Known targets — ChEMBL curated mechanism
ABCC9ABL1ACEACHEACVR1ADORA1ADORA2AADORA2BADORA3ADRA1AADRA1BADRA1DADRA2AADRA2BADRA2CADRB1ADRB2ADRB3AGTR1ALOX5ATP4AATP4BBCRBTKCACNA1ACACNA1BCACNA1CCACNA1DCACNA1ECACNA1FCACNA1GCACNA1HCACNA1ICACNA1SCACNA2D1CACNA2D2CACNA2D3CACNA2D4CACNB1CACNB2CACNB3CACNB4CACNG1CACNG2CACNG3CACNG4CACNG5CACNG6CACNG7CACNG8CALCRLCFBCHRM1CHRM2CHRM3CHRM4CHRM5CHRNA1CHRNB1CHRNDCHRNECHRNGCRBNCUL4ACXCR1CXCR2DDB1DDCDHFRDPP4DRD2DRD3DRD4EGFRERBB2ERBB4ESR1ESR2FDPSFKBP1AFLT1FLT3FLT4GARTGHSRGRIA1GRIA2GRIA3GRIA4GRIK1GRIK2GRIK3GRIK4GRIK5GRIN2AGSK3AGSK3BHDAC1HDAC10HDAC11HDAC2HDAC3HDAC4HDAC5HDAC6HDAC7HDAC8HDAC9HRH1HTR1AHTR1BHTR1DHTR1EHTR1FHTR2AHTR2BHTR2CHTR3AHTR3BHTR3CHTR3DHTR3EHTR4HTR5AHTR6HTR7IDH1IDH2IMPA1ITGA2BITGB3JAK1JAK2JAK3KCNJ11KCNK3KCNK9KDRKITMEN1METMMP1MMP13MMP7MMP8NANOD2NS5bODC1OPG057OPRD1OPRK1OPRM1PPARP1PARP2PDE3APDE3BPDE4APDE4BPDE4CPDE4DPDGFRBPIK3CAPIK3CBPIK3CDPIK3CGPIK3R1PIK3R2PIK3R3PIK3R5PKLRPPARDPPATPTGS1PTGS2RBX1ROCK1ROCK2RRM1RRM2RRM2BSCN10ASCN11ASCN1ASCN2ASCN3ASCN4ASCN5ASCN7ASCN8ASCN9ASCNN1ASCNN1BSCNN1GSIGMAR1SLC10A2SLC5A2SLC6A2SLC6A3SLC6A4SLC9A3SYKTACR1THRATHRBTOP1TUBA1ATUBA1BTUBA1CTUBA3CTUBA3ETUBA4ATUBBTUBB1TUBB2ATUBB2BTUBB3TUBB4ATUBB4BTUBB6TUBB8TYK2TYMSVDRampCblablaT-3blaT-4blaT-5blaT-6blaUOE-1dacAdacBdacCfolAfolPftsIgyrAgyrBileSmecAmrcAmrcBmrdAparCparEpbp2pbp4pbpApbpFrplArplBrplCrplDrplErplFrplIrplJrplKrplLrplMrplNrplOrplPrplQrplRrplSrplTrplUrplVrplWrplXrplYrpmArpmBrpmCrpmDrpmErpmE2rpmFrpmGrpmG1rpmG2rpmG3rpmHrpmIrpmJrpsArpsBrpsCrpsDrpsErpsFrpsGrpsHrpsIrpsJrpsKrpsLrpsMrpsNrpsOrpsPrpsQrpsRrpsSrpsTrpsUthyAykgMykgO
The experimentally established mechanism targets of Water. The predicted profile below is derived independently by chemical similarity — agreement is a validation signal, a miss is honest.
Predicted protein targets (top 9)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | MEN1 known ✓ | O00255 | 1/20 | 0.41 |
| ▸ | CYP2C19 | P33261 | 2/20 | 0.41 |
| ▸ | GLA | P06280 | 1/20 | 0.41 |
| ▸ | KMT2A | Q03164 | 1/20 | 0.41 |
| ▸ | CYP1A2 | P05177 | 1/20 | 0.39 |
| ▸ | TSHR | P16473 | 1/20 | 0.39 |
| ▸ | TP53 | P04637 | 1/20 | 0.37 |
| ▸ | KDM1A | O60341 | 5/20 | 0.33 |
| ▸ | SAT1 | P21673 | 2/20 | 0.33 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL3282192 | 0.97 | — | — | |
| SCHEMBL4667751 | 0.78 | — | — | |
| SCHEMBL27872838 | 0.78 | — | — | |
| Water SCHEMBL8187043 | 0.71 | — | — | |
| SCHEMBL841906 | 0.71 | — | — | |
| Water SCHEMBL20657274 | 0.71 | — | — | |
| SCHEMBL15033654 | 0.70 | TET2 (0.39) | CYP2C19MEN1GLAKMT2ACYP1A2 | |
| SCHEMBL8871462 | 0.70 | ALDH1A1 (0.59) | CYP2C19CYP1A2TSHR | |
| SCHEMBL8936367 | 0.70 | CYP2C19 (0.39) | CYP2C19MEN1GLAKMT2ACYP1A2 | |
| Diethylamine SCHEMBL21838406 | 0.69 | TP53 (0.57) | CYP2C19MEN1GLAKMT2ACYP1A2 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 25 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-12599937-B2 | Water-based, high-efficiency chemical reagent for substrate surface particle removal | APPLIED MATERIALS, INC. (US) | 2026-04-14 | — | — | US | disclosed |
| US-12481218-B2 | Treatment liquid, method for washing substrate, and method for removing resist | FUJIFILM CORPORATION (JP) | 2025-11-25 | — | — | US | disclosed |
| US-12386265-B2 | Pattern forming method and method for manufacturing electronic device | FUJIFILM CORPORATION (JP) | 2025-08-12 | — | — | US | disclosed |
| US-20250235900-A1 | WATER-BASED, HIGH-EFFICIENCY CHEMICAL REAGENT FOR SUBSTRATE SURFACE PARTICLE REMOVAL | APPLIED MATERIALS, INC. | 2025-07-24 | — | — | US | disclosed |
| US-20250215318-A1 | ETCHING COMPOSITION, ETCHING METHOD USING SAME, AND METHOD FOR MANUFACTURING ELECTRONIC COMPONENT | TOKYO OHKA KOGYO CO., LTD. (JP) | 2025-07-03 | — | — | US | disclosed |
| US-12276915-B2 | Treatment liquid and treatment method | FUJIFILM CORPORATION (JP) | 2025-04-15 | — | — | US | disclosed |
| US-12097996-B2 | Container, method for manufacturing container, and chemical liquid storage body | FUJIFILM CORPORATION (JP) | 2024-09-24 | — | — | US | disclosed |
| US-20240295822-A1 | PATTERN FORMING METHOD AND METHOD FOR MANUFACTURING ELECTRONIC DEVICE | FUJIFILM CORPORATION (JP) | 2024-09-05 | — | — | US | disclosed |
| US-20240231237-A9 | TREATMENT LIQUID, METHOD FOR WASHING SUBSTRATE, AND METHOD FOR REMOVING RESIST | FUJIFILM CORPORATION (JP) | 2024-07-11 | — | — | US | disclosed |
| US-12013644-B2 | Method for manufacturing electronic device | FUJIFILM CORPORATION (JP) | 2024-06-18 | — | — | US | disclosed |
| CN-114706271-A | Processing liquid for semiconductor manufacturing and pattern forming method | 富士胶片株式会社 | 2022-07-05 | — | — | CN | disclosed |
| US-20220121123-A1 | METHOD FOR MANUFACTURING ELECTRONIC DEVICE | FUJIFILM CORPORATION (JP) | 2022-04-21 | — | — | US | disclosed |
| CN-108885412-B | Processing liquid for semiconductor manufacturing and pattern forming method | 富士胶片株式会社 | 2022-04-05 | — | — | CN | disclosed |
| US-11256173-B2 | Treatment liquid for manufacturing semiconductor and pattern forming method | FUJIFILM CORPORATION (JP) | 2022-02-22 | — | — | US | disclosed |
| CN-110770137-B | Container, method for manufacturing container, and chemical liquid container | 富士胶片株式会社 | 2021-08-03 | — | — | CN | disclosed |
| US-20200363725-A1 | TREATMENT LIQUID AND TREATMENT METHOD | FUJIFILM CORPORATION (JP) | 2020-11-19 | — | — | US | disclosed |
| US-20200115105-A1 | CONTAINER, METHOD FOR MANUFACTURING CONTAINER, AND CHEMICAL LIQUID STORAGE BODY | FUJIFILM CORPORATION (JP) | 2020-04-16 | — | — | US | disclosed |
| CN-110770137-A | Container, method for manufacturing container, and chemical liquid container | 富士胶片株式会社 | 2020-02-07 | — | — | CN | disclosed |
| US-20190079409-A1 | TREATMENT LIQUID, METHOD FOR WASHING SUBSTRATE, AND METHOD FOR REMOVING RESIST | FUJIFILM CORPORATION (JP) | 2019-03-14 | — | — | US | disclosed |
| US-20190025702-A1 | TREATMENT LIQUID FOR MANUFACTURING SEMICONDUCTOR AND PATTERN FORMING METHOD | FUJIFILM CORPORATION (JP) | 2019-01-24 | — | — | US | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-12599937-B2 | Water-based, high-efficiency chemical reagent for substrate surface particle removal | STUB1, CD2, EPCAM | MEN1 2673/4885CYP2C19 3865/4885GLA 4791/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.