SCHEMBL17995259

SCHEMBL17995259

CNC(c1ccccc1)S(=O)(=O)c1ccccc1

nearest known ligand 0.44

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
ALDH1A1 P00352 2/20 0.44
LMNA P02545 2/20 0.44
MAPT P10636 2/20 0.44
KMT2A Q03164 2/20 0.44
KDM4E B2RXH2 1/20 0.44
GMNN O75496 1/20 0.44
POLB P06746 1/20 0.44
HPGD P15428 1/20 0.44
PMP22 Q01453 1/20 0.44
NPSR1 Q6W5P4 1/20 0.44
TDP1 Q9NUW8 1/20 0.44
HSD11B1 P28845 1/20 0.41
CA2 P00918 3/20 0.40
CA1 P00915 2/20 0.40
CA12 O43570 1/20 0.40
CA9 Q16790 1/20 0.40
GBA1 P04062 1/20 0.40
HTR6 P50406 2/20 0.39
PSIP1 O75475 1/20 0.39
TSHR P16473 2/20 0.38

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL13848475 0.89 NPY2R (0.47) ALDH1A1LMNAMAPTKMT2AKDM4E
SCHEMBL28530197 0.78 KMT2A (0.55) ALDH1A1LMNAMAPTKMT2AKDM4E
SCHEMBL14625479 0.75 ALDH1A1 (0.48) ALDH1A1LMNAMAPTKMT2ATDP1
SCHEMBL3097296 0.74 RECQL (0.44) ALDH1A1MAPTKMT2ACYP2C9CYP2C19
SCHEMBL5295498 0.73 HSD11B1 (0.46) KMT2AHSD11B1CA2CA1CA12
SCHEMBL8560061 0.73 ALDH1A1 (0.54) ALDH1A1LMNAMAPTKMT2AHPGD
SCHEMBL11848869 0.72 HTR6 (0.44) ALDH1A1LMNAMAPTKMT2AKDM4E
SCHEMBL13848289 0.72 TP53 (0.46) ALDH1A1LMNAKMT2ATSHRTP53
SCHEMBL4256511 0.72 LMNA (0.48) ALDH1A1LMNATDP1CA2CA1
SCHEMBL23720154 0.72 HTR6 (0.48) ALDH1A1TDP1HSD11B1CA2CA1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20170097567-A1 METHOD FOR PRODUCING POLYMER SHIN-ETSU CHEMICAL CO., LTD. (JP) 2017-04-06 US disclosed
US-20160229940-A1 POLYMER, RESIST COMPOSITION, AND PATTERN FORMING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2016-08-11 US disclosed