SCHEMBL19688904

SCHEMBL19688904

CCC(c1cc(CO)c(O)c(CO)c1)C(C)C

nearest known ligand 0.41

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
HKDC1 Q2TB90 1/20 0.41
ALOX15 P16050 3/20 0.36
OPRM1 P35372 2/20 0.36
CYP1A2 P05177 2/20 0.36
CYP2D6 P10635 2/20 0.36
TDP1 Q9NUW8 2/20 0.36
LMNA P02545 1/20 0.36
ESR1 P03372 1/20 0.36
PGR P06401 1/20 0.36
CHRM2 P08172 1/20 0.36
CYP3A4 P08684 1/20 0.36
ADORA3 P0DMS8 1/20 0.36
AR P10275 1/20 0.36
MAPT P10636 1/20 0.36
CHRM1 P11229 1/20 0.36
CYP2C9 P11712 1/20 0.36
DRD1 P21728 1/20 0.36
TBXA2R P21731 1/20 0.36
PTGS1 P23219 1/20 0.36
SLC6A2 P23975 1/20 0.36

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL10051851 0.90 HKDC1 (0.48) HKDC1ALOX15OPRM1CYP1A2CYP2D6
SCHEMBL4459305 0.80 ALDH1A1 (0.43) ALOX15CYP1A2CYP2D6CYP2C9SHBG
SCHEMBL16865574 0.78 SHBG (0.39) ALOX15CYP1A2CYP2D6TDP1SHBG
SCHEMBL27986303 0.78 SHBG (0.39) HKDC1ALOX15OPRM1CYP1A2CYP2D6
SCHEMBL4455166 0.77 GABRA1 (0.45) CYP1A2CYP2D6TDP1PTGS1SHBG
SCHEMBL67775 0.75 LMNA (0.46) HKDC1ALOX15OPRM1CYP1A2CYP2D6
SCHEMBL27536560 0.74 SHBG (0.39) CYP1A2CYP2D6TDP1SHBGKDM4E
SCHEMBL27049060 0.72 HSD17B10 (0.44) ALOX15CYP1A2CYP2D6TDP1CYP2C9
SCHEMBL3081907 0.72 KDM4E (0.41) CYP1A2CYP2D6TDP1SHBGKDM4E
SCHEMBL17069213 0.71 TSHR (0.36) HKDC1ALOX15OPRM1CYP1A2CYP2D6

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-10545405-B2 Actinic ray-sensitive or radiation-sensitive resin composition, actinic ray-sensitive or radiation-sensitive film, mask blank including actinic ray-sensitive or radiation-sensitive film, pattern forming method, and method for manufacturing electronic device FUJIFILM CORPORATION (JP) 2020-01-28 US disclosed
US-20170351176-A1 ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE FILM, MASK BLANK INCLUDING ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE FILM, PATTERN FORMING METHOD, AND METHOD FOR MANUFACTURING ELECTRONIC DEVICE FUJIFILM CORPORATION (JP) 2017-12-07 US disclosed