Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | ALDH1A1 | P00352 | 2/20 | 0.51 |
| ▸ | CDC25B | P30305 | 1/20 | 0.51 |
| ▸ | CASP6 | P55212 | 1/20 | 0.51 |
| ▸ | RCE1 | Q9Y256 | 1/20 | 0.51 |
| ▸ | MCL1 | Q07820 | 3/20 | 0.47 |
| ▸ | RAB9A | P51151 | 2/20 | 0.46 |
| ▸ | BCL2A1 | Q16548 | 1/20 | 0.45 |
| ▸ | KMT2A | Q03164 | 2/20 | 0.44 |
| ▸ | KDM4E | B2RXH2 | 2/20 | 0.44 |
| ▸ | GFER | P55789 | 1/20 | 0.44 |
| ▸ | RXFP1 | Q9HBX9 | 1/20 | 0.44 |
| ▸ | HDAC3 | O15379 | 2/20 | 0.43 |
| ▸ | BRAF | P15056 | 2/20 | 0.43 |
| ▸ | HDAC4 | P56524 | 2/20 | 0.43 |
| ▸ | HDAC1 | Q13547 | 2/20 | 0.43 |
| ▸ | HDAC7 | Q8WUI4 | 2/20 | 0.43 |
| ▸ | HDAC2 | Q92769 | 2/20 | 0.43 |
| ▸ | HDAC10 | Q969S8 | 2/20 | 0.43 |
| ▸ | HDAC11 | Q96DB2 | 2/20 | 0.43 |
| ▸ | HDAC8 | Q9BY41 | 2/20 | 0.43 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL1793583 | 0.88 | ALDH1A1 (0.54) | ALDH1A1CDC25BCASP6RCE1MCL1 | |
| SCHEMBL4490311 | 0.87 | POLB (0.55) | ALDH1A1MCL1RAB9AKDM4ETHRB | |
| SCHEMBL1554060 | 0.84 | KMT2A (0.59) | ALDH1A1CDC25BCASP6RCE1MCL1 | |
| SCHEMBL7018271 | 0.83 | ALDH1A1 (0.68) | ALDH1A1CDC25BCASP6RCE1MCL1 | |
| SCHEMBL712251 | 0.83 | KDM4E (0.61) | ALDH1A1CDC25BCASP6RCE1MCL1 | |
| SCHEMBL10583194 | 0.80 | BRAF (0.56) | ALDH1A1CDC25BCASP6RCE1MCL1 | |
| SCHEMBL1793580 | 0.80 | ALDH1A1 (0.44) | ALDH1A1CDC25BCASP6RCE1MCL1 | |
| SCHEMBL1027446 | 0.80 | KMT2A (0.61) | ALDH1A1CDC25BCASP6RCE1MCL1 | |
| SCHEMBL710634 | 0.80 | KMT2A (0.63) | ALDH1A1CDC25BCASP6RCE1MCL1 | |
| SCHEMBL5078313 | 0.80 | POLB (0.57) | ALDH1A1CDC25BCASP6RCE1MCL1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 25 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-118318191-A | Composition for forming wavelength conversion film | 日产化学株式会社 | 2024-07-09 | — | — | CN | disclosed |
| CN-118192168-A | Photosensitive resin composition | 日产化学株式会社 | 2024-06-14 | — | — | CN | disclosed |
| CN-110537146-B | Photosensitive resin composition | 日产化学株式会社 | 2024-03-15 | — | — | CN | disclosed |
| CN-110537147-B | Photosensitive resin composition | 日产化学株式会社 | 2024-03-12 | — | — | CN | disclosed |
| CN-110573963-B | Photosensitive resin composition | 日产化学株式会社 | 2023-10-24 | — | — | CN | disclosed |
| CN-110366768-B | Composition for forming coating film for removing foreign matter | 日产化学株式会社 | 2023-09-26 | — | — | CN | disclosed |
| CN-110050013-B | Method for producing release layer | 日产化学株式会社 | 2022-11-29 | — | — | CN | disclosed |
| CN-114245881-A | Photosensitive resin composition | 日产化学株式会社 | 2022-03-25 | — | — | CN | disclosed |
| CN-108475016-B | Positive photosensitive resin composition | 日产化学工业株式会社 | 2021-09-10 | — | — | CN | disclosed |
| CN-111684358-A | Photosensitive resin composition | 日产化学株式会社 | 2020-09-18 | — | — | CN | disclosed |
| CN-102575008-B | The method preparing polyimidesiloxane solution composition, and polyimidesiloxane solution composition | 宇部兴产株式会社 | 2016-09-14 | — | — | CN | disclosed |
| CN-105705999-A | Photosensitive thermosetting resin composition and flexible printed wiring board | 太阳油墨制造株式会社 | 2016-06-22 | — | — | CN | disclosed |
| CN-105683836-A | PHOTOSENSITIVE HEAT-CURABLE RESIN COMPOSITION AND FLEXIBLE PRINTED WIRING BOARD | 太阳油墨制造株式会社 | 2016-06-15 | — | — | CN | disclosed |
| CN-105378564-A | Photosensitive thermosetting resin composition and flexible printed circuit board | TAIYO INK MFG CO LTD | 2016-03-02 | — | — | CN | disclosed |
| CN-105278241-A | PHOTOSENSITIVE THERMOSETTING RESIN COMPOSITION, DRY FILM AND PRINTED WIRING BOARD | TAIYO INK MFG CO LTD | 2016-01-27 | — | — | CN | disclosed |
| CN-103562796-A | Resin composition and semiconductor element substrate | ZEON CORP | 2014-02-05 | — | — | CN | disclosed |
| CN-103443707-A | Resin composition and semiconductor element substrate | ZEON CORP | 2013-12-11 | — | — | CN | disclosed |
| CN-103163736-A | Composition including polyamide acid for forming lower layer reflection preventing film | NISSAN CHEMICAL IND LTD | 2013-06-19 | — | — | CN | disclosed |
| CN-101065708-B | Method for forming photoresist pattern using double layer antireflection film | NISSAN CHEMICAL IND LTD | 2013-01-02 | — | — | CN | disclosed |
| CN-102575008-A | Process for producing polyimide siloxane solution composition, and polyimide siloxane solution composition | UBE INDUSTRIES | 2012-07-11 | — | — | CN | disclosed |