Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | ALDH1A1 | P00352 | 3/20 | 0.44 |
| ▸ | LMNA | P02545 | 3/20 | 0.42 |
| ▸ | SMN1; SMN2 | Q16637 | 1/20 | 0.42 |
| ▸ | TSHR | P16473 | 2/20 | 0.41 |
| ▸ | HPGD | P15428 | 2/20 | 0.37 |
| ▸ | SLC6A4 | P31645 | 3/20 | 0.36 |
| ▸ | L3MBTL1 | Q9Y468 | 3/20 | 0.36 |
| ▸ | SLC6A2 | P23975 | 2/20 | 0.36 |
| ▸ | SLC6A3 | Q01959 | 2/20 | 0.36 |
| ▸ | MEN1 | O00255 | 1/20 | 0.35 |
| ▸ | PKM | P14618 | 1/20 | 0.35 |
| ▸ | KMT2A | Q03164 | 1/20 | 0.35 |
| ▸ | MAPT | P10636 | 1/20 | 0.35 |
| ▸ | TDP1 | Q9NUW8 | 1/20 | 0.35 |
| ▸ | HTT | P42858 | 1/20 | 0.35 |
| ▸ | CXCL8 | P10145 | 1/20 | 0.35 |
| ▸ | ADRA2B | P18089 | 1/20 | 0.35 |
| ▸ | ADRA2C | P18825 | 1/20 | 0.35 |
| ▸ | RXRA | P19793 | 1/20 | 0.33 |
| ▸ | RXRB | P28702 | 1/20 | 0.33 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL29960351 | 1.00 | ALDH1A1 (0.44) | ALDH1A1LMNASMN1; SMN2TSHRHPGD | |
| SCHEMBL195065 | 0.82 | ALDH1A1 (0.40) | ALDH1A1SMN1; SMN2TSHRSLC6A4SLC6A2 | |
| SCHEMBL29592755 | 0.82 | ADRA2B (0.43) | ALDH1A1LMNASMN1; SMN2TSHRHPGD | |
| SCHEMBL3113317 | 0.82 | ADRA2B (0.43) | ALDH1A1LMNASMN1; SMN2TSHRHPGD | |
| SCHEMBL10913408 | 0.77 | LMNA (0.39) | ALDH1A1LMNASMN1; SMN2TSHRHPGD | |
| SCHEMBL54889 | 0.76 | LMNA (0.47) | ALDH1A1LMNASMN1; SMN2TSHRHPGD | |
| SCHEMBL29152933 | 0.76 | SMN1; SMN2 (0.42) | ALDH1A1LMNASMN1; SMN2TSHRHPGD | |
| SCHEMBL535467 | 0.76 | LMNA (0.42) | ALDH1A1LMNASMN1; SMN2TSHRHPGD | |
| SCHEMBL17063054 | 0.75 | ADRA2B (0.37) | ALDH1A1TSHRADRA2BADRA2C | |
| SCHEMBL7855959 | 0.73 | ADRA2B (0.36) | ALDH1A1TSHRADRA2BADRA2C |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 706 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-111826022-A | UV (ultraviolet) photocuring high-corrosion-resistance and high-sensitivity liquid photosensitive ink and preparation method thereof | 张家港科思创感光新材料有限公司 | 2020-10-27 | — | — | CN | claimed |
| EP-4743828-A1 | PHOTOCURABLE AS WELL AS THERMALLY CURABLE COMPOSITIONS SUITABLE FOR LOW TEMPERATURE CURING | BASF SE (DE) | 2026-05-20 | — | — | EP | disclosed |
| US-12570858-B2 | Curable composition, cured product, cured film, display panel, and method for producing cured film | TOKYO OHKA KOGYO CO., LTD. (JP) | 2026-03-10 | — | — | US | disclosed |
| CN-120118458-A | Curable composition, resin, and cured product | 东京应化工业株式会社 | 2025-06-10 | — | — | CN | disclosed |
| US-12312489-B2 | Curable composition, cured product and method for forming insulating film | TOKYO OHKA KOGYO CO., LTD. (JP) | 2025-05-27 | — | — | US | disclosed |
| CN-120044752-A | Photosensitive resin composition | 东京应化工业株式会社 | 2025-05-27 | — | — | CN | disclosed |
| CN-120044751-A | Photosensitive resin composition | 东京应化工业株式会社 | 2025-05-27 | — | — | CN | disclosed |
| CN-119937242-A | Photosensitive resin composition | 东京应化工业株式会社 | 2025-05-06 | — | — | CN | disclosed |
| US-20250092171-A1 | HIGH-PURITY 4-(2-BROMOETHYL)BENZENESULFONIC ACID, HIGH-PURITY STYRENESULFONIC ACID COMPOUND DERIVED THEREFROM, AND POLYMER THEREOF, AND METHODS FOR PRODUCING SAME | TOSOH FINECHEM CORPORATION (JP) | 2025-03-20 | — | — | US | disclosed |
| WO-2025011754-A1 | PHOTOCURABLE AS WELL AS THERMALLY CURABLE COMPOSITIONS SUITABLE FOR LOW TEMPERATURE CURING | BASF SE (DE) | 2025-01-16 | — | — | WO | disclosed |
| US-4120725-A | POLYMERS OF ACRYLIC AMIDES AND OF VINYL OR ALLYL ALCOHOLS, VINYL IMIDES OR AMIDES OR VINYL MORPHOLINE | FUJI PHOTO FILM CO., LTD. (JP) | 1978-10-17 | — | — | US | disclosed |
| US-4065435-A | OXIDATION-REDUCTION PROPERTIES, ACRYLIC | FUJI PHOTO FILM CO., LTD. (JA) | 1977-12-27 | — | — | US | disclosed |
| US-4058443-A | PHOTOPOLYMERIZATION, BINDER, CHLORINATED POLYOLEFIN | FUJI PHOTO FILM CO., LTD. (JA) | 1977-11-15 | — | — | US | disclosed |
| US-4054722-A | PHOTOGRAPHY | FUJI PHOTO FILM CO., LTD. (JA) | 1977-10-18 | — | — | US | disclosed |
| US-4050936-A | Image forming process with photopolymer layers between a support and a substrate | FUJI PHOTO FILM CO., LTD. (JA) | 1977-09-27 | — | — | US | disclosed |
| US-4041017-A | Reactive light-sensitive high polymer compound containing furyl pentadienic ester groups and insolubilized by action of heat, light or electron beams | FUJI PHOTO FILM CO., LTD. (JA) | 1977-08-09 | — | — | US | disclosed |
| US-4039500-A | EMULSION POLYMERIZATION, CROSSLINKING | UNION CARBIDE CORPORATION (US) | 1977-08-02 | — | — | US | disclosed |
| US-3963495-A | Image-receiving element for silver salt diffusion transfer with layer of monoacrylates or monomethacrylates of polyhydric alcohols | FUJI PHOTO FILM CO., LTD. (JA) | 1976-06-15 | — | — | US | disclosed |
| US-3936429-A | Reactive polymer | FUJI PHOTO FILM CO., LTD. (JA) | 1976-02-03 | — | — | US | disclosed |
| US-3931248-A | Reactive high polymer compound | FUJI PHOTO FILM CO., LTD. (JA) | 1976-01-06 | — | — | US | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (2 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-12570858-B2 | Curable composition, cured product, cured film, display panel, and method for producing cured film | C5, CFL1, C9 | ALDH1A1 1968/4885LMNA 678/4885SMN1; SMN2 726/4885 |
| US-20250092171-A1 | HIGH-PURITY 4-(2-BROMOETHYL)BENZENESULFONIC ACID, HIGH-PURITY STYRENESULFONIC ACID COMPOUND DERIVED THEREFROM, AND POLYMER THEREOF, AND METHODS FOR PRODUCING SAME | BRPF1, WEE2, WEE1 | ALDH1A1 2374/4885LMNA 3526/4885SMN1; SMN2 1231/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.