SCHEMBL1733040

SCHEMBL1733040

CC1(c2ccccc2Br)CC2C=CC1C2

nearest known ligand 0.36

Predicted protein targets (top 7)

geneUniProtsupporting neighboursconfidence
HTR2A P28223 1/20 0.36
HTR2C P28335 1/20 0.36
KDM1A O60341 1/20 0.33
RCOR1 Q9UKL0 1/20 0.33
CYP2D6 P10635 1/20 0.30
CYP2C19 P33261 1/20 0.30
P2RX7 Q99572 1/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL1733751 0.81 BACE1 (0.34) CYP2D6CYP2C19P2RX7
SCHEMBL1733173 0.81 TAAR1 (0.35) KDM1ACYP2D6CYP2C19P2RX7
SCHEMBL1733646 0.78 ALDH1A1 (0.31)
SCHEMBL1733844 0.78 KMT2A (0.40) KDM1AP2RX7
SCHEMBL231895 0.76 MAOA (0.41) KDM1ACYP2D6CYP2C19P2RX7
SCHEMBL6528313 0.76 MAOA (0.41) KDM1ACYP2D6CYP2C19P2RX7
SCHEMBL2778188 0.75 P2RX7 (0.32) P2RX7
SCHEMBL1720274 0.71 NPC1 (0.37) KDM1A
SCHEMBL1720397 0.69 SLC6A4 (0.39) KDM1ARCOR1
SCHEMBL4243945 0.67 MAOA (0.38) KDM1ACYP2D6CYP2C19

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 16 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-9242407-B2 Resin for thermal imprinting SCIVAX CORPORATION (JP) 2016-01-26 US disclosed
US-20140339735-A1 RESIN FOR THERMAL IMPRINTING SCIVAX CORPORATION (JP) 2014-11-20 US disclosed
US-8721950-B2 Resin for thermal imprint SCIVAX CORPORATION (JP) 2014-05-13 US disclosed
US-8597769-B2 Etching mask, base material having etching mask, finely processed article, and method for production of finely processed article MARUZEN PETROCHEMICAL CO. LTD. (JP) 2013-12-03 US disclosed
US-20130056906-A1 RESIN FOR THERMAL IMPRINT MARUZEN PETROCHEMICAL CO., LTD. (JP) 2013-03-07 US disclosed
US-8324332-B2 Resin for thermal imprint SCIVAX CORPORATION (JP) 2012-12-04 US disclosed
EP-1958970-B1 USE OF RESINS FOR THERMAL IMPRINTING SCIVAX CORP (JP) 2011-11-23 EP disclosed
US-20100310830-A1 Etching Mask, Base Material Having Etching Mask, Finely Processed Article, And Method For Production Of Finely Processed Article MARUZEN PETROCHEMICAL CO., LTD. (JP) 2010-12-09 US disclosed
EP-2221162-A1 ETCHING MASK, BASE MATERIAL HAVING ETCHING MASK, FINELY PROCESSED ARTICLE, AND METHOD FOR PRODUCTION OF FINELY PROCESSED ARTICLE Maruzen Petrochemical CO., LTD. (JP) 2010-08-25 EP disclosed
US-20100189985-A1 THERMAL-IMPRINTING RESIN, THERMAL-IMPRINTING-RESIN SOLUTION, THERMAL-IMPRINTING INJECTION-MOLDED BODY, THERMAL-IMPRINTING THIN FILM AND PRODUCTION METHOD THEREOF MARUZEN PETROCHEMICAL CO., LTD. (JP) 2010-07-29 US disclosed
US-20100189984-A1 THERMAL-IMPRINTING RESIN SOLUTION, THERMAL-IMPRINTING RESIN THIN FILM, AND METHOD OF MANUFACTURING THOSE MARUZEN PETROCHEMICAL CO., LTD. (JP) 2010-07-29 US disclosed
EP-2163565-A1 RESIN FOR THERMAL IMPRINTING, RESIN SOLUTION FOR THERMAL IMPRINTING, INJECTION MOLDED BODY FOR THERMAL IMPRINTING, THIN FILM FOR THERMAL IMPRINTING, AND PROCESS FOR PRODUCING THE THIN FILM MARUZEN PETROCHEMICAL CO., LTD. (JP) 2010-03-17 EP disclosed
US-20100019410-A1 Resin for Thermal Imprinting SCIVAX CORPORATION (JP) 2010-01-28 US disclosed
US-20100013122-A1 Resin for Thermal Imprint SCIVAX CORPORATON (JP) 2010-01-21 US disclosed
EP-1958970-A1 RESIN FOR THERMAL IMPRINTING Scivax Corporation (JP) 2008-08-20 EP disclosed
EP-1930349-A1 RESIN FOR THERMAL IMPRINT Scivax Corporation (JP) 2008-06-11 EP disclosed