Predicted protein targets (top 19)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | KIF11 | P52732 | 1/20 | 0.47 |
| ▸ | MEN1 | O00255 | 1/20 | 0.39 |
| ▸ | KMT2A | Q03164 | 1/20 | 0.39 |
| ▸ | CA1 | P00915 | 4/20 | 0.39 |
| ▸ | CA2 | P00918 | 4/20 | 0.39 |
| ▸ | PTGS2 | P35354 | 4/20 | 0.39 |
| ▸ | CA9 | Q16790 | 2/20 | 0.39 |
| ▸ | PTGS1 | P23219 | 2/20 | 0.39 |
| ▸ | CA12 | O43570 | 1/20 | 0.39 |
| ▸ | MAPT | P10636 | 1/20 | 0.39 |
| ▸ | HTR2A | P28223 | 1/20 | 0.39 |
| ▸ | HTR2C | P28335 | 1/20 | 0.39 |
| ▸ | MMP1 | P03956 | 2/20 | 0.38 |
| ▸ | AKR1B1 | P15121 | 1/20 | 0.38 |
| ▸ | CYP19A1 | P11511 | 1/20 | 0.38 |
| ▸ | ALDH1A1 | P00352 | 1/20 | 0.37 |
| ▸ | BCHE | P06276 | 1/20 | 0.37 |
| ▸ | ACHE | P22303 | 1/20 | 0.37 |
| ▸ | MLYCD | O95822 | 1/20 | 0.37 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL547560 | 0.93 | HSD11B1 (0.44) | KIF11MEN1KMT2ACYP19A1ALDH1A1 | |
| SCHEMBL503480 | 0.92 | ALDH1A1 (0.44) | KIF11MEN1KMT2ACA1CA2 | |
| SCHEMBL1801287 | 0.92 | CNR2 (0.44) | KIF11MAPTALDH1A1 | |
| Toliodium SCHEMBL2902858 | 0.92 | ALDH1A1 (0.49) | KIF11MEN1KMT2ACA1CA2 | |
| SCHEMBL548081 | 0.92 | ALDH1A1 (0.49) | KIF11MEN1KMT2ACA1CA2 | |
| SCHEMBL503538 | 0.91 | ALDH1A1 (0.43) | KIF11MEN1KMT2AMAPTCYP19A1 | |
| SCHEMBL5422183 | 0.87 | CA1 (0.41) | KIF11MEN1KMT2ACA1CA2 | |
| SCHEMBL5408487 | 0.87 | BCHE (0.43) | KIF11MEN1KMT2ACA1CA2 | |
| Trifluoromethanesulfonic Acid SCHEMBL548506 | 0.86 | KIF11 (0.44) | KIF11MEN1KMT2ACA1CA2 | |
| SCHEMBL5412549 | 0.86 | CA1 (0.38) | KIF11MEN1KMT2ACA1CA2 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 37 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-8809476-B2 | Polymer | JSR CORPORATION (JP) | 2014-08-19 | — | — | US | disclosed |
| US-8771923-B2 | Radiation-sensitive composition | JSR CORPORATION (JP) | 2014-07-08 | — | — | US | disclosed |
| US-20130108962-A1 | RADIATION-SENSITIVE COMPOSITION | JSR CORPORATION (JP) | 2013-05-02 | — | — | US | disclosed |
| US-8389202-B2 | Polymer, radiation-sensitive composition, monomer, and method of producing compound | JSR CORPORATION (JP) | 2013-03-05 | — | — | US | disclosed |
| US-20130053526-A1 | POLYMER | JSR CORPORATION (JP) | 2013-02-28 | — | — | US | disclosed |
| US-8377627-B2 | Compound and radiation-sensitive composition | JSR CORPORATION (JP) | 2013-02-19 | — | — | US | disclosed |
| US-8361691-B2 | Radiation-sensitive composition and process for producing low-molecular compound for use therein | JSR CORPORATION (JP) | 2013-01-29 | — | — | US | disclosed |
| US-8334087-B2 | Polymer, radiation-sensitive composition, monomer, and method of producing compound | JSR CORPORATION (JP) | 2012-12-18 | — | — | US | disclosed |
| US-20120178024-A1 | POLYMER, RADIATION-SENSITIVE COMPOSITION, MONOMER, AND METHOD OF PRODUCING COMPOUND | JSR CORPORATION (JP) | 2012-07-12 | — | — | US | disclosed |
| US-8173351-B2 | Compound and radiation-sensitive composition | JSR CORPORATION (JP) | 2012-05-08 | — | — | US | disclosed |
| US-6824954-B2 | DIHALOMETHYL SULFONYLOXIME COMPOUNDS; FOR EXAMPLE, 2,2-DIFLUORO-2-METHYLACETOPHENONE-O-METHYLSULFONYLOXIME; HEAT STABILITY AND STORAGE STABILITY; SENSITIVE TO FAR ULTRAVIOLET RADIATION OR ELECTRON BEAMS; RESISTS | JSR CORPORATION (JP) | 2004-11-30 | — | — | US | disclosed |
| US-6821705-B2 | USED AS CHEMICALLY AMPLIFIED RESIST, EXHIBITS HIGH SENSITIVITY, RESOLUTION, RADIATION TRANSMITTANCE, AND SURFACE SMOOTHNESS, AND IS FREE FROM THE PROBLEM OF PARTIAL INSOLUBLIZATION DURING OVEREXPOSURE | JSR CORPORATION (JP) | 2004-11-23 | — | — | US | disclosed |
| US-6770780-B1 | QUATERNIZATION OF T-BUTYL BROMOACETATE WITH TRI(N-BUTYL)PHOSPHINE TO FORM PHOSPHONIUM SALT; REACTING WITH BASE TO FORM PHOSPHORUS YLIDE; FORMING 2,4,6-TRIS(3', 5'-DI-T-BUTYL-4'-HYDROXYBENZYL)METHYL-STYRENE; HYDROLYSIS | JSR CORPORATION (JP) | 2004-08-03 | — | — | US | disclosed |
| US-20030194634-A1 | Novel anthracene derivative and radiation-sensitive resin composition | JSR CORPORATION (JP) | 2003-10-16 | — | — | US | disclosed |
| EP-1343048-A2 | Anthracene derivative and radiation-sensitive resin composition | JSR Corporation (JP) | 2003-09-10 | — | — | EP | disclosed |
| US-20030113658-A1 | Acid generator, sulfonic acid, sulfonic acid derivatives and radiation-sensitive resin composition | JSR CORPORATION (JP) | 2003-06-19 | — | — | US | disclosed |
| US-20030113660-A1 | Sulfonyloxime compound, and radiation sensitive acid generator, positive type radiation sensitive resin composition and negative type radiation sensitive resin composition using same | JSR CORPORATION (JP) | 2003-06-19 | — | — | US | disclosed |
| EP-1270553-A2 | Acid generator, sulfonic acid, sulfonic acid derivatives and radiation-sensitive resin composition | JSR Corporation (JP) | 2003-01-02 | — | — | EP | disclosed |
| EP-1253470-A2 | Radiation-sensitive resin composition | JSR Corporation (JP) | 2002-10-30 | — | — | EP | disclosed |
| EP-1231205-A1 | VINYLPHENYLPROPIONIC ACID DERIVATIVES, PROCESSES FOR PRODUCTION OF THE DERIVATIVES, POLYMERS THEREOF AND RADIOSENSITIVE RESIN COMPOSITIONS | JSR Corporation (JP) | 2002-08-14 | — | — | EP | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (3 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-20030194634-A1 | Novel anthracene derivative and radiation-sensitive resin composition | SRSF1, ARL1, ERCC4 | KIF11 1660/4885MEN1 3535/4885KMT2A 663/4885 |
| US-20120178024-A1 | POLYMER, RADIATION-SENSITIVE COMPOSITION, MONOMER, AND METHOD OF PRODUCING COMPOUND | RAD51, PYM1, MRE11 | KIF11 2586/4885MEN1 312/4885KMT2A 1013/4885 |
| US-20030113658-A1 | Acid generator, sulfonic acid, sulfonic acid derivatives and radiation-sensitive resin composition | ASIC1, PFAS, RARA | KIF11 4209/4885MEN1 3910/4885KMT2A 1845/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.