Water

Water

SCHEMBL1705810

C=CCN1CC(C)O1.O

nearest known ligand 0.00

Full drug profile on Sugi Atlas →

Known targets — ChEMBL curated mechanism

ABCC9ABL1ACEACHEACVR1ADORA1ADORA2AADORA2BADORA3ADRA1AADRA1BADRA1DADRA2AADRA2BADRA2CADRB1ADRB2ADRB3AGTR1ALOX5ATP4AATP4BBCRBTKCACNA1ACACNA1BCACNA1CCACNA1DCACNA1ECACNA1FCACNA1GCACNA1HCACNA1ICACNA1SCACNA2D1CACNA2D2CACNA2D3CACNA2D4CACNB1CACNB2CACNB3CACNB4CACNG1CACNG2CACNG3CACNG4CACNG5CACNG6CACNG7CACNG8CALCRLCFBCHRM1CHRM2CHRM3CHRM4CHRM5CHRNA1CHRNB1CHRNDCHRNECHRNGCRBNCUL4ACXCR1CXCR2DDB1DDCDHFRDPP4DRD2DRD3DRD4EGFRERBB2ERBB4ESR1ESR2FDPSFKBP1AFLT1FLT3FLT4GARTGHSRGRIA1GRIA2GRIA3GRIA4GRIK1GRIK2GRIK3GRIK4GRIK5GRIN2AGSK3AGSK3BHDAC1HDAC10HDAC11HDAC2HDAC3HDAC4HDAC5HDAC6HDAC7HDAC8HDAC9HRH1HTR1AHTR1BHTR1DHTR1EHTR1FHTR2AHTR2BHTR2CHTR3AHTR3BHTR3CHTR3DHTR3EHTR4HTR5AHTR6HTR7IDH1IDH2IMPA1ITGA2BITGB3JAK1JAK2JAK3KCNJ11KCNK3KCNK9KDRKITMEN1METMMP1MMP13MMP7MMP8NANOD2NS5bODC1OPG057OPRD1OPRK1OPRM1PPARP1PARP2PDE3APDE3BPDE4APDE4BPDE4CPDE4DPDGFRBPIK3CAPIK3CBPIK3CDPIK3CGPIK3R1PIK3R2PIK3R3PIK3R5PKLRPPARDPPATPTGS1PTGS2RBX1ROCK1ROCK2RRM1RRM2RRM2BSCN10ASCN11ASCN1ASCN2ASCN3ASCN4ASCN5ASCN7ASCN8ASCN9ASCNN1ASCNN1BSCNN1GSIGMAR1SLC10A2SLC5A2SLC6A2SLC6A3SLC6A4SLC9A3SYKTACR1THRATHRBTOP1TUBA1ATUBA1BTUBA1CTUBA3CTUBA3ETUBA4ATUBBTUBB1TUBB2ATUBB2BTUBB3TUBB4ATUBB4BTUBB6TUBB8TYK2TYMSVDRampCblablaT-3blaT-4blaT-5blaT-6blaUOE-1dacAdacBdacCfolAfolPftsIgyrAgyrBileSmecAmrcAmrcBmrdAparCparEpbp2pbp4pbpApbpFrplArplBrplCrplDrplErplFrplIrplJrplKrplLrplMrplNrplOrplPrplQrplRrplSrplTrplUrplVrplWrplXrplYrpmArpmBrpmCrpmDrpmErpmE2rpmFrpmGrpmG1rpmG2rpmG3rpmHrpmIrpmJrpsArpsBrpsCrpsDrpsErpsFrpsGrpsHrpsIrpsJrpsKrpsLrpsMrpsNrpsOrpsPrpsQrpsRrpsSrpsTrpsUthyAykgMykgO

The experimentally established mechanism targets of Water. The predicted profile below is derived independently by chemical similarity — agreement is a validation signal, a miss is honest.

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL2095398 0.98
SCHEMBL6554645 0.70 PDK1 (0.33)
SCHEMBL1072148 0.68 SIGMAR1 (0.44)
SCHEMBL10815846 0.68 SIGMAR1 (0.44)
SCHEMBL3851995 0.65
SCHEMBL2093630 0.65
SCHEMBL5184879 0.64
SCHEMBL24693237 0.64
Water SCHEMBL1240345 0.64
SCHEMBL11238555 0.63 GRM2 (0.48)

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 11 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20220195168-A1 AQUEOUS RESIN COMPOSITION TOYOBO CO., LTD. (JP) 2022-06-23 US disclosed
EP-3954738-A1 AQUEOUS RESIN COMPOSITION TOYOBO CO., LTD. (JP) 2022-02-16 EP disclosed
CN-113748167-A Aqueous resin composition 东洋纺株式会社 2021-12-03 CN disclosed
EP-1772488-B1 PROCESS FOR PRODUCING AN AQUEOUS RESIN COMPOSITION TOYO BOSEKI (JP) 2017-09-06 EP disclosed
US-9290625-B2 Aqueous resin composition and method of producing the same TOYO BOSEKI KABUSHIKI KAISHA (JP) 2016-03-22 US disclosed
EP-1911805-B1 AQUEOUS RESIN COMPOSITION AND METHOD FOR PRODUCING SAME TOYO BOSEKI (JP) 2012-04-18 EP disclosed
US-7737208-B2 Water base resin composition, process for producing the same, paint, ink, adhesive, sealant and primer TOYO KASEI KOGYO COMPANY LIMITED (JP) 2010-06-15 US disclosed
US-20080287594-A1 Water Base Resin Composition, Process for Producing the Same, Paint, Ink, Adhesive, Sealant and Primer TOYO KASEI KOGYO COMPANY LIMITED (JP) 2008-11-20 US disclosed
US-20080262137-A1 Aqueous Resin Composition and Method of Producing the Same TOYO KASEI KOGYO CO., LTD. (JP) 2008-10-23 US disclosed
EP-1911805-A1 AQUEOUS RESIN COMPOSITION AND METHOD FOR PRODUCING SAME TOYO KASEI KOGYO COMPANY LIMITED (JP) 2008-04-16 EP disclosed
EP-1772488-A1 WATER BASE RESIN COMPOSITION, PROCESS FOR PRODUCING THE SAME, PAINT, INK, ADHESIVE, SEALANT AND PRIMER TOYO KASEI KOGYO COMPANY LIMITED (JP) 2007-04-11 EP disclosed