SCHEMBL21783784

SCHEMBL21783784

CC(=O)Nc1c(I)c(NC(C)=O)c(I)c(C(=O)OCC[N+](C)(C)C)c1I

nearest known ligand 0.47

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
LMNA P02545 4/20 0.47
CHRM5 P08912 6/20 0.43
CHRM1 P11229 6/20 0.43
CHRM3 P20309 6/20 0.43
CHRM2 P08172 5/20 0.43
CHRM4 P08173 5/20 0.43
CHRNB2 P17787 4/20 0.43
CHRNA4 P43681 4/20 0.43
SMN1; SMN2 Q16637 3/20 0.43
CHRNA7 P36544 3/20 0.43
HTR1A P08908 2/20 0.43
PGR P06401 1/20 0.43
TBXA2R P21731 1/20 0.43
CHRNB4 P30926 1/20 0.43
CHRNA3 P32297 1/20 0.43
CHRNA10 Q9GZZ6 1/20 0.43
CHRNA9 Q9UGM1 1/20 0.43
GALR3 O60755 2/20 0.42
GAA P10253 1/20 0.42
RAB9A P51151 1/20 0.42

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL9852571 0.83 LMNA (0.51) LMNASMN1; SMN2RAB9AMAPK1TSHR
SCHEMBL12845801 0.81 HPGD (0.51) LMNASMN1; SMN2RAB9ACYP2D6MAPK1
SCHEMBL332859 0.80 LMNA (0.54) LMNASMN1; SMN2GAAMAPK1MAPT
SCHEMBL9016334 0.78 LMNA (0.53) LMNASMN1; SMN2GAARAB9AMAPT
SCHEMBL8230945 0.78 LMNA (0.53) LMNASMN1; SMN2MAPTTSHR
SCHEMBL19756076 0.78 LMNA (0.46) LMNASMN1; SMN2RAB9AMAPK1TSHR
SCHEMBL6509195 0.78 LMNA (0.46) LMNASMN1; SMN2RAB9AMAPK1TSHR
SCHEMBL11859680 0.78 LMNA (0.46) LMNASMN1; SMN2RAB9AMAPK1MAPT
SCHEMBL17211607 0.78 LMNA (0.46) LMNASMN1; SMN2RAB9AMAPK1APEX1
SCHEMBL9407259 0.77 LMNA (0.45) LMNASMN1; SMN2RAB9AMAPK1ADRA1A

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 5 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-11835859-B2 Resist composition and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-12-05 US disclosed
US-11774853-B2 Resist composition and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-10-03 US disclosed
US-20230129578-A1 RESIST COMPOSITION AND PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-04-27 US disclosed
US-11187980-B2 Resist composition and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2021-11-30 US disclosed
US-20200073237-A1 RESIST COMPOSITION AND PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2020-03-05 US disclosed