SCHEMBL1867153

SCHEMBL1867153

C=Cc1ccc([Si](Oc2ccccc2)(Oc2ccccc2)Oc2ccccc2)cc1

nearest known ligand 0.48

Predicted protein targets (top 11)

geneUniProtsupporting neighboursconfidence
ALDH1A1 P00352 2/20 0.48
TSHR P16473 2/20 0.48
POLB P06746 1/20 0.31
LTA4H P09960 1/20 0.31
CHRNB2 P17787 1/20 0.31
CHRNB4 P30926 1/20 0.31
CHRNA3 P32297 1/20 0.31
CHRNA7 P36544 1/20 0.31
CHRNA4 P43681 1/20 0.31
TDP1 Q9NUW8 1/20 0.31
TRPA1 O75762 1/20 0.31

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL703458 0.83 LTA4H (0.43) ALDH1A1TSHRLTA4HTDP1
SCHEMBL429618 0.79 LTA4H (0.43) ALDH1A1TSHRLTA4HTDP1
SCHEMBL7136137 0.77 ALDH1A1 (0.48) ALDH1A1TSHRPOLBCHRNB2CHRNB4
SCHEMBL7134965 0.74 ALDH1A1 (0.45) ALDH1A1TSHRPOLBCHRNB2CHRNB4
SCHEMBL7133959 0.74 ALDH1A1 (0.45) ALDH1A1TSHRPOLBCHRNB2CHRNB4
SCHEMBL9173253 0.74 MAOA (0.52) ALDH1A1TSHRTDP1
SCHEMBL3878886 0.74 ACHE (0.42) ALDH1A1TSHRPOLBLTA4HTDP1
SCHEMBL5524051 0.73 ALDH1A1 (0.43) ALDH1A1TSHRPOLB
SCHEMBL354205 0.73 ALDH1A1 (0.59) ALDH1A1TSHRLTA4H
SCHEMBL9513816 0.73 ALDH1A1 (0.59) ALDH1A1TSHRLTA4HCHRNB2CHRNB4

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 8 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-1950239-B1 TRANSPARENT INORGANIC-OXIDE DISPERSION, RESIN COMPOSITION CONTAINING INORGANIC OXIDE PARTICLES, COMPOSITION FOR ENCAPSULATING LUMINESCENT ELEMENT, LUMINESCENT ELEMENT, HARD COAT, OPTICAL FUNCTIONAL FILM, OPTICAL PART, AND PROCESS FOR PRODUCING RESIN COMPOSITION CONTAINING INORGANIC OXIDE PARTICLES SUMITOMO OSAKA CEMENT CO LTD (JP) 2017-01-04 EP disclosed
US-8934165-B2 Electrophoretic particle, manufacturing method of electrophoretic particle, electrophoretic dispersed liquid, electrophoretic sheet, electrophoretic apparatus, and electronic equipment SEIKO EPSON CORPORATION (JP) 2015-01-13 US disclosed
US-20130265632-A1 ELECTROPHORETIC PARTICLE, MANUFACTURING METHOD OF ELECTROPHORETIC PARTICLE, ELECTROPHORETIC DISPERSED LIQUID, ELECTROPHORETIC SHEET, ELECTROPHORETIC APPARATUS, AND ELECTRONIC EQUIPMENT SEIKO EPSON CORPORATION (JP) 2013-10-10 US disclosed
US-7985476-B2 Transparent zirconia dispersion and zirconia particle-containing resin composition, composition for sealing light emitting element and light emitting element, hard coat film and optical functional film and optical component, and method for producing zirconia particle-containing resin SUMITOMO OSAKA CEMENT CO., LTD. (JP) 2011-07-26 US disclosed
US-7947125-B1 Fine particle dispersion liquid containing tantalum oxide fine particles, tantalum oxide fine particle-resin composite, and method of producing fine particle dispersion liquid CANON KABUSHIKI KAISHA (JP) 2011-05-24 US disclosed
US-20110105666-A1 FINE PARTICLE DISPERSION LIQUID CONTAINING TANTALUM OXIDE FINE PARTICLES, TANTALUM OXIDE FINE PARTICLE-RESIN COMPOSITE, AND METHOD OF PRODUCING FINE PARTICLE DISPERSION LIQUID CANON KABUSHIKI KAISHA (JP) 2011-05-05 US disclosed
US-20090140284-A1 Transparent Inorganic Oxide Dispersion and Iorganic Oxide Particle-Containing Resin Composition, Composition for Sealing Light Emitting Element and Light Emitting element, Hard Coat Film and Optical Functional Film and Optical Component, and Method for Producing Inorganic Oxide Pariticle-Containing Resin SUMITOMO OSAKA CEMENT CO., LTD. (JP) 2009-06-04 US disclosed
EP-1950239-A1 TRANSPARENT INORGANIC-OXIDE DISPERSION, RESIN COMPOSITION CONTAINING INORGANIC OXIDE PARTICLES, COMPOSITION FOR ENCAPSULATING LUMINESCENT ELEMENT, LUMINESCENT ELEMENT, HARD COAT, OPTICAL FUNCTIONAL FILM, OPTICAL PART, AND PROCESS FOR PRODUCING RESIN COMPOSITION CONTAINING INORGANIC OXIDE PARTICLES SUMITOMO OSAKA CEMENT CO., LTD. (JP) 2008-07-30 EP disclosed