Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | CA1 | P00915 | 3/20 | 0.60 |
| ▸ | CA2 | P00918 | 3/20 | 0.60 |
| ▸ | CA7 | P43166 | 2/20 | 0.60 |
| ▸ | CA9 | Q16790 | 2/20 | 0.60 |
| ▸ | CA12 | O43570 | 1/20 | 0.60 |
| ▸ | CA4 | P22748 | 1/20 | 0.60 |
| ▸ | CA14 | Q9ULX7 | 1/20 | 0.60 |
| ▸ | ALDH1A1 | P00352 | 5/20 | 0.48 |
| ▸ | TP53 | P04637 | 2/20 | 0.48 |
| ▸ | TDP1 | Q9NUW8 | 2/20 | 0.48 |
| ▸ | TSHR | P16473 | 1/20 | 0.48 |
| ▸ | ADRA2B | P18089 | 1/20 | 0.48 |
| ▸ | PTGS1 | P23219 | 1/20 | 0.48 |
| ▸ | MAPK1 | P28482 | 2/20 | 0.46 |
| ▸ | HTT | P42858 | 1/20 | 0.46 |
| ▸ | L3MBTL1 | Q9Y468 | 1/20 | 0.46 |
| ▸ | ENPP2 | Q13822 | 1/20 | 0.44 |
| ▸ | ORAI1 | Q96D31 | 1/20 | 0.43 |
| ▸ | ORAI2 | Q96SN7 | 1/20 | 0.43 |
| ▸ | ORAI3 | Q9BRQ5 | 1/20 | 0.43 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL31005158 | 1.00 | CA1 (0.60) | CA1CA2CA7CA9CA12 | |
| Iodide SCHEMBL10951544 | 0.97 | CA1 (0.57) | CA1CA2CA7CA9CA12 | |
| Hydrochloric Acid SCHEMBL11132721 | 0.97 | CA1 (0.57) | CA1CA2CA7CA9CA12 | |
| SCHEMBL2090403 | 0.86 | CA1 (0.50) | CA1CA2CA7CA9CA12 | |
| SCHEMBL2092497 | 0.86 | CA1 (0.50) | CA1CA2CA7CA9CA12 | |
| SCHEMBL31005134 | 0.86 | CA1 (0.50) | CA1CA2CA7CA9CA12 | |
| SCHEMBL5828193 | 0.82 | CA1 (0.57) | CA1CA2CA7CA9CA12 | |
| SCHEMBL6856664 | 0.81 | CA1 (0.44) | CA1CA2CA7CA9CA12 | |
| SCHEMBL10802274 | 0.80 | CA1 (0.55) | CA1CA2CA7CA9CA12 | |
| SCHEMBL3139825 | 0.80 | CA1 (0.55) | CA1CA2CA7CA9CA12 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 12 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-0136679-B1 | PHOTOPOLYMERIZABLE EPOXY RESIN COMPOSITION | KABUSHIKI KAISHA TOSHIBA (JP) | 1987-12-16 | — | — | EP | claimed |
| WO-2023053877-A1 | PHOTOACID GENERATOR, RESIST COMPOSITION, AND METHOD FOR PRODUCING DEVICE USING SAID RESIST COMPOSITION | 東洋合成工業株式会社 | 2023-04-06 | — | — | WO | disclosed |
| US-20180011401-A1 | SULFONIC ACID DERIVATIVE, PHOTOACID GENERATOR USING SAME, RESIST COMPOSITION, AND DEVICE MANUFACTURING METHOD | TOYO GOSEI CO., LTD. (JP) | 2018-01-11 | — | — | US | disclosed |
| US-20130130175-A1 | Compound for Photoacid Generator, Resist Composition Using the Same, and Pattern-Forming Method | CENTRAL GLASS COMPANY, LIMITED (JP) | 2013-05-23 | — | — | US | disclosed |
| US-8435717-B2 | Compound for photoacid generator, resist composition using the same, and pattern-forming method | CENTRAL GLASS COMPANY, LIMITED (JP) | 2013-05-07 | — | — | US | disclosed |
| US-8163462-B2 | Photosensitive composition, method for forming pattern, and method for manufacturing semiconductor device | RENESAS ELECTRONICS CORPORATION (JP) | 2012-04-24 | — | — | US | disclosed |
| US-20100035185-A1 | Compound for Photoacid Generator, Resist Composition Using the Same, and Pattern-Forming Method | CENTRAL GLASS COMPANY, LTD. (JP) | 2010-02-11 | — | — | US | disclosed |
| US-20090317742-A1 | Photosensitive composition, method for forming pattern, and method for manufacturing semiconductor device | NEC ELECTRONICS CORPORATION (JP) | 2009-12-24 | — | — | US | disclosed |
| US-7414148-B2 | Process for producing alkoxycarbonylfluoroalkanesulfonates | CENTRAL GLASS COMPANY LIMITED (JP) | 2008-08-19 | — | — | US | disclosed |
| US-20080108846-A1 | PROCESS FOR PRODUCING ALKOXYCARBONYLFLUOROALKANESULFONATES | CENTRAL GLASS COMPANY, LIMITED (JP) | 2008-05-08 | — | — | US | disclosed |
| EP-0136679-B1 | PHOTOPOLYMERIZABLE EPOXY RESIN COMPOSITION | KABUSHIKI KAISHA TOSHIBA (JP) | 1987-12-16 | — | — | EP | disclosed |
| EP-0136679-A2 | Photopolymerizable epoxy resin composition | KABUSHIKI KAISHA TOSHIBA (JP) | 1985-04-10 | — | — | EP | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (4 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-20180011401-A1 | SULFONIC ACID DERIVATIVE, PHOTOACID GENERATOR USING SAME, RESIST COMPOSITION, AND DEVICE MANUFACTURING METHOD | ASIC1, ASIC3, CRY1 | CA1 72/4885CA2 27/4885CA7 153/4885 |
| US-20080108846-A1 | PROCESS FOR PRODUCING ALKOXYCARBONYLFLUOROALKANESULFONATES | ARSA, PFAS, MPST | CA1 462/4885CA2 45/4885CA7 21/4885 |
| US-20100035185-A1 | Compound for Photoacid Generator, Resist Composition Using the Same, and Pattern-Forming Method | ASIC1, RER1, INSRR | CA1 122/4885CA2 232/4885CA7 64/4885 |
| US-20130130175-A1 | Compound for Photoacid Generator, Resist Composition Using the Same, and Pattern-Forming Method | ASIC1, RER1, INSRR | CA1 161/4885CA2 249/4885CA7 80/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.