SCHEMBL1758100

SCHEMBL1758100

Oc1ccc(C(c2ccc(O)cc2)c2cccc(C(c3ccc(O)cc3)c3ccc(O)cc3)c2)cc1

nearest known ligand 0.47

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
ESR1 P03372 9/20 0.47
ESR2 Q92731 7/20 0.47
PDCD1 Q15116 1/20 0.44
CD274 Q9NZQ7 1/20 0.44
KMT2A Q03164 3/20 0.42
ALDH1A1 P00352 3/20 0.42
TDP1 Q9NUW8 2/20 0.42
GAA P10253 1/20 0.42
MEN1 O00255 2/20 0.42
IDO1 P14902 1/20 0.42
TDO2 P48775 1/20 0.42
LMNA P02545 3/20 0.40
CYP3A4 P08684 3/20 0.40
MAPT P10636 2/20 0.40
ALOX15 P16050 2/20 0.40
CA12 O43570 2/20 0.40
CA2 P00918 2/20 0.40
CA5A P35218 2/20 0.40
CA9 Q16790 2/20 0.40
HSD17B10 Q99714 2/20 0.40

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL29807688 0.91 ESR1 (0.58) ESR1ESR2PDCD1CD274KMT2A
SCHEMBL4059643 0.91 ESR1 (0.58) ESR1ESR2PDCD1CD274KMT2A
SCHEMBL9808282 0.88 ESR1 (0.61) ESR1ESR2PDCD1CD274KMT2A
SCHEMBL1758130 0.85 LMNA (0.52) ESR1ESR2KMT2AALDH1A1TDP1
SCHEMBL1758048 0.85 TSHR (0.50) ESR1ESR2KMT2AMEN1TSHR
SCHEMBL12004642 0.85 ESR1 (0.61) ESR1ESR2KMT2AMEN1CYP3A4
SCHEMBL28091155 0.85 ALDH1A1 (0.50) ESR1ESR2PDCD1CD274KMT2A
SCHEMBL1758116 0.85 ACHE (0.50) ESR1ESR2PDCD1CD274KMT2A
SCHEMBL3362042 0.85 ACHE (0.50) ESR1ESR2PDCD1CD274KMT2A
SCHEMBL19314626 0.84 IDO1 (0.56) ESR1ESR2PDCD1CD274KMT2A

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 15 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
WO-2024116861-A1 CURABLE RESIN, CURABLE RESIN COMPOSITION, AND CURED ARTICLE DIC株式会社 2024-06-06 WO disclosed
EP-1767090-B1 CLATHRATE COMPOUND, METHOD OF CONTROLLING CONCENTRATION OF AQUEOUS SOLUTION OF AGRICULTURAL-CHEMICAL ACTIVE INGREDIENT, AND AGRICULTURAL-CHEMICAL PREPARATION NIPPON SODA CO (JP) 2015-08-12 EP disclosed
US-7943803-B2 Clathrate compound, method for controlling concentration of aqueous agricultural chemical active ingredient solution, and agricultural chemical formulation NIPPON SODA CO., LTD. (JP) 2011-05-17 US disclosed
US-20100274006-A1 Clathrate compound, method for controlling concentration of aqueous agricultural chemical active ingredient solution, and agricultural chemical formulation NIPPON SODA CO., LTD (JP) 2010-10-28 US disclosed
US-7737309-B2 Clathrate compound, method for controlling concentration of aqueous agricultural chemical active ingredient solution, and agricultural chemical formulation NIPPON SODA CO., LTD. (JP) 2010-06-15 US disclosed
US-20070281929-A1 Clathrate Compound, Method for Controlling Concentration of Aqueous Agricultural Chemical Active Ingredient Solution, and Agricultural Chemical Formulation NIPPON SODA CO., LTD. (JP) 2007-12-06 US disclosed
EP-1767090-A1 CLATHRATE COMPOUND, METHOD OF CONTROLLING CONCENTRATION OF AQUEOUS SOLUTION OF AGRICULTURAL-CHEMICAL ACTIVE INGREDIENT, AND AGRICULTURAL-CHEMICAL PREPARATION NIPPON SODA CO., LTD. (JP) 2007-03-28 EP disclosed
US-6861210-B2 Resist remover composition DONGJIN SEMICHEN CO., LTD. (KR) 2005-03-01 US disclosed
US-6147169-A LOW TEMPERATURE CURING MIXTURE OF REACTIVE BASE RESIN AND A CLATHRATE COMPRISING A TETRAKISPHENOL HOSTING A CURING AGENT OR CURING CATALYST; STORAGE STABILITY, CORROSION RESISTANCE, ADHESION KANSAI PAINT CO., LTD. (JP) 2000-11-14 US disclosed
US-6140027-A WATER SOLUBLE AMINE, POLAR ORGANIC SOLVENT, TRIAZOLE COMPOUND AND SILICONE SURFACTANT DONGJIN SEMICHEM CO., LTD. (KR) 2000-10-31 US disclosed
US-6013407-A PHOTORESISTS WITH PHENOLIC RESINS, QUINONEDIAZIDE SULFONATES, PHOTOSENSITIVE AGENTS AND PHENOLIC COMPOUNDS NIPPON ZEON CO., LTD. (JP) 2000-01-11 US disclosed
EP-0739877-B1 Epoxy resin, resin composition, and resin-encapsulated semiconductor device SUMITOMO CHEMICAL CO (JP) 1999-08-04 EP disclosed
US-5780145-A CURED EPXOY AND OR IMIDE RESINS WITH FILLERS AND GLOBULAR POWDER WITH SPECIFIC PARTICLE SIZE USED AS A SEALING MATERIALS FOR SEMICONDUCTORS SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 1998-07-14 US disclosed
EP-0831370-A1 POSITIVE RESIST COMPOSITION NIPPON ZEON CO., LTD. (JP) 1998-03-25 EP disclosed
EP-0739877-A2 Epoxy resin, resin composition, and resin-encapsulated semiconductor device SUMITOMO CHEMICAL COMPANY LIMITED (JP) 1996-10-30 EP disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (2 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-20100274006-A1 Clathrate compound, method for controlling concentration of aqueous agricultural chemical active ingredient solution, and agricultural chemical formulation STOM, ALB, GANC ESR1 3645/4885ESR2 4000/4885PDCD1 1605/4885
US-20070281929-A1 Clathrate Compound, Method for Controlling Concentration of Aqueous Agricultural Chemical Active Ingredient Solution, and Agricultural Chemical Formulation CA3, CA2, STOM ESR1 3979/4885ESR2 4159/4885PDCD1 2475/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.