Predicted protein targets (top 11)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | NFE2L2 | Q16236 | 1/20 | 0.33 |
| ▸ | HMGCR | P04035 | 1/20 | 0.32 |
| ▸ | CYP3A4 | P08684 | 1/20 | 0.32 |
| ▸ | MEN1 | O00255 | 2/20 | 0.32 |
| ▸ | KMT2A | Q03164 | 2/20 | 0.32 |
| ▸ | LMNA | P02545 | 1/20 | 0.32 |
| ▸ | THRB | P10828 | 1/20 | 0.32 |
| ▸ | BLM | P54132 | 1/20 | 0.32 |
| ▸ | TDP1 | Q9NUW8 | 1/20 | 0.32 |
| ▸ | ALDH1A1 | P00352 | 1/20 | 0.31 |
| ▸ | TSHR | P16473 | 1/20 | 0.31 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL333121 | 0.87 | NFE2L2 (0.41) | NFE2L2HMGCRCYP3A4MEN1KMT2A | |
| SCHEMBL333122 | 0.87 | NFE2L2 (0.41) | NFE2L2HMGCRCYP3A4MEN1KMT2A | |
| SCHEMBL17591558 | 0.87 | NFE2L2 (0.41) | NFE2L2HMGCRCYP3A4MEN1KMT2A | |
| SCHEMBL30335453 | 0.87 | NFE2L2 (0.41) | NFE2L2HMGCRCYP3A4MEN1KMT2A | |
| Lithium SCHEMBL17871408 | 0.84 | NFE2L2 (0.39) | NFE2L2HMGCRCYP3A4MEN1KMT2A | |
| SCHEMBL17871404 | 0.84 | NFE2L2 (0.39) | NFE2L2HMGCRCYP3A4MEN1KMT2A | |
| SCHEMBL17871407 | 0.84 | NFE2L2 (0.39) | NFE2L2HMGCRCYP3A4MEN1KMT2A | |
| SCHEMBL9713659 | 0.81 | MEN1 (0.44) | NFE2L2MEN1KMT2ALMNATHRB | |
| SCHEMBL15711504 | 0.75 | NFE2L2 (0.33) | NFE2L2HMGCRCYP3A4MEN1KMT2A | |
| SCHEMBL1020031 | 0.75 | LMNA (0.65) | MEN1KMT2ALMNATHRBBLM |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 9 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-11527721-B2 | Electroactive materials | LG CHEM, LTD. | 2022-12-13 | — | — | US | disclosed |
| US-20220204521-A1 | ELECTROACTIVE COMPOUNDS | U.S. BANK TRUST COMPANY, NATIONAL ASSOCIATION, AS NOTES COLLATERAL AGENT | 2022-06-30 | — | — | US | disclosed |
| US-20210070685-A1 | COMPOUND, RESIN, COMPOSITION, RESIST PATTERN FORMATION METHOD AND CIRCUIT PATTERN FORMATION METHOD | MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) | 2021-03-11 | — | — | US | disclosed |
| US-20200216614-A1 | LOW-COLOR POLYMERS FOR USE IN ELECTRONIC DEVICES | DUPONT ELECTRONICS, INC. | 2020-07-09 | — | — | US | disclosed |
| US-20190181344-A1 | ELECTROACTIVE MATERIALS | LG CHEM, LTD. (KR) | 2019-06-13 | — | — | US | disclosed |
| US-20180107113-A1 | RESIST BASE MATERIAL, RESIST COMPOSITION AND METHOD FOR FORMING RESIST PATTERN | MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) | 2018-04-19 | — | — | US | disclosed |
| US-20180081270-A1 | RADIATION-SENSITIVE COMPOSITION, AMORPHOUS FILM, AND METHOD FOR FORMING RESIST PATTERN | MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) | 2018-03-22 | — | — | US | disclosed |
| EP-3279728-A1 | RESIST BASE MATERIAL, RESIST COMPOSITION, AND METHOD FOR FORMING RESIST PATTERN | Mitsubishi Gas Chemical Company, Inc. (JP) | 2018-02-07 | — | — | EP | disclosed |
| WO-2017043561-A1 | COMPOUND, RESIN, RESIST COMPOSITION OR RADIATION-SENSITIVE COMPOSITION, METHOD FOR FORMING RESIST PATTERN, METHOD FOR PRODUCING AMORPHOUS FILM, MATERIAL FOR FORMING LITHOGRAPHIC UNDERLAYER FILM, COMPOSTION FOR FORMING LITHOGRAPHIC UNDERLAYER FILM, METHOD FOR FORMING CIRCUIT PATTERN, AND PURIFICATION METHOD | 三菱瓦斯化学株式会社 | 2017-03-16 | — | — | WO | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (5 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-20190181344-A1 | ELECTROACTIVE MATERIALS | NR5A1, AR, NR3C2 | NFE2L2 357/4885HMGCR 4525/4885CYP3A4 1013/4885 |
| US-20210070685-A1 | COMPOUND, RESIN, COMPOSITION, RESIST PATTERN FORMATION METHOD AND CIRCUIT PATTERN FORMATION METHOD | RER1, RTN4, FEM1B | NFE2L2 2886/4885HMGCR 1677/4885CYP3A4 2950/4885 |
| US-20180107113-A1 | RESIST BASE MATERIAL, RESIST COMPOSITION AND METHOD FOR FORMING RESIST PATTERN | CROCC, REV1, PARG | NFE2L2 3310/4885HMGCR 2772/4885CYP3A4 4727/4885 |
| US-11527721-B2 | Electroactive materials | NR5A1, AR, NR3C2 | NFE2L2 357/4885HMGCR 4525/4885CYP3A4 1013/4885 |
| US-20220204521-A1 | ELECTROACTIVE COMPOUNDS | AHR, CYP1B1, KCNH1 | NFE2L2 572/4885HMGCR 3835/4885CYP3A4 242/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.