Predicted protein targets (top 16)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | ALDH1A1 | P00352 | 3/20 | 0.45 |
| ▸ | LMNA | P02545 | 1/20 | 0.45 |
| ▸ | KMT2A | Q03164 | 2/20 | 0.44 |
| ▸ | MEN1 | O00255 | 1/20 | 0.44 |
| ▸ | GRIN2D | O15399 | 3/20 | 0.42 |
| ▸ | GRIN3B | O60391 | 3/20 | 0.42 |
| ▸ | GRIN1 | Q05586 | 3/20 | 0.42 |
| ▸ | GRIN2A | Q12879 | 3/20 | 0.42 |
| ▸ | GRIN2B | Q13224 | 3/20 | 0.42 |
| ▸ | GRIN2C | Q14957 | 3/20 | 0.42 |
| ▸ | GRIN3A | Q8TCU5 | 3/20 | 0.42 |
| ▸ | TSHR | P16473 | 1/20 | 0.41 |
| ▸ | GAA | P10253 | 1/20 | 0.40 |
| ▸ | EPHX2 | P34913 | 2/20 | 0.36 |
| ▸ | POLB | P06746 | 1/20 | 0.35 |
| ▸ | HTT | P42858 | 1/20 | 0.35 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL602378 | 0.84 | ALDH1A1 (0.52) | ALDH1A1LMNAKMT2AMEN1GRIN2D | |
| SCHEMBL11697772 | 0.82 | GRIN2D (0.50) | LMNAKMT2AMEN1GRIN2DGRIN3B | |
| SCHEMBL4044998 | 0.80 | MEN1 (0.55) | LMNAKMT2AMEN1GRIN2DGRIN3B | |
| SCHEMBL1938937 | 0.80 | GRIN2D (0.61) | KMT2AMEN1GRIN2DGRIN3BGRIN1 | |
| SCHEMBL3160856 | 0.80 | MEN1 (0.61) | LMNAKMT2AMEN1GRIN2DGRIN3B | |
| SCHEMBL14696641 | 0.78 | GRIN2D (0.59) | ALDH1A1LMNAKMT2AMEN1GRIN2D | |
| SCHEMBL14696512 | 0.78 | MEN1 (0.64) | LMNAKMT2AMEN1GRIN2DGRIN3B | |
| SCHEMBL16449047 | 0.78 | MEN1 (0.44) | LMNAKMT2AMEN1GRIN2DGRIN3B | |
| SCHEMBL1939649 | 0.77 | GRIN2D (0.46) | ALDH1A1KMT2AMEN1GRIN2DGRIN3B | |
| SCHEMBL19154514 | 0.77 | GRIN2D (0.50) | KMT2AMEN1GRIN2DGRIN3BGRIN1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 31 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-11681222-B2 | Fluorine-containing polymer, purification method, and radiation-sensitive resin composition | JSR CORPORATION (JP) | 2023-06-20 | — | — | US | disclosed |
| US-20220137508-A9 | FLUORINE-CONTAINING POLYMER, PURIFICATION METHOD, AND RADIATION-SENSITIVE RESIN COMPOSITION | JSR CORPORATION (JP) | 2022-05-05 | — | — | US | disclosed |
| US-20210278764-A1 | FLUORINE-CONTAINING POLYMER, PURIFICATION METHOD, AND RADIATION-SENSITIVE RESIN COMPOSITION | JSR CORPORATION (JP) | 2021-09-09 | — | — | US | disclosed |
| US-11036133-B2 | Fluorine-containing polymer, purification method, and radiation-sensitive resin composition | JSR CORPORATION (JP) | 2021-06-15 | — | — | US | disclosed |
| US-20200124961-A1 | FLUORINE-CONTAINING POLYMER, PURIFICATION METHOD, AND RADIATION-SENSITIVE RESIN COMPOSITION | JSR CORPORATION (JP) | 2020-04-23 | — | — | US | disclosed |
| US-10620534-B2 | Fluorine-containing polymer, purification method, and radiation-sensitive resin composition | JSR CORPORATION (JP) | 2020-04-14 | — | — | US | disclosed |
| US-20190278175-A9 | FLUORINE-CONTAINING POLYMER, PURIFICATION METHOD, AND RADIATION-SENSITIVE RESIN COMPOSITION | JSR CORPORATION (JP) | 2019-09-12 | — | — | US | disclosed |
| US-20190025695-A1 | FLUORINE-CONTAINING POLYMER, PURIFICATION METHOD, AND RADIATION-SENSITIVE RESIN COMPOSITION | JSR CORPORATION (JP) | 2019-01-24 | — | — | US | disclosed |
| US-10082733-B2 | Fluorine-containing polymer, purification method, and radiation-sensitive resin composition | JSR CORPORATION (JP) | 2018-09-25 | — | — | US | disclosed |
| US-9726974-B2 | Resin, photoresist composition, and method for producing photoresist pattern | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2017-08-08 | — | — | US | disclosed |
| US-20120164582-A1 | RADIATION-SENSITIVE COMPOSITION AND COMPOUND | JSR CORPORATION (JP) | 2012-06-28 | — | — | US | disclosed |
| US-20110143279-A1 | RADIATION-SENSITIVE RESIN COMPOSITION | JSR CORPORATION (JP) | 2011-06-16 | — | — | US | disclosed |
| US-20110112306-A1 | Novel Sulfonic Acid Salt and Derivative thereof, Photo-Acid Generator, and Process for Production of Sulfonic Acid Salt | CENTRAL GLASS COMPANY, LIMITED (JP) | 2011-05-12 | — | — | US | disclosed |
| US-20090156854-A1 | ADAMANTANE DERIVATIVES AND PROCESS FOR PRODUCING THE SAME | IDEMITSU KOSAN CO., LTD. (JP) | 2009-06-18 | — | — | US | disclosed |
| US-7528279-B2 | Adamantane derivatives and process for producing the same | IDEMITSU KOSAN CO., LTD. (JP) | 2009-05-05 | — | — | US | disclosed |
| EP-2003148-A9 | FLUORINE-CONTAINING POLYMER, PURIFICATION METHOD, AND RADIATION-SENSITIVE RESIN COMPOSITION | JSR Corporation (JP) | 2009-04-22 | — | — | EP | disclosed |
| EP-2003148-A2 | FLUORINE-CONTAINING POLYMER, PURIFICATION METHOD, AND RADIATION-SENSITIVE RESIN COMPOSITION | JSR Corporation (JP) | 2008-12-17 | — | — | EP | disclosed |
| US-20070129532-A1 | Adamantane derivatives and process for producing the same | IDEMITSU KOSAN CO., LTD (JP) | 2007-06-07 | — | — | US | disclosed |
| EP-1712542-A1 | ADAMANTANE DERIVATIVES AND PROCESS FOR PRODUCING THE SAME | IDEMITSU KOSAN CO., LTD. (JP) | 2006-10-18 | — | — | EP | disclosed |
| EP-1602975-A1 | RADIATION-SENSITIVE RESIN COMPOSITION | JSR Corporation (JP) | 2005-12-07 | — | — | EP | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (3 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-20090156854-A1 | ADAMANTANE DERIVATIVES AND PROCESS FOR PRODUCING THE SAME | ADH1A, ADH5, TAS1R2 | ALDH1A1 7/4885LMNA 1642/4885KMT2A 2721/4885 |
| US-20110112306-A1 | Novel Sulfonic Acid Salt and Derivative thereof, Photo-Acid Generator, and Process for Production of Sulfonic Acid Salt | ASIC1, FGFR1, PFAS | ALDH1A1 1719/4885LMNA 4546/4885KMT2A 910/4885 |
| US-20120164582-A1 | RADIATION-SENSITIVE COMPOSITION AND COMPOUND | RAD51, RER1, ATP6AP1 | ALDH1A1 1300/4885LMNA 3748/4885KMT2A 2301/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.