SCHEMBL2098592

SCHEMBL2098592

CC(Cc1ccccc1)[SiH](Cl)Cl

nearest known ligand 0.56

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
SIGMAR1 Q99720 6/20 0.52
TAAR1 Q96RJ0 5/20 0.52
SLC6A2 P23975 3/20 0.52
SLC6A4 P31645 2/20 0.52
SLC6A3 Q01959 2/20 0.52
MAOA P21397 1/20 0.52
CYP2A6 P11509 1/20 0.52
ADORA2A P29274 1/20 0.52
ADORA1 P30542 1/20 0.52
SLC18A2 Q05940 1/20 0.48
CYP2D6 P10635 1/20 0.48
TRPA1 O75762 2/20 0.47
EPHX1 P07099 1/20 0.44
ADRA2B P18089 1/20 0.44
ADRA2C P18825 1/20 0.44
HTR2A P28223 1/20 0.44
ADRA1A P35348 1/20 0.44
OPRK1 P41145 1/20 0.44
KCNH2 Q12809 1/20 0.44
MEN1 O00255 1/20 0.42

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL1033576 0.79 GABRA1 (0.37) SIGMAR1TAAR1SLC6A2SLC6A4SLC6A3
SCHEMBL11414974 0.78 TRPA1 (0.48) SIGMAR1TAAR1SLC6A2SLC6A4SLC6A3
SCHEMBL11348987 0.77 TAAR1 (0.47) SIGMAR1TAAR1SLC6A2SLC6A4SLC6A3
SCHEMBL11341543 0.76 TRPA1 (0.47) SIGMAR1TAAR1SLC6A2SLC6A4SLC6A3
SCHEMBL1501366 0.74 SIGMAR1 (0.48) SIGMAR1TAAR1SLC6A2SLC6A4SLC6A3
SCHEMBL27878590 0.73 SIGMAR1 (0.58) SIGMAR1TAAR1SLC6A2SLC6A4SLC6A3
SCHEMBL66064 0.73 SIGMAR1 (0.58) SIGMAR1TAAR1SLC6A2SLC6A4SLC6A3
SCHEMBL9863446 0.73 TAAR1 (0.58) SIGMAR1TAAR1SLC6A2SLC6A4SLC6A3
SCHEMBL5493527 0.73 SIGMAR1 (0.52) SIGMAR1TAAR1SLC6A2SLC6A4SLC6A3
Isobutylbenzene SCHEMBL2571645 0.72 SIGMAR1 (0.64) SIGMAR1TAAR1SLC6A2SLC6A4SLC6A3

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 16 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-107109777-A Antifouling, anti-coloring pollution the method applied without fluorine coating and on material 休斯敦大学系统 2017-08-29 CN claimed
CN-113292592-B Method for removing impurities of methyldichlorosilane and silicon tetrachloride in trimethylchlorosilane 天津大学 2023-02-03 CN disclosed
CN-113292592-A Method for removing impurities of methyldichlorosilane and silicon tetrachloride in trimethylchlorosilane 天津大学 2021-08-24 CN disclosed
CN-110358089-A A kind of preparation method of alkylaryl modified silicon oil 苏州润特新材料科技有限公司 2019-10-22 CN disclosed
CN-107207884-A Weather-proof, antimycotic, anti-coloring pollution coating and the method being applied on timber, masonry material or other porous materials 休斯敦大学系统 2017-09-26 CN disclosed
CN-107208354-A Anti-soiling, anti-staining coating and method of applying to textile or other flexible material 休斯敦大学系统 2017-09-26 CN disclosed
US-8163460-B2 Underlayer coating forming composition for lithography containing polysilane compound NISSAN CHEMICAL INDUSTRIES, LTD. (JP) 2012-04-24 US disclosed
US-20080318158-A1 Underlayer Coating Forming Composition for Lithography Containing Polysilane Compound NISSAN CHEMICAL INDUSTRIES, LTD. (JP) 2008-12-25 US disclosed
US-6797444-B2 A PROTECTIVE LAYER CONTAINING A COUPLING FLUOROPOLYMER PARTICLES DISPERSED IN A COPOLYMER HAVING A FLUORINE ATOM-CONTAINING SILOXANE ADDITION-CONDENSATION PRODUCT IN A SIDE CHAIN; NONABRASIVE, HARDENING KONICA CORPORATION (JP) 2004-09-28 US disclosed
US-20040097366-A1 Polyolefin-based composite resin, method for production thereof, catalyst for polymerization of vinly compound and method for polymerization of vinly compound using the same IDEMITSU KOSAN CO. LTD. (JP) 2004-05-20 US disclosed
US-20030134209-A1 Electrophotographic photoreceptor and production method of the same KONICA CORPORATION (JP) 2003-07-17 US disclosed
US-6569586-B2 Comprises photosensitive layer and resin layer including organic polymer, siloxane component, and charge transfer component; durability KONICA CORPORATION (JP) 2003-05-27 US disclosed
US-20020076631-A1 Photoreceptor for forming electrostatic latent image KONICA CORPORATION (JP) 2002-06-20 US disclosed
EP-0263673-B1 Addition reaction of hydrosilanes with unsaturated hydrocarbons TORAY SILICONE CO (JP) 1993-12-01 EP disclosed
EP-0263673-A2 Addition reaction of hydrosilanes with unsaturated hydrocarbons Toray Silicone Company, Ltd. (JP) 1988-04-13 EP disclosed
US-4736049-A Addition reaction method TORAY SILICONE CO. LTD. (JP) 1988-04-05 US disclosed