Predicted protein targets (top 12)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | CYP3A4 | P08684 | 1/20 | 0.35 |
| ▸ | CHRM1 | P11229 | 1/20 | 0.35 |
| ▸ | ALOX15 | P16050 | 1/20 | 0.35 |
| ▸ | MAOA | P21397 | 1/20 | 0.35 |
| ▸ | TBXA2R | P21731 | 1/20 | 0.35 |
| ▸ | ADRA1A | P35348 | 1/20 | 0.35 |
| ▸ | HTR2B | P41595 | 1/20 | 0.35 |
| ▸ | MEN1 | O00255 | 1/20 | 0.33 |
| ▸ | HSP90AA1 | P07900 | 1/20 | 0.33 |
| ▸ | KMT2A | Q03164 | 1/20 | 0.33 |
| ▸ | ATM | Q13315 | 1/20 | 0.33 |
| ▸ | ALDH1A1 | P00352 | 1/20 | 0.30 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL11152989 | 0.86 | ACHE (0.37) | CYP3A4CHRM1ALOX15MAOATBXA2R | |
| SCHEMBL4460425 | 0.81 | CYP3A4 (0.38) | CYP3A4CHRM1ALOX15MAOATBXA2R | |
| SCHEMBL18786904 | 0.78 | ACHE (0.35) | CYP3A4CHRM1ALOX15MAOATBXA2R | |
| SCHEMBL4469324 | 0.77 | CYP3A4 (0.42) | CYP3A4MEN1KMT2AALDH1A1 | |
| SCHEMBL15064935 | 0.73 | SRC (0.34) | ALDH1A1 | |
| SCHEMBL3919468 | 0.71 | TP53 (0.31) | — | |
| SCHEMBL8015643 | 0.69 | CYP3A4 (0.38) | CYP3A4CHRM1ALOX15MAOATBXA2R | |
| SCHEMBL18804768 | 0.68 | ACHE (0.40) | CYP3A4MEN1HSP90AA1KMT2AATM | |
| SCHEMBL169731 | 0.68 | OPRM1 (0.39) | CYP3A4ALOX15MEN1KMT2AALDH1A1 | |
| SCHEMBL29914192 | 0.68 | OPRM1 (0.39) | CYP3A4ALOX15MEN1KMT2AALDH1A1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 173 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-7303855-B2 | Photoresist undercoat-forming material and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2007-12-04 | — | — | US | claimed |
| US-20060019195-A1 | Photoresist undercoat-forming material and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2006-01-26 | — | — | US | claimed |
| US-20240242967-A1 | Polymer For Forming Metal-Containing Film, Composition For Forming Metal-Containing Film, And Patterning Process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2024-07-18 | — | — | US | disclosed |
| EP-4398037-A1 | COMPOUND FOR FORMING METAL-CONTAINING FILM, COMPOSITION FOR FORMING METAL-CONTAINING FILM, AND PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2024-07-10 | — | — | EP | disclosed |
| US-12032293-B2 | Composition for forming organic film, patterning process, and polymer | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2024-07-09 | — | — | US | disclosed |
| EP-4390547-A1 | POLYMER FOR FORMING METAL-CONTAINING FILM, COMPOSITION FOR FORMING METAL-CONTAINING FILM, AND PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2024-06-26 | — | — | EP | disclosed |
| EP-3835380-B1 | MATERIAL FOR FORMING ORGANIC FILM, METHOD FOR FORMING ORGANIC FILM, PATTERNING PROCESS, AND COMPOUND | SHINETSU CHEMICAL CO (JP) | 2024-04-24 | — | — | EP | disclosed |
| EP-3764162-B1 | COMPOSITION FOR FORMING ORGANIC FILM, PATTERNING PROCESS, AND POLYMER | SHINETSU CHEMICAL CO (JP) | 2024-04-17 | — | — | EP | disclosed |
| US-20240116958-A1 | Compound For Forming Metal-Containing Film, Composition For Forming Metal-Containing Film, Patterning Process, And Semiconductor Photoresist Material | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2024-04-11 | — | — | US | disclosed |
| EP-4155337-B1 | COMPOSITION FOR FORMING ORGANIC FILM, PATTERNING PROCESS, AND COMPOUND AND POLYMER FOR FORMING ORGANIC FILM | SHINETSU CHEMICAL CO (JP) | 2024-02-21 | — | — | EP | disclosed |
| EP-4163279-B1 | MATERIAL FOR FORMING ORGANIC FILM, PATTERNING PROCESS, AND COMPOUND | SHINETSU CHEMICAL CO (JP) | 2024-01-31 | — | — | EP | disclosed |
| US-20070275325-A1 | Photoresist undercoat-forming material and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2007-11-29 | — | — | US | disclosed |
| US-20060234158-A1 | Bottom resist layer composition and patterning process using the same | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2006-10-19 | — | — | US | disclosed |
| US-20060204891-A1 | Etching resistance; novolak resin having a fluorene or tetrahydrospirobiindene structure, an organic solvent, an acid generator, and a crosslinker, optionally combined with an intermediate layer having an antireflective effect | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2006-09-14 | — | — | US | disclosed |
| US-20060046065-A1 | Optical unit using plastic lenses | FUJI PHOTO FILM CO., LTD. | 2006-03-02 | — | — | US | disclosed |
| US-20060019195-A1 | Photoresist undercoat-forming material and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2006-01-26 | — | — | US | disclosed |
| US-6080522-A | CONTAINING PHOTORESIST AND POLYMER | CLARIANT INTERNAITONAL, LTD. (CH) | 2000-06-27 | — | — | US | disclosed |
| US-6028161-A | EXCELLENT TRANSPARENCY, HEAT RESISTANCE AND MECHANICAL PROPERTIES AND A LOW BIREFRINGENCE, MELT FLUIDITY AND MOLDABILITY; AN OPTICAL DISK, LENS AND AN OPTICAL FIBER | MITSUI CHEMICALS, INC. (JP) | 2000-02-22 | — | — | US | disclosed |
| EP-0926180-A2 | A polycarbonate copolymer and applications thereof | Mitsui Chemicals, Inc. (JP) | 1999-06-30 | — | — | EP | disclosed |
| EP-0922998-A1 | RADIATION-SENSITIVE RESIST COMPOSITION WITH HIGH HEAT RESISTANCE | Clariant International Ltd. (CH) | 1999-06-16 | — | — | EP | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-20240116958-A1 | Compound For Forming Metal-Containing Film, Composition For Forming Metal-Containing Film, Patterning Process, And Semiconductor Photoresist Material | FEM1B, ASH2L, MSI2 | CYP3A4 4279/4885CHRM1 170/4885ALOX15 1487/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.