SCHEMBL18802737

SCHEMBL18802737

CC(C)(O)c1cc(CC=O)cc(C(C)(C)O)c1

nearest known ligand 0.32

Predicted protein targets (top 19)

geneUniProtsupporting neighboursconfidence
▸ MEN1 O00255 1/20 0.32
▸ USP2 O75604 1/20 0.32
▸ ALDH1A1 P00352 1/20 0.32
▸ CYP1A2 P05177 1/20 0.32
▸ CYP3A4 P08684 1/20 0.32
▸ CYP2D6 P10635 1/20 0.32
▸ MAPT P10636 1/20 0.32
▸ TSHR P16473 1/20 0.32
▸ MAPK1 P28482 1/20 0.32
▸ BLM P54132 1/20 0.32
▸ KMT2A Q03164 1/20 0.32
▸ ATM Q13315 1/20 0.32
▸ HIF1A Q16665 1/20 0.32
▸ NPSR1 Q6W5P4 1/20 0.32
▸ GABRA1 P14867 1/20 0.30
▸ GABRB2 P47870 1/20 0.30
▸ RXRA P19793 1/20 0.30
▸ RXRB P28702 1/20 0.30
▸ RXRG P48443 1/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL9248524 0.82 GABRA1 (0.42) MEN1USP2ALDH1A1CYP1A2CYP3A4
SCHEMBL1427894 0.78 TP53 (0.40) MEN1TSHRKMT2A
SCHEMBL13585219 0.78 ACE2 (0.30) —
SCHEMBL547556 0.77 GABRA1 (0.35) GABRA1GABRB2
SCHEMBL1427909 0.76 RIPK1 (0.31) —
SCHEMBL548187 0.75 GABRA1 (0.45) MEN1ALDH1A1CYP1A2CYP3A4MAPT
SCHEMBL18802739 0.75 ACHE (0.40) MAPTTSHRGABRA1GABRB2RXRA
SCHEMBL21586939 0.75 HSPA5 (0.39) CYP1A2GABRA1GABRB2RXRARXRB
SCHEMBL17022739 0.74 RXRA (0.37) CYP1A2GABRA1GABRB2RXRARXRB
SCHEMBL5009841 0.74 RXRA (0.38) TSHRRXRARXRBRXRG

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 1 patent. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20170121437-A1 PATTERN FORMING METHOD, METHOD FOR MANUFACTURING ELECTRONIC DEVICE, ELECTRONIC DEVICE, ACTIVE-LIGHT-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, RESIST FILM AND MASK BLANK FUJIFILM CORPORATION (JP) 2017-05-04 — — US disclosed
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