Predicted protein targets (top 2)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | INMT | O95050 | 6/20 | 0.71 |
| ▸ | USP2 | O75604 | 1/20 | 0.64 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| Formic Acid SCHEMBL1691873 | 0.92 | INMT (0.78) | INMTUSP2 | |
| Bicarbonate SCHEMBL31253382 | 0.88 | INMT (0.82) | INMTUSP2 | |
| SCHEMBL2927 | 0.87 | — | — | |
| SCHEMBL17417845 | 0.87 | — | — | |
| Ammonia Solution, Strong SCHEMBL23880360 | 0.85 | INMT (0.78) | INMTUSP2 | |
| SCHEMBL29707902 | 0.85 | INMT (0.78) | INMTUSP2 | |
| Water SCHEMBL6561823 | 0.85 | INMT (0.78) | INMTUSP2 | |
| Ammonia Solution, Strong SCHEMBL6834960 | 0.85 | INMT (0.78) | INMTUSP2 | |
| Hydrochloric Acid SCHEMBL10432356 | 0.85 | INMT (0.78) | INMTUSP2 | |
| Fumaric Acid SCHEMBL29660279 | 0.83 | INMT (1.00) | INMTUSP2 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 8 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-12631962-B2 | Resist composition and method for forming resist pattern | TOKYO OHKA KOGYO CO., LTD. (JP) | 2026-05-19 | — | — | US | disclosed |
| WO-2024176973-A1 | METHOD FOR PRODUCING PURIFIED RESIST COMPOSITION, METHOD FOR FORMING RESIST PATTERN, AND PURIFIED RESIST COMPOSITION | 東京応化工業株式会社 | 2024-08-29 | — | — | WO | disclosed |
| US-20230408917-A1 | RESIST COMPOSITION AND METHOD FOR FORMING RESIST PATTERN | TOKYO OHKA KOGYO CO., LTD. (JP) | 2023-12-21 | — | — | US | disclosed |
| US-20220171286-A1 | RESIST COMPOSITION AND METHOD OF FORMING RESIST PATTERN | NATIONAL INSTITUTE OF ADVANCED INDUSTRIAL SCIENCE AND TECHNOLOGY (JP) | 2022-06-02 | — | — | US | disclosed |
| US-10209619-B2 | Composition and method of forming pattern using composition | JSR CORPORATION (JP) | 2019-02-19 | — | — | US | disclosed |
| US-10090163-B2 | Inorganic film-forming composition for multilayer resist processes, and pattern-forming method | JSR CORPORATION (JP) | 2018-10-02 | — | — | US | disclosed |
| US-20160349616-A1 | SEMICONDUCTOR DEVICE PRODUCTION COMPOSITION AND PATTERN FORMATION METHOD | JSR CORPORATION (JP) | 2016-12-01 | — | — | US | disclosed |
| US-20150364332-A1 | INORGANIC FILM-FORMING COMPOSITION FOR MULTILAYER RESIST PROCESSES, AND PATTERN-FORMING METHOD | JSR CORPORATION (JP) | 2015-12-17 | — | — | US | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (3 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-12631962-B2 | Resist composition and method for forming resist pattern | TERB1, TERF2, LSM8 | INMT 4435/4885USP2 4579/4885 |
| US-10090163-B2 | Inorganic film-forming composition for multilayer resist processes, and pattern-forming method | HCAR1, HSD17B7, BMPR1A | INMT 4336/4885USP2 3049/4885 |
| US-20150364332-A1 | INORGANIC FILM-FORMING COMPOSITION FOR MULTILAYER RESIST PROCESSES, AND PATTERN-FORMING METHOD | HCAR1, HSD17B7, BMPR1A | INMT 4336/4885USP2 3049/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.