SCHEMBL218214

SCHEMBL218214

Oc1cc(-c2ccccc2)cc(-c2ccccc2)c1

nearest known ligand 0.68

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
EGFR P00533 2/20 0.68
ABL1 P00519 2/20 0.65
ABCB1 P08183 2/20 0.65
BCR P11274 2/20 0.65
MMP3 P08254 1/20 0.60
BCL2L1 Q07817 1/20 0.60
ESR1 P03372 4/20 0.55
HSD17B1 P14061 3/20 0.55
HSD17B2 P37059 3/20 0.55
MEN1 O00255 2/20 0.55
KMT2A Q03164 2/20 0.55
CYP3A4 P08684 1/20 0.55
CYP2C9 P11712 1/20 0.55
CRHBP P24387 1/20 0.54
CRHR2 Q13324 1/20 0.54
ALDH1A1 P00352 2/20 0.53
ESR2 Q92731 2/20 0.50
ALOX5 P09917 2/20 0.50
BACE1 P56817 1/20 0.50
CA12 O43570 1/20 0.47

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL10005583 0.97 EGFR (0.72) EGFRABL1ABCB1BCRMMP3
SCHEMBL125927 0.94 ABL1 (0.65) EGFRABL1ABCB1BCRMMP3
SCHEMBL27433218 0.92 ABL1 (0.70) EGFRABL1ABCB1BCRMMP3
Phenol SCHEMBL4118231 0.88 CA12 (0.65) EGFRABL1ABCB1BCRMMP3
SCHEMBL4895266 0.88 HSD17B1 (0.60) EGFRABL1ABCB1BCRMMP3
SCHEMBL18612841 0.86 EGFR (0.60) EGFRABL1ABCB1BCRMMP3
SCHEMBL17156987 0.86 NOTUM (0.65) EGFRABL1ABCB1BCRMMP3
SCHEMBL15583815 0.86 MMP3 (0.83) EGFRABL1ABCB1BCRMMP3
SCHEMBL16581374 0.86 MMP3 (0.83) EGFRABL1ABCB1BCRMMP3
SCHEMBL20323044 0.86 MMP3 (0.83) EGFRABL1ABCB1BCRMMP3

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 477 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-111303150-A High-efficiency narrow-half-peak-width aggregation state luminescent material 苏州大学 2020-06-19 CN claimed
US-7303855-B2 Photoresist undercoat-forming material and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2007-12-04 US claimed
US-20060019195-A1 Photoresist undercoat-forming material and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2006-01-26 US claimed
US-5225270-A Blends with olefin elastomers ALLIED-SIGNAL INC. (US) 1993-07-06 US claimed
EP-4184248-B1 COMPOSITION FOR FORMING ORGANIC FILM, PATTERNING PROCESS, AND COMPOUND AND POLYMER FOR FORMING ORGANIC FILM SHINETSU CHEMICAL CO (JP) 2026-04-15 EP disclosed
US-12590173-B2 Composition, pattern forming method, semiconductor device, and method for manufacturing semiconductor device KIOXIA CORPORATION (JP) 2026-03-31 US disclosed
US-12584023-B2 Composition for forming organic film, patterning process, and compound SHIN-ETSU CHEMICAL CO., LTD. (JP) 2026-03-24 US disclosed
EP-4398037-B1 COMPOUND FOR FORMING METAL-CONTAINING FILM, COMPOSITION FOR FORMING METAL-CONTAINING FILM, AND PATTERNING PROCESS SHINETSU CHEMICAL CO (JP) 2026-01-21 EP disclosed
EP-4660703-A2 METAL-CONTAINING FILM PATTERNING PROCESS Shin-Etsu Chemical Co., Ltd. (JP) 2025-12-10 EP disclosed
EP-4239408-B1 COMPOSITION FOR FORMING ORGANIC FILM, PATTERNING PROCESS, AND COMPOUND SHINETSU CHEMICAL CO (JP) 2025-12-10 EP disclosed
US-20250372377-A1 METAL-CONTAINING FILM PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2025-12-04 US disclosed
US-12441712-B2 Material for forming organic film, patterning process, and compound SHIN-ETSU CHEMICAL CO., LTD. (JP) 2025-10-14 US disclosed
US-4539578-A COLORLESS DYE, ELECTRON ACCEPTOR FUJI PHOTO FILM CO., LTD. (JP) 1985-09-03 US disclosed
EP-0056283-B1 ION SENSOR TERUMO CORPORATION (JP) 1985-07-31 EP disclosed
US-4507194-A COATING A SUBSTRATE WITH A SILVER COMPLEX POLYMER TERUMO KABUSHIKI KAISHA (JP) 1985-03-26 US disclosed
EP-0100988-A1 Reference electrode TERUMO KABUSHIKI KAISHA trading as TERUMO CORPORATION (JP) 1984-02-22 EP disclosed
EP-0056283-A1 Ion sensor TERUMO CORPORATION (JP) 1982-07-21 EP disclosed
US-4284830-A Monohalogenation of substituted phenol PHILLIPS PETROLEUM CO. (US) 1981-08-18 US disclosed
US-4064179-A CHEMICAL INTERMEDIATES GENERAL ELECTRIC COMPANY (US) 1977-12-20 US disclosed
US-3952063-A Process for the preparation of an organomercaptophenol from sulfur, a phenol, and an activated olefin or an epoxy compound GENERAL ELECTRIC COMPANY (US) 1976-04-20 US disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (3 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-12584023-B2 Composition for forming organic film, patterning process, and compound F12, MLX, F11 EGFR 2904/4885ABL1 4147/4885ABCB1 3533/4885
US-12441712-B2 Material for forming organic film, patterning process, and compound OR10J3, CDH1, EPCAM EGFR 3057/4885ABL1 433/4885ABCB1 1636/4885
US-12590173-B2 Composition, pattern forming method, semiconductor device, and method for manufacturing semiconductor device TET2, SDC2, TST EGFR 3052/4885ABL1 349/4885ABCB1 3673/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.