Predicted protein targets (top 2)
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL13460221 | 1.00 | CYP2C9 (0.31) | CYP2C9EPHX2 | |
| SCHEMBL9891401 | 1.00 | CYP2C9 (0.31) | CYP2C9EPHX2 | |
| SCHEMBL9891403 | 0.80 | HSD11B1 (0.36) | CYP2C9EPHX2 | |
| SCHEMBL29226113 | 0.76 | EPHX2 (0.34) | CYP2C9EPHX2 | |
| SCHEMBL12783628 | 0.74 | — | — | |
| SCHEMBL7535351 | 0.71 | — | — | |
| SCHEMBL14461589 | 0.70 | — | — | |
| SCHEMBL1499946 | 0.70 | EPHX1 (0.39) | CYP2C9EPHX2 | |
| SCHEMBL14789966 | 0.69 | — | — | |
| SCHEMBL26299276 | 0.69 | TSHR (0.39) | EPHX2 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 9 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-20170329227-A1 | NOVEL SULFONIUM COMPOUND, MAKING METHOD, RESIST COMPOSITION, AND PATTERN FORMING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2017-11-16 | — | — | US | disclosed |
| US-20170329227-A1 | NOVEL SULFONIUM COMPOUND, MAKING METHOD, RESIST COMPOSITION, AND PATTERN FORMING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2017-11-16 | — | — | US | disclosed |
| US-20170315442-A1 | NOVEL CARBOXYLIC ACID ONIUM SALT, CHEMICALLY AMPLIFIED RESIST COMPOSITION, AND PATTERN FORMING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2017-11-02 | — | — | US | disclosed |
| US-20170299963-A1 | MONOMER, POLYMER, RESIST COMPOSITION, AND PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2017-10-19 | — | — | US | disclosed |
| US-9703193-B2 | Onium salt, resist composition, and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2017-07-11 | — | — | US | disclosed |
| US-20160320698-A1 | ONIUM SALT, RESIST COMPOSITION, AND PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2016-11-03 | — | — | US | disclosed |
| EP-3088955-A2 | RESIST COMPOSITION AND PATTERNING PROCESS | Shin-Etsu Chemical Co., Ltd. (JP) | 2016-11-02 | — | — | EP | disclosed |
| US-9366958-B2 | Photoacid generator, chemically amplified resist composition, and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2016-06-14 | — | — | US | disclosed |
| US-20150301449-A1 | PHOTOACID GENERATOR, CHEMICALLY AMPLIFIED RESIST COMPOSITION, AND PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2015-10-22 | — | — | US | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (4 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-20170315442-A1 | NOVEL CARBOXYLIC ACID ONIUM SALT, CHEMICALLY AMPLIFIED RESIST COMPOSITION, AND PATTERN FORMING PROCESS | ETV6, ELOVL5, ALAD | CYP2C9 2094/4885EPHX2 1517/4885 |
| US-20170299963-A1 | MONOMER, POLYMER, RESIST COMPOSITION, AND PATTERNING PROCESS | ASIC1, PKD1, ARCN1 | CYP2C9 4617/4885EPHX2 3389/4885 |
| US-20160320698-A1 | ONIUM SALT, RESIST COMPOSITION, AND PATTERNING PROCESS | SLC6A5, EIF2B5, EIF2B4 | CYP2C9 2957/4885EPHX2 1454/4885 |
| US-20150301449-A1 | PHOTOACID GENERATOR, CHEMICALLY AMPLIFIED RESIST COMPOSITION, AND PATTERNING PROCESS | PAG1, PARG, PAH | CYP2C9 3258/4885EPHX2 2275/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.