SCHEMBL1903577

SCHEMBL1903577

C=Cc1ccc(C(Br)c2ccccc2)cc1

nearest known ligand 0.54

Predicted protein targets (top 16)

geneUniProtsupporting neighboursconfidence
ALDH1A1 P00352 2/20 0.54
TSHR P16473 2/20 0.54
CES2 O00748 1/20 0.35
CES1 P23141 1/20 0.35
TRPA1 O75762 1/20 0.35
HSD17B2 P37059 1/20 0.35
CYP3A4 P08684 1/20 0.34
TDP1 Q9NUW8 1/20 0.33
CYP2C19 P33261 1/20 0.33
PTGS2 P35354 1/20 0.33
HTR2A P28223 1/20 0.32
LMNA P02545 2/20 0.32
MAPK1 P28482 1/20 0.32
HDAC8 Q9BY41 1/20 0.32
DPP4 P27487 2/20 0.32
F2 P00734 1/20 0.32

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL7524035 0.82 ALDH1A1 (0.59) ALDH1A1TSHRHSD17B2CYP3A4TDP1
SCHEMBL12880587 0.82 MAOB (0.44) CES2CES1TRPA1LMNA
SCHEMBL12880577 0.81 CES2 (0.48) TSHRCES2CES1TRPA1HTR2A
SCHEMBL19137403 0.80 ALDH1A1 (0.56) ALDH1A1TSHRHSD17B2TDP1CYP2C19
SCHEMBL9806285 0.78 ALDH1A1 (0.54) ALDH1A1TSHRCYP3A4CYP2C19PTGS2
SCHEMBL67123 0.78 CES2 (0.50) TSHRCES2CES1TRPA1HTR2A
SCHEMBL941251 0.77 ALDH1A1 (0.58) ALDH1A1TSHRTDP1HDAC8
Aminodiphenylmethane SCHEMBL9499747 0.76 ALDH1A1 (0.56) ALDH1A1TSHRHTR2ALMNADPP4
Styrene SCHEMBL490169 0.75 ALDH1A1 (0.93) ALDH1A1TSHRTRPA1TDP1LMNA
Styrene SCHEMBL1194127 0.74 ALDH1A1 (0.61) ALDH1A1TSHRTDP1PTGS2LMNA

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 5 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20110198730-A1 HYPERBRANCHED POLYMER SYNTHESIZING METHOD, HYPERBRANCHED POLYMER, RESIST COMPOSITION, SEMICONDUCTOR INTEGRATED CIRCUIT, AND SEMICONDUCTOR INTEGRATED CIRCUIT FABRICATION METHOD LION CORPORATION 2011-08-18 US disclosed
US-20110101503-A1 HYPERBRANCHED POLYMER SYNTHESIZING METHOD, HYPERBRANCHED POLYMER, RESIST COMPOSITION, SEMICONDUCTOR INTEGRATED CIRCUIT, AND SEMICONDUCTOR INTEGRATED CIRCUIT FABRICATION METHOD LION CORPORATION (JP) 2011-05-05 US disclosed
US-20080160449-A1 Photoresist polymer having nano-smoothness and etching resistance, and resist composition LION CORPORATION (JP) 2008-07-03 US disclosed
US-20070148585-A1 Hyperbranched polymer, production method therefor and resist composition containing hyperbranched polymer LION CORPORATION. 2007-06-28 US disclosed
EP-1698645-A1 HYPERBRANCHED POLYMER, PROCESS FOR PRODUCING THE SAME AND RESIST COMPOSITION CONTAINING THE HYPERBRANCHED POLYMER Lion Corporation (JP) 2006-09-06 EP disclosed