Predicted protein targets (top 14)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | HTR1A | P08908 | 1/20 | 0.43 |
| ▸ | ALDH1A1 | P00352 | 6/20 | 0.39 |
| ▸ | POLB | P06746 | 2/20 | 0.37 |
| ▸ | ATM | Q13315 | 1/20 | 0.36 |
| ▸ | MEN1 | O00255 | 1/20 | 0.33 |
| ▸ | TP53 | P04637 | 1/20 | 0.33 |
| ▸ | KMT2A | Q03164 | 1/20 | 0.33 |
| ▸ | SMN1; SMN2 | Q16637 | 2/20 | 0.32 |
| ▸ | LMNA | P02545 | 2/20 | 0.32 |
| ▸ | KDM4E | B2RXH2 | 1/20 | 0.32 |
| ▸ | MAPT | P10636 | 1/20 | 0.32 |
| ▸ | ALOX15 | P16050 | 1/20 | 0.32 |
| ▸ | TSHR | P16473 | 1/20 | 0.32 |
| ▸ | L3MBTL1 | Q9Y468 | 1/20 | 0.30 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL2160334 | 0.90 | HTR1A (0.52) | HTR1AALDH1A1POLBMEN1KMT2A | |
| SCHEMBL5495402 | 0.81 | HTR1A (0.55) | HTR1AALDH1A1POLBMEN1KMT2A | |
| SCHEMBL22350718 | 0.78 | HTR1A (0.69) | HTR1AALDH1A1POLBMEN1KMT2A | |
| SCHEMBL12928358 | 0.73 | HTR1A (0.69) | HTR1AALDH1A1POLBATMMEN1 | |
| SCHEMBL1858027 | 0.71 | HTR1A (0.67) | HTR1AALDH1A1POLBMEN1KMT2A | |
| SCHEMBL15904342 | 0.70 | HRH3 (0.41) | ALDH1A1MEN1KMT2AMAPTTSHR | |
| SCHEMBL1025318 | 0.69 | — | — | |
| SCHEMBL3347181 | 0.69 | HRH3 (0.40) | HTR1AMEN1KMT2A | |
| SCHEMBL11948185 | 0.68 | ATM (0.44) | ALDH1A1ATMMEN1KMT2ASMN1; SMN2 | |
| SCHEMBL9463311 | 0.67 | ALDH1A1 (0.41) | HTR1AALDH1A1POLBATMMEN1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 19 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-1877864-B1 | NANOCOMPOSITE PHOTOSENSITIVE COMPOSITION AND USE THEREOF | MERCK PATENT GMBH (DE) | 2018-09-19 | — | — | EP | disclosed |
| US-20130105440-A1 | NANOCOMPOSITE NEGATIVE PHOTOSENSITIVE COMPOSITION AND USE THEREOF | AZ ELECTRONIC MATERIALS USA CORP. (US) | 2013-05-02 | — | — | US | disclosed |
| US-8211621-B2 | Antireflective coating compositions | AZ ELECTRONIC MATERIALS USA CORP. (US) | 2012-07-03 | — | — | US | disclosed |
| US-8088564-B2 | Base soluble polymers for photoresist compositions | AZ ELECTRONIC MATERIALS USA CORP. (US) | 2012-01-03 | — | — | US | disclosed |
| US-20100248137-A1 | Antireflective Coating Compositons | MERCK PATENT GMBH (DE) | 2010-09-30 | — | — | US | disclosed |
| US-7759046-B2 | Antireflective coating compositions | AZ ELECTRONIC MATERIALS USA CORP. (US) | 2010-07-20 | — | — | US | disclosed |
| EP-2004725-B1 | BASE SOLUBLE POLYMERS FOR PHOTORESIST COMPOSITIONS | AZ ELECTRONIC MATERIALS USA (US) | 2009-10-07 | — | — | EP | disclosed |
| US-7550249-B2 | Base soluble polymers for photoresist compositions | AZ ELECTRONIC MATERIALS USA CORP. (US) | 2009-06-23 | — | — | US | disclosed |
| US-20090061347-A1 | BASE SOLUBLE POLYMERS FOR PHOTORESIST COMPOSITIONS | MERCK PATENT GMBH (DE) | 2009-03-05 | — | — | US | disclosed |
| US-7470500-B2 | Organic bottom antireflective polymer compositions | AZ ELECTRONIC MATERIALS USA CORP. (US) | 2008-12-30 | — | — | US | disclosed |
| US-20080286689-A1 | Antireflective Coating Compositions | AZ ELECTRONICS MATERIALS USA CORP. | 2008-11-20 | — | — | US | disclosed |
| US-20080153035-A1 | Sulfonium , iodonium, benzenesulfonate and tosylsulfonate thermal acid generators, crosslinkabel polymer containing substituted or unsubstituted styrenic monomer, a crossliker polymer containing unsaturated compound with two ether groups; coating, imagewise exposing, deveopment | MERCK PATENT GMBH (DE) | 2008-06-26 | — | — | US | disclosed |
| US-20070212638-A1 | Base soluble polymers for photoresist compositions | AZ ELECTRONIC MATERIALS USA CORP. | 2007-09-13 | — | — | US | disclosed |
| US-7247419-B2 | Nanocomposite photosensitive composition and use thereof | AZ ELECTRONIC MATERIALS USA CORP. (US) | 2007-07-24 | — | — | US | disclosed |
| US-20070141510-A1 | NANOCOMPOSITE PHOTOSENSITIVE COMPOSITION AND USE THEREOF | CHEN CHUNWEI | 2007-06-21 | — | — | US | disclosed |
| US-20070020557-A1 | New organic bottom antireflective polymer compositions | AZ ELECTRONIC MATERIALS USA CORP. | 2007-01-25 | — | — | US | disclosed |
| US-20060228645-A1 | Nanocomposite photosensitive composition and use thereof | MERCK PATENT GMBH (DE) | 2006-10-12 | — | — | US | disclosed |
| US-7030201-B2 | Bottom antireflective coatings | AZ ELECTRONIC MATERIALS USA CORP. (US) | 2006-04-18 | — | — | US | disclosed |
| US-20050112494-A1 | Bottom antireflective coatings | AZ ELECTRONIC MATERIALS USA CORP. | 2005-05-26 | — | — | US | disclosed |