SCHEMBL1733173

SCHEMBL1733173

CC1(c2ccccc2Cl)CC2C=CC1C2

nearest known ligand 0.35

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
TAAR1 Q96RJ0 1/20 0.35
PTGS2 P35354 1/20 0.33
CRHBP P24387 1/20 0.32
CRHR2 Q13324 1/20 0.32
GRIN1 Q05586 3/20 0.31
GRIN2A Q12879 3/20 0.31
SLC6A4 P31645 2/20 0.31
GRIN2D O15399 2/20 0.31
GRIN3B O60391 2/20 0.31
GRIN2B Q13224 2/20 0.31
GRIN2C Q14957 2/20 0.31
GRIN3A Q8TCU5 2/20 0.31
OPRK1 P41145 1/20 0.31
LMNA P02545 1/20 0.31
OPRM1 P35372 1/20 0.31
CACNA1C Q13936 1/20 0.31
KDM1A O60341 1/20 0.30
HDAC4 P56524 1/20 0.30
CYP2D6 P10635 1/20 0.30
CYP2C19 P33261 1/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL1733040 0.81 HTR2A (0.36) KDM1ACYP2D6CYP2C19P2RX7
SCHEMBL1733751 0.81 BACE1 (0.34) HDAC4CYP2D6CYP2C19P2RX7
SCHEMBL1733646 0.78 ALDH1A1 (0.31)
SCHEMBL1733844 0.78 KMT2A (0.40) SLC6A4KDM1AP2RX7
SCHEMBL231895 0.76 MAOA (0.41) KDM1ACYP2D6CYP2C19P2RX7
SCHEMBL6528313 0.76 MAOA (0.41) KDM1ACYP2D6CYP2C19P2RX7
SCHEMBL2778188 0.75 P2RX7 (0.32) P2RX7
SCHEMBL4243945 0.73 MAOA (0.38) PTGS2SLC6A4LMNAKDM1ACYP2D6
SCHEMBL1720274 0.71 NPC1 (0.37) SLC6A4KDM1A
SCHEMBL1720397 0.69 SLC6A4 (0.39) SLC6A4KDM1A

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 16 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-9242407-B2 Resin for thermal imprinting SCIVAX CORPORATION (JP) 2016-01-26 US disclosed
US-20140339735-A1 RESIN FOR THERMAL IMPRINTING SCIVAX CORPORATION (JP) 2014-11-20 US disclosed
US-8721950-B2 Resin for thermal imprint SCIVAX CORPORATION (JP) 2014-05-13 US disclosed
US-8597769-B2 Etching mask, base material having etching mask, finely processed article, and method for production of finely processed article MARUZEN PETROCHEMICAL CO. LTD. (JP) 2013-12-03 US disclosed
US-20130056906-A1 RESIN FOR THERMAL IMPRINT MARUZEN PETROCHEMICAL CO., LTD. (JP) 2013-03-07 US disclosed
US-8324332-B2 Resin for thermal imprint SCIVAX CORPORATION (JP) 2012-12-04 US disclosed
EP-1958970-B1 USE OF RESINS FOR THERMAL IMPRINTING SCIVAX CORP (JP) 2011-11-23 EP disclosed
US-20100310830-A1 Etching Mask, Base Material Having Etching Mask, Finely Processed Article, And Method For Production Of Finely Processed Article MARUZEN PETROCHEMICAL CO., LTD. (JP) 2010-12-09 US disclosed
EP-2221162-A1 ETCHING MASK, BASE MATERIAL HAVING ETCHING MASK, FINELY PROCESSED ARTICLE, AND METHOD FOR PRODUCTION OF FINELY PROCESSED ARTICLE Maruzen Petrochemical CO., LTD. (JP) 2010-08-25 EP disclosed
US-20100189985-A1 THERMAL-IMPRINTING RESIN, THERMAL-IMPRINTING-RESIN SOLUTION, THERMAL-IMPRINTING INJECTION-MOLDED BODY, THERMAL-IMPRINTING THIN FILM AND PRODUCTION METHOD THEREOF MARUZEN PETROCHEMICAL CO., LTD. (JP) 2010-07-29 US disclosed
US-20100189984-A1 THERMAL-IMPRINTING RESIN SOLUTION, THERMAL-IMPRINTING RESIN THIN FILM, AND METHOD OF MANUFACTURING THOSE MARUZEN PETROCHEMICAL CO., LTD. (JP) 2010-07-29 US disclosed
EP-2163565-A1 RESIN FOR THERMAL IMPRINTING, RESIN SOLUTION FOR THERMAL IMPRINTING, INJECTION MOLDED BODY FOR THERMAL IMPRINTING, THIN FILM FOR THERMAL IMPRINTING, AND PROCESS FOR PRODUCING THE THIN FILM MARUZEN PETROCHEMICAL CO., LTD. (JP) 2010-03-17 EP disclosed
US-20100019410-A1 Resin for Thermal Imprinting SCIVAX CORPORATION (JP) 2010-01-28 US disclosed
US-20100013122-A1 Resin for Thermal Imprint SCIVAX CORPORATON (JP) 2010-01-21 US disclosed
EP-1958970-A1 RESIN FOR THERMAL IMPRINTING Scivax Corporation (JP) 2008-08-20 EP disclosed
EP-1930349-A1 RESIN FOR THERMAL IMPRINT Scivax Corporation (JP) 2008-06-11 EP disclosed