Predicted protein targets (top 17)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | ALDH1A1 | P00352 | 3/20 | 0.34 |
| ▸ | MAPT | P10636 | 2/20 | 0.34 |
| ▸ | MEN1 | O00255 | 1/20 | 0.34 |
| ▸ | KMT2A | Q03164 | 1/20 | 0.34 |
| ▸ | NPSR1 | Q6W5P4 | 1/20 | 0.34 |
| ▸ | GAA | P10253 | 1/20 | 0.33 |
| ▸ | XBP1 | P17861 | 1/20 | 0.33 |
| ▸ | LMNA | P02545 | 1/20 | 0.32 |
| ▸ | EPHX1 | P07099 | 1/20 | 0.31 |
| ▸ | PRKCA | P17252 | 1/20 | 0.31 |
| ▸ | TSHR | P16473 | 1/20 | 0.31 |
| ▸ | SCN1A | P35498 | 1/20 | 0.31 |
| ▸ | SCN2A | Q99250 | 1/20 | 0.31 |
| ▸ | SCN3A | Q9NY46 | 1/20 | 0.31 |
| ▸ | KDM4E | B2RXH2 | 1/20 | 0.31 |
| ▸ | HTT | P42858 | 1/20 | 0.31 |
| ▸ | RECQL | P46063 | 1/20 | 0.31 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL23612661 | 0.84 | — | — | |
| SCHEMBL9924184 | 0.81 | ALDH1A1 (0.35) | ALDH1A1MAPTMEN1KMT2ANPSR1 | |
| SCHEMBL24360863 | 0.81 | ALDH1A1 (0.38) | ALDH1A1MAPTMEN1KMT2ANPSR1 | |
| SCHEMBL9925526 | 0.80 | ALDH1A1 (0.33) | ALDH1A1MAPTMEN1KMT2ANPSR1 | |
| SCHEMBL15746855 | 0.77 | ALDH1A1 (0.33) | ALDH1A1MAPTMEN1KMT2ANPSR1 | |
| SCHEMBL25629772 | 0.77 | MEN1 (0.31) | ALDH1A1MAPTMEN1KMT2ANPSR1 | |
| SCHEMBL18924230 | 0.77 | ALDH1A1 (0.44) | ALDH1A1MAPTMEN1KMT2ANPSR1 | |
| SCHEMBL26849870 | 0.77 | EPHX2 (0.41) | ALDH1A1MAPTMEN1KMT2ANPSR1 | |
| SCHEMBL26188220 | 0.76 | LMNA (0.40) | ALDH1A1MAPTMEN1KMT2ANPSR1 | |
| SCHEMBL19719270 | 0.75 | MAPT (0.32) | MAPT |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 34 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-20230288807-A1 | PHOTORESIST, METHOD OF MANUFACTURING A SEMICONDUCTOR DEVICE AND METHOD OF EXTREME ULTRAVIOLET LITHOGRAPHY | TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD. (TW) | 2023-09-14 | — | — | US | disclosed |
| US-11747726-B2 | Resist composition and method of forming resist pattern | TOKYO OHKA KOGYO CO., LTD. (JP) | 2023-09-05 | — | — | US | disclosed |
| US-11709425-B2 | Resist composition and method of forming resist pattern | TOKYO OHKA KOGYO CO., LTD. (JP) | 2023-07-25 | — | — | US | disclosed |
| US-11703757-B2 | Resist composition and method of forming resist pattern | TOKYO OHKA KOGYO CO., LTD. (JP) | 2023-07-18 | — | — | US | disclosed |
| US-11693313-B2 | Resist composition and method of forming resist pattern | TOKYO OHKA KOGYO CO., LTD. (JP) | 2023-07-04 | — | — | US | disclosed |
| US-11656549-B2 | Resist composition and method of forming resist pattern | TOKYO OHKA KOGYO CO., LTD. (JP) | 2023-05-23 | — | — | US | disclosed |
| US-11635686-B2 | Resist composition, method of forming resist pattern, and compound | TOKYO OHKA KOGYO CO., LTD. (JP) | 2023-04-25 | — | — | US | disclosed |
| US-20220011666-A1 | RESIST COMPOSITION, METHOD OF FORMING RESIST PATTERN, COMPOUND, AND RESIN | TOKYO OHKA KOGYO CO., LTD. (JP) | 2022-01-13 | — | — | US | disclosed |
| US-11221557-B2 | Resist composition, method of forming resist pattern, compound, and acid generator | TOKYO OHKA KOGYO CO., LTD. (JP) | 2022-01-11 | — | — | US | disclosed |
| US-20210364920-A1 | RESIST COMPOSITION AND RESIST PATTERN FORMING METHOD | TOKYO OHKA KOGYO CO., LTD. (JP) | 2021-11-25 | — | — | US | disclosed |
| US-20200174366-A1 | RESIST COMPOSITION, METHOD OF FORMING RESIST PATTERN, AND COMPOUND | TOKYO OHKA KOGYO CO., LTD. (JP) | 2020-06-04 | — | — | US | disclosed |
| US-20200159119-A1 | RESIST COMPOSITION AND METHOD OF FORMING RESIST PATTERN | TOKYO OHKA KOGYO CO., LTD. (JP) | 2020-05-21 | — | — | US | disclosed |
| US-20200135451-A1 | PROTECTIVE COMPOSITION AND METHOD OF FORMING PHOTORESIST PATTERN | TAIWAN SEMICONDUCTOR MANUFACTURING CO., LTD. (TW) | 2020-04-30 | — | — | US | disclosed |
| US-10414918-B2 | Method of preparing polymer compound | TOKYO OHKA KOGYO CO., LTD. (JP) | 2019-09-17 | — | — | US | disclosed |
| US-10394122-B2 | Resist composition, method for forming resist pattern, compound, and acid generator | TOYKO OHKA KOGYO CO., LTD. (JP) | 2019-08-27 | — | — | US | disclosed |
| US-10241406-B2 | Resist composition and method for forming resist pattern | TOKYO OHKA KOGYO CO., LTD. (JP) | 2019-03-26 | — | — | US | disclosed |
| US-20180022916-A1 | METHOD OF PREPARING POLYMER COMPOUND | TOKYO OHKA KOGYO CO., LTD. (JP) | 2018-01-25 | — | — | US | disclosed |
| US-9690194-B2 | Method of forming resist pattern | TOKYO OHKA KOGYO CO., LTD. (JP) | 2017-06-27 | — | — | US | disclosed |
| US-9678423-B2 | Resist composition, method for forming resist pattern, acid generator and compound | TOKYO OHKA KOGYO CO., LTD. (JP) | 2017-06-13 | — | — | US | disclosed |
| US-9671690-B2 | Resist composition, method for forming resist pattern, photo-reactive quencher and compound | TOKYO OHKA KOGYO CO., LTD. (JP) | 2017-06-06 | — | — | US | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (7 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-11709425-B2 | Resist composition and method of forming resist pattern | RER1, RRS1, RXFP4 | ALDH1A1 3475/4885MAPT 4059/4885MEN1 1046/4885 |
| US-11693313-B2 | Resist composition and method of forming resist pattern | C1R, C1S, C9 | ALDH1A1 1921/4885MAPT 3206/4885MEN1 1250/4885 |
| US-10241406-B2 | Resist composition and method for forming resist pattern | RB1, CHD1, SMARCA1 | ALDH1A1 1374/4885MAPT 3748/4885MEN1 874/4885 |
| US-11635686-B2 | Resist composition, method of forming resist pattern, and compound | FXR1, HNRNPA1, RBM3 | ALDH1A1 3035/4885MAPT 2792/4885MEN1 1564/4885 |
| US-20200174366-A1 | RESIST COMPOSITION, METHOD OF FORMING RESIST PATTERN, AND COMPOUND | FXR1, HNRNPA1, RBM3 | ALDH1A1 3035/4885MAPT 2792/4885MEN1 1564/4885 |
| US-10394122-B2 | Resist composition, method for forming resist pattern, compound, and acid generator | RB1, FXR1, CCNA1 | ALDH1A1 1415/4885MAPT 3580/4885MEN1 76/4885 |
| US-11221557-B2 | Resist composition, method of forming resist pattern, compound, and acid generator | RER1, GRM1, RRS1 | ALDH1A1 2200/4885MAPT 4145/4885MEN1 186/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.