Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | APEX1 | P27695 | 1/20 | 0.34 |
| ▸ | RAB9A | P51151 | 3/20 | 0.33 |
| ▸ | NPC1 | O15118 | 2/20 | 0.33 |
| ▸ | L3MBTL1 | Q9Y468 | 3/20 | 0.32 |
| ▸ | ALDH1A1 | P00352 | 3/20 | 0.32 |
| ▸ | KDM4E | B2RXH2 | 2/20 | 0.32 |
| ▸ | MAPT | P10636 | 2/20 | 0.32 |
| ▸ | SCN5A | Q14524 | 1/20 | 0.32 |
| ▸ | SCN2A | Q99250 | 1/20 | 0.32 |
| ▸ | HPGD | P15428 | 2/20 | 0.32 |
| ▸ | SMN1; SMN2 | Q16637 | 2/20 | 0.32 |
| ▸ | GPR52 | Q9Y2T5 | 1/20 | 0.32 |
| ▸ | PDK2 | Q15119 | 2/20 | 0.32 |
| ▸ | RECQL | P46063 | 1/20 | 0.32 |
| ▸ | TDP1 | Q9NUW8 | 3/20 | 0.31 |
| ▸ | FFAR1 | O14842 | 2/20 | 0.31 |
| ▸ | FFAR4 | Q5NUL3 | 1/20 | 0.31 |
| ▸ | POLB | P06746 | 2/20 | 0.31 |
| ▸ | KMT2A | Q03164 | 1/20 | 0.31 |
| ▸ | HTR7 | P34969 | 1/20 | 0.31 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL18123006 | 0.90 | PDK2 (0.33) | APEX1RAB9ANPC1SMN1; SMN2PDK2 | |
| SCHEMBL26443682 | 0.90 | PDK2 (0.33) | APEX1RAB9ANPC1SMN1; SMN2PDK2 | |
| SCHEMBL18123024 | 0.89 | PDK2 (0.33) | APEX1RAB9ANPC1PDK2POLB | |
| SCHEMBL18123018 | 0.89 | PDK2 (0.33) | APEX1RAB9ANPC1PDK2POLB | |
| SCHEMBL18123032 | 0.88 | PDK2 (0.33) | APEX1RAB9ANPC1L3MBTL1PDK2 | |
| SCHEMBL18123023 | 0.86 | PDK2 (0.38) | RAB9ANPC1PDK2POLBKMT2A | |
| SCHEMBL18374826 | 0.86 | PDK2 (0.31) | APEX1RAB9ANPC1PDK2POLB | |
| SCHEMBL18123033 | 0.86 | APEX1 (0.36) | APEX1RAB9ANPC1L3MBTL1PDK2 | |
| SCHEMBL25911827 | 0.83 | PDK2 (0.35) | RAB9ANPC1ALDH1A1KDM4EMAPT | |
| SCHEMBL18123020 | 0.83 | PDK2 (0.35) | RAB9ANPC1L3MBTL1PDK2KMT2A |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 47 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-20240239922-A1 | PHOTOCURABLE COMPOSITION | TOKYO OHKA KOGYO CO., LTD. (JP) | 2024-07-18 | — | — | US | disclosed |
| US-20240239922-A1 | PHOTOCURABLE COMPOSITION | TOKYO OHKA KOGYO CO., LTD. (JP) | 2024-07-18 | — | — | US | disclosed |
| US-20230242692-A1 | COMPOSITION AND CURED PRODUCT | TOKYO OHKA KOGYO CO., LTD. (JP) | 2023-08-03 | — | — | US | disclosed |
| US-20230242692-A1 | COMPOSITION AND CURED PRODUCT | TOKYO OHKA KOGYO CO., LTD. (JP) | 2023-08-03 | — | — | US | disclosed |
| WO-2023127402-A1 | PHOTOSENSITIVE COMPOSITION, CURED PRODUCT, AND METHOD FOR PRODUCING PATTERNED CURED FILM | 東京応化工業株式会社 | 2023-07-06 | — | — | WO | disclosed |
| WO-2023127401-A1 | PHOTOSENSITIVE COMPOSITION, CURED PRODUCT, AND METHOD FOR PRODUCING PATTERNED CURED FILM | 東京応化工業株式会社 | 2023-07-06 | — | — | WO | disclosed |
| WO-2023120077-A1 | COMPOSITION, AND PHOTOSENSITIVE COMPOSITION | 東京応化工業株式会社 | 2023-06-29 | — | — | WO | disclosed |
| WO-2023120076-A1 | PHOTOSENSITIVE COMPOSITION | 東京応化工業株式会社 | 2023-06-29 | — | — | WO | disclosed |
| WO-2023074265-A1 | PHOTOSENSITIVE COMPOSITION | 東京応化工業株式会社 | 2023-05-04 | — | — | WO | disclosed |
| WO-2023047855-A1 | COMPOSITION AND PHOTOSENSITIVE COMPOSITION | 東京応化工業株式会社 | 2023-03-30 | — | — | WO | disclosed |
| US-9981914-B2 | — | — | 2018-05-29 | — | — | US | disclosed |
| US-9981914-B2 | — | — | 2018-05-29 | — | — | US | disclosed |
| US-20180107114-A1 | PHOTOSENSITIVE RESIN COMPOSITION, POLYAMIDE RESIN, METHOD FOR PRODUCING POLYAMIDE RESIN, COMPOUND, METHOD FOR PRODUCING COMPOUND, METHOD FOR PRODUCING CURED FILM, AND CURED FILM | TOKYO OHKA KOGYO CO LTD (JP) | 2018-04-19 | — | — | US | disclosed |
| US-20180107114-A1 | PHOTOSENSITIVE RESIN COMPOSITION, POLYAMIDE RESIN, METHOD FOR PRODUCING POLYAMIDE RESIN, COMPOUND, METHOD FOR PRODUCING COMPOUND, METHOD FOR PRODUCING CURED FILM, AND CURED FILM | TOKYO OHKA KOGYO CO LTD (JP) | 2018-04-19 | — | — | US | disclosed |
| US-20180086717-A1 | HYDROGEN BARRIER AGENT, HYDROGEN BARRIER FILM FORMING COMPOSITION, HYDROGEN BARRIER FILM, METHOD FOR PRODUCING HYDROGEN BARRIER FILM, AND ELECTRONIC ELEMENT | TOKYO OHKA KOGYO CO., LTD. (JP) | 2018-03-29 | — | — | US | disclosed |
| US-20180086717-A1 | HYDROGEN BARRIER AGENT, HYDROGEN BARRIER FILM FORMING COMPOSITION, HYDROGEN BARRIER FILM, METHOD FOR PRODUCING HYDROGEN BARRIER FILM, AND ELECTRONIC ELEMENT | TOKYO OHKA KOGYO CO., LTD. (JP) | 2018-03-29 | — | — | US | disclosed |
| US-20170160636-A1 | PHOTOSENSITIVE COMPOSITION AND COMPOUND | TOKYO OHKA KOGYO CO., LTD. (JP) | 2017-06-08 | — | — | US | disclosed |
| US-20170160636-A1 | PHOTOSENSITIVE COMPOSITION AND COMPOUND | TOKYO OHKA KOGYO CO., LTD. (JP) | 2017-06-08 | — | — | US | disclosed |
| WO-2017007010-A1 | SILICON-CONTAINING RESIN COMPOSITION | 東京応化工業株式会社 | 2017-01-12 | — | — | WO | disclosed |
| WO-2016158679-A1 | ENERGY-SENSITIVE RESIN COMPOSITION | 東京応化工業株式会社 | 2016-10-06 | — | — | WO | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (3 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-20180107114-A1 | PHOTOSENSITIVE RESIN COMPOSITION, POLYAMIDE RESIN, METHOD FOR PRODUCING POLYAMIDE RESIN, COMPOUND, METHOD FOR PRODUCING COMPOUND, METHOD FOR PRODUCING CURED FILM, AND CURED FILM | RARA, LCP1, CUTA | APEX1 2902/4885RAB9A 2259/4885NPC1 2823/4885 |
| US-20180086717-A1 | HYDROGEN BARRIER AGENT, HYDROGEN BARRIER FILM FORMING COMPOSITION, HYDROGEN BARRIER FILM, METHOD FOR PRODUCING HYDROGEN BARRIER FILM, AND ELECTRONIC ELEMENT | SLC9A2, SLC9A1, NHERF1 | APEX1 365/4885RAB9A 362/4885NPC1 2457/4885 |
| US-20170160636-A1 | PHOTOSENSITIVE COMPOSITION AND COMPOUND | C1R, CRY1, C1S | APEX1 871/4885RAB9A 2362/4885NPC1 1861/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.