SCHEMBL21295458

SCHEMBL21295458

Oc1ccc(-c2cccc3c2Cc2ccccc2-3)cc1O

nearest known ligand 0.58

Predicted protein targets (top 13)

geneUniProtsupporting neighboursconfidence
APP P05067 3/20 0.58
PNMT P11086 1/20 0.47
ALOX5 P09917 8/20 0.44
MIF P14174 2/20 0.42
STK17B O94768 1/20 0.42
NPC1 O15118 1/20 0.42
RAB9A P51151 1/20 0.42
HTR7 P34969 1/20 0.39
HTR2B P41595 1/20 0.39
CHEK1 O14757 1/20 0.38
ADORA3 P0DMS8 1/20 0.38
ADORA2A P29274 1/20 0.38
ADORA1 P30542 1/20 0.38

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL28189247 0.87 PNMT (0.45) APPPNMTNPC1RAB9AHTR7
SCHEMBL17574464 0.86 PNMT (0.44) APPPNMTALOX5MIFSTK17B
SCHEMBL17574470 0.86 ESR2 (0.49) APPPNMTNPC1RAB9AHTR7
SCHEMBL3366835 0.86 HSD17B1 (0.47) APPPNMTALOX5NPC1RAB9A
SCHEMBL918080 0.86 TLR8 (0.48) APPPNMTNPC1RAB9AHTR7
SCHEMBL4640228 0.86 ALDH1A1 (0.49) APPPNMTMIFSTK17BNPC1
SCHEMBL17574468 0.86 PRKAB2 (0.49) APPPNMTMIFNPC1RAB9A
SCHEMBL28847551 0.86 APP (0.53) APPPNMTALOX5MIFSTK17B
SCHEMBL30036609 0.86 APP (0.53) APPPNMTALOX5MIFSTK17B
SCHEMBL28454001 0.86 PNMT (0.47) APPPNMTNPC1RAB9AHTR7

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 66 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-117855618-A Porous polymer electrolyte and preparation method and application thereof 中国科学院化学研究所 2024-04-09 CN claimed
CN-117384341-A Polyurethane self-contained microporous material with high specific surface area and preparation method thereof 济南大学 2024-01-12 CN claimed
CN-113122225-B Nano material, preparation method thereof, optical film and light-emitting device TCL科技集团股份有限公司 2023-04-21 CN claimed
CN-113717361-B Method for preparing polyester film through gas-phase polymerization, polyester film and application 暨南大学 2022-12-23 CN claimed
CN-113717361-A Method for preparing polyester film through gas-phase polymerization, polyester film and application 暨南大学 2021-11-30 CN claimed
CN-107974080-B Polyamide moulding compositions and multilayer structures made therefrom EMS专利股份公司 2021-07-20 CN claimed
CN-113122225-A Nano material and preparation method thereof, optical film and light-emitting device TCL集团股份有限公司 2021-07-16 CN claimed
CN-111603938-A Loose nanofiltration membrane, and preparation method and application thereof 中国科学院苏州纳米技术与纳米仿生研究所 2020-09-01 CN claimed
CN-110446973-A Blue-sensitive resin combination, the colour filter and image display device manufactured using the composition DONGWOO FINE CHEM CO LTD 2019-11-12 CN claimed
CN-110446975-A Blue photosensitive resin composition, color filter and image display device manufactured by using the same DONGWOO FINE CHEM CO LTD 2019-11-12 CN claimed
CN-110268328-A Blue-sensitive resin combination, the colour filter and image display device manufactured using the composition 东友精细化工有限公司 2019-09-20 CN claimed
CN-110121679-A Blue photosensitive resin composition, color filter and image display device manufactured by using the same 东友精细化工有限公司 2019-08-13 CN claimed
CN-107974080-A Polyamide moulding composition and the sandwich construction being made from it EMS专利股份公司 2018-05-01 CN claimed
CN-112888579-B Rubber-like composition and method for producing same 大阪瓦斯株式会社 2024-07-09 CN disclosed
CN-114380849-B Material for forming organic film, method for forming pattern, and compound for forming organic film 信越化学工业株式会社 2024-05-24 CN disclosed
CN-113467183-B Resin composition for forming insulating film, insulating film produced using the same, image display device, and method for producing insulating film 东友精细化工有限公司 2024-04-23 CN disclosed
CN-105377970-A Wavelength dispersion adjusting agent, resin composition, and method for adjusting wavelength dispersion of resin OSAKA GAS CHEMICALS CO LTD 2016-03-02 CN disclosed
CN-105308122-A Resin composition containing fluorine compound, molded body, wavelength dispersion adjustment agent, and method for adjusting wavelength dispersion of resin OSAKA GAS CHEMICALS CO LTD 2016-02-03 CN disclosed
CN-103890018-A Polyfunctional (meth) acrylate having fluorene skeleton and curable composition thereof OSAKA GAS CHEMICALS CO LTD 2014-06-25 CN disclosed
CN-103857750-A Resin composition, coating film, and insulating film for touch panel TOYO INK SC HOLDINGS CO LTD 2014-06-11 CN disclosed