SCHEMBL19141832

SCHEMBL19141832

CCC(C)c1ccc(OCC(=O)N(Cc2ccccc2)c2ccc(C)cc2)cc1

nearest known ligand 0.58

Predicted protein targets (top 18)

geneUniProtsupporting neighboursconfidence
▸ GAA P10253 2/20 0.58
▸ SMN1; SMN2 Q16637 2/20 0.58
▸ TRPM8 Q7Z2W7 3/20 0.58
▸ ALDH1A1 P00352 2/20 0.53
▸ TSHR P16473 1/20 0.53
▸ CNR2 P34972 1/20 0.50
▸ MEN1 O00255 2/20 0.49
▸ KMT2A Q03164 2/20 0.49
▸ HTT P42858 1/20 0.49
▸ L3MBTL1 Q9Y468 1/20 0.49
▸ TP53 P04637 2/20 0.48
▸ POLB P06746 1/20 0.48
▸ LTB4R2 Q9NPC1 1/20 0.47
▸ MAPT P10636 1/20 0.47
▸ THRB P10828 1/20 0.47
▸ NPC1 O15118 1/20 0.46
▸ RAB9A P51151 1/20 0.46
▸ MAPK1 P28482 1/20 0.46

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL11922866 0.89 ALDH1A1 (0.53) GAASMN1; SMN2TRPM8ALDH1A1TSHR
SCHEMBL2719444 0.86 SMN1; SMN2 (0.71) GAASMN1; SMN2TRPM8ALDH1A1CNR2
SCHEMBL2717555 0.78 GAA (0.67) GAASMN1; SMN2TRPM8ALDH1A1MEN1
SCHEMBL11922897 0.76 GAA (0.48) GAASMN1; SMN2TRPM8ALDH1A1TSHR
SCHEMBL17230201 0.75 TRPM8 (0.64) GAASMN1; SMN2TRPM8ALDH1A1MEN1
SCHEMBL11922895 0.74 ALDH1A1 (0.53) GAASMN1; SMN2ALDH1A1TSHRMEN1
SCHEMBL5448297 0.74 ALOX5 (0.51) L3MBTL1NPC1RAB9A
SCHEMBL2716702 0.74 TRPM8 (1.00) GAASMN1; SMN2TRPM8ALDH1A1TSHR
Hydrochloric Acid SCHEMBL4983349 0.73 ALOX5 (0.50) L3MBTL1NPC1RAB9A
SCHEMBL2717321 0.72 TRPM8 (0.70) GAASMN1; SMN2TRPM8MEN1KMT2A

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 1 patent. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-2707776-B1 POSITIVE RESIST COMPOSITION, AND RESIST FILM, RESIST-COATED MASK BLANK AND RESIST PATTERN FORMING METHOD EACH USING THE COMPOSITION FUJIFILM CORP (JP) 2017-07-19 — — EP disclosed
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