SCHEMBL18574324

SCHEMBL18574324

COC(C)(C)c1ccc(C(C)(C)CC(C)I)cc1

nearest known ligand 0.35

Predicted protein targets (top 8)

geneUniProtsupporting neighboursconfidence
GRIN2D O15399 1/20 0.34
GRIN3B O60391 1/20 0.34
GRIN1 Q05586 1/20 0.34
GRIN2A Q12879 1/20 0.34
GRIN2B Q13224 1/20 0.34
GRIN2C Q14957 1/20 0.34
GRIN3A Q8TCU5 1/20 0.34
RORC P51449 1/20 0.31

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL18574477 0.77 SHBG (0.53)
SCHEMBL22827348 0.76 SLC6A2 (0.36) GRIN2DGRIN3BGRIN1GRIN2AGRIN2B
SCHEMBL43313 0.74 MAPK1 (0.46) RORC
SCHEMBL19261583 0.70 RORC (0.33) RORC
SCHEMBL18574474 0.70 HSD17B2 (0.46)
SCHEMBL17306153 0.70 CYP2D6 (0.44) GRIN2DGRIN3BGRIN1GRIN2AGRIN2B
SCHEMBL23366127 0.69 ALOX15 (0.52) RORC
SCHEMBL18905275 0.69 MAPK1 (0.37) RORC
SCHEMBL18253223 0.68 TSHR (0.50)
SCHEMBL4188808 0.68 KIF11 (0.41) RORC

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 1 patent. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20170059990-A1 RADIATION-SENSITIVE OR ACTINIC RAY-SENSITIVE RESIN COMPOSITION, RESIST FILM USING THE SAME, MASK BLANK, RESIST PATTERN FORMING METHOD, ELECTRONIC DEVICE MANUFACTURING METHOD, AND ELECTRONIC DEVICE FUJIFILM CORPORATION (JP) 2017-03-02 US disclosed