E (0.53) | KDM4EHSD17B10CYP1A2GLACYP2C9 | |
| SCHEMBL372146 | 0.79 | HPRT1 (0.47) | KDM4EHSD17B10CYP1A2GLACYP2C9 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 22 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-106715761-A | Additive for electrolytic refining of high-purity copper and method for producing high-purity copper | 三菱综合材料株式会社 | 2017-05-24 | — | — | CN | claimed |
| CN-104395834-B | The method for recycling of development treatment waste liquid method for concentration and development treatment waste liquid | 富士胶片株式会社 | 2019-07-05 | — | — | CN | disclosed |
| CN-106715761-B | Additive for electrolytic refining of high-purity copper and method for producing high-purity copper | 三菱综合材料株式会社 | 2019-06-07 | — | — | CN | disclosed |
| CN-107075704-B | The manufacturing method of high-purity copper electrorefining additive and high-purity copper | 三菱综合材料株式会社 | 2019-02-22 | — | — | CN | disclosed |
| EP-3318414-A1 | ORIGINAL PLATE FOR PRINTING, LITHOGRAPHIC PRINTING PLATE, DISPOSABLE PLATE FOR PRINTING, AND LAMINATE THEREOF | FUJIFILM CORPORATION (JP) | 2018-05-09 | — | — | EP | disclosed |
| CN-107431101-A | Slide, transparent back panel used for solar batteries and solar module used for solar batteries | 富士胶片株式会社 | 2017-12-01 | — | — | CN | disclosed |
| CN-107075704-A | The manufacture method of high-purity copper electrorefining additive and high-purity copper | 三菱综合材料株式会社 | 2017-08-18 | — | — | CN | disclosed |
| CN-106715761-A | Additive for electrolytic refining of high-purity copper and method for producing high-purity copper | 三菱综合材料株式会社 | 2017-05-24 | — | — | CN | disclosed |
| CN-104718240-B | thermosetting composition, cured film and display element | 捷恩智株式会社 | 2017-03-08 | — | — | CN | disclosed |
| CN-101883839-B | Lubricating oil composition | NIPPON OIL CORP. (JP) | 2015-12-02 | — | — | CN | disclosed |
| US-20150104746-A1 | METHOD OF CONCENTRATING WASTE LIQUID PRODUCED BY DEVELOPMENT, AND METHOD OF RECYCLING WASTE LIQUID PRODUCED BY DEVELOPMENT | FUJIFILM CORPORATION (JP) | 2015-04-16 | — | — | US | disclosed |
| CN-104395834-A | Method for concentrating processing waste liquid and method for recycling processing waste liquid | FUJIFILM CORP | 2015-03-04 | — | — | CN | disclosed |
| CN-101517493-B | Method for developing and sealing lithographic printing plate | EASTMAN KODAK CO | 2012-01-11 | — | — | CN | disclosed |
| CN-1834784-B | Photosensitive composition and lithographic printing plate precursor | FUJI PHOTO FILM CO LTD | 2011-01-12 | — | — | CN | disclosed |
| CN-100569873-C | Inkjet recording black ink and ink jet recording method | FUJI PHOTO FILM CO LTD (JP) | 2009-12-16 | — | — | CN | disclosed |
| CN-101517493-A | Method for developing and sealing lithographic printing plate | EASTMAN KODAK CO (US) | 2009-08-26 | — | — | CN | disclosed |
| CN-100390241-C | Inkjet recording ink and method of inkjet recording | FUJI PHOTO FILM CO LTD (JP) | 2008-05-28 | — | — | CN | disclosed |
| CN-1834784-A | Photosensitive composition and lithographic printing plate precursor | FUJI PHOTO FILM CO LTD (JP) | 2006-09-20 | — | — | CN | disclosed |
| CN-1685020-A | Inkjet recording black ink and method of inkjet recording | FUJI PHOTO FILM CO LTD (JP) | 2005-10-19 | — | — | CN | disclosed |
| CN-1678699-A | Ink-jet recording ink and ink-jet recording method | FUJI PHOTO FILM CO LTD (JP) | 2005-10-05 | — | — | CN | disclosed |