Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | CTSS | P25774 | 3/20 | 0.36 |
| ▸ | FAAH | O00519 | 2/20 | 0.35 |
| ▸ | HSF1 | Q00613 | 4/20 | 0.33 |
| ▸ | RBP4 | P02753 | 1/20 | 0.32 |
| ▸ | GABRP | O00591 | 1/20 | 0.32 |
| ▸ | GABRD | O14764 | 1/20 | 0.32 |
| ▸ | GABRA1 | P14867 | 1/20 | 0.32 |
| ▸ | GABRB1 | P18505 | 1/20 | 0.32 |
| ▸ | GABRG2 | P18507 | 1/20 | 0.32 |
| ▸ | GABRB3 | P28472 | 1/20 | 0.32 |
| ▸ | GABRA5 | P31644 | 1/20 | 0.32 |
| ▸ | GABRA3 | P34903 | 1/20 | 0.32 |
| ▸ | GABRA2 | P47869 | 1/20 | 0.32 |
| ▸ | GABRB2 | P47870 | 1/20 | 0.32 |
| ▸ | GABRA4 | P48169 | 1/20 | 0.32 |
| ▸ | GABRE | P78334 | 1/20 | 0.32 |
| ▸ | GABRA6 | Q16445 | 1/20 | 0.32 |
| ▸ | GABRG1 | Q8N1C3 | 1/20 | 0.32 |
| ▸ | GABRG3 | Q99928 | 1/20 | 0.32 |
| ▸ | GABRQ | Q9UN88 | 1/20 | 0.32 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL16745522 | 0.72 | CTSS (0.45) | CTSSFAAHXDHNLRP3 | |
| SCHEMBL10150823 | 0.71 | P2RX7 (0.38) | FAAHLMNA | |
| SCHEMBL17736503 | 0.70 | CYP1A2 (0.37) | CTSSHSF1XDHLMNAHTT | |
| SCHEMBL17341902 | 0.69 | FAAH (0.44) | CTSSFAAHHSF1RBP4GABRP | |
| SCHEMBL17736500 | 0.67 | XDH (0.39) | FAAHHSF1XDHTLR4NLRP3 | |
| SCHEMBL961708 | 0.65 | KMT2A (0.37) | SMN1; SMN2 | |
| SCHEMBL17736490 | 0.65 | CYP1A2 (0.38) | FAAHHSF1XDHLMNAHTT | |
| SCHEMBL10150841 | 0.64 | P2RX7 (0.32) | — | |
| SCHEMBL10150837 | 0.64 | SCN9A (0.37) | LMNAMAPT | |
| SCHEMBL26191695 | 0.63 | EPHX2 (0.41) | FAAH |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-20160131976-A1 | RESIST COMPOSITION FOR SEMICONDUCTOR MANUFACTURING PROCESS; RESIST FILM, RESIST-COATED MASK BLANKS, PHOTOMASK, AND RESIST PATTERNING METHOD USING SAID RESIST COMPOSITION; ELECTRONIC-DEVICE MANUFACTURING METHOD; AND ELECTRONIC DEVICE | FUJIFILM CORPORATION (JP) | 2016-05-12 | — | — | US | disclosed |
| US-20160131976-A1 | RESIST COMPOSITION FOR SEMICONDUCTOR MANUFACTURING PROCESS; RESIST FILM, RESIST-COATED MASK BLANKS, PHOTOMASK, AND RESIST PATTERNING METHOD USING SAID RESIST COMPOSITION; ELECTRONIC-DEVICE MANUFACTURING METHOD; AND ELECTRONIC DEVICE | FUJIFILM CORPORATION (JP) | 2016-05-12 | — | — | US | disclosed |