SCHEMBL2204407

SCHEMBL2204407

NC(=O)OC1(Cc2ccccc2)CCCCC1[N+](=O)[O-]

nearest known ligand 0.36

Predicted protein targets (top 17)

geneUniProtsupporting neighboursconfidence
ALDH1A1 P00352 3/20 0.36
LMNA P02545 2/20 0.36
KDM4E B2RXH2 2/20 0.36
EPHX1 P07099 2/20 0.35
HPGD P15428 1/20 0.35
EPHX2 P34913 1/20 0.35
SMN1; SMN2 Q16637 1/20 0.34
ADRB2 P07550 1/20 0.34
HTT P42858 1/20 0.34
CTSL P07711 2/20 0.33
CTSB P07858 2/20 0.33
CTSK P43235 2/20 0.33
MEN1 O00255 1/20 0.33
KMT2A Q03164 1/20 0.33
DPP4 P27487 1/20 0.33
HSD11B1 P28845 1/20 0.33
TAAR1 Q96RJ0 1/20 0.33

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL27847679 0.75 MAOA (0.36) ALDH1A1KDM4EEPHX1HPGDEPHX2
SCHEMBL7531427 0.72 CTSK (0.50) ALDH1A1LMNAADRB2HTTCTSL
SCHEMBL28951054 0.70 CTSK (0.49) ALDH1A1LMNAADRB2HTTCTSL
SCHEMBL28948259 0.70 KMT2A (0.34) ALDH1A1KDM4ESMN1; SMN2MEN1KMT2A
SCHEMBL6583966 0.69 HSD11B1 (0.38) ALDH1A1SMN1; SMN2ADRB2HTTDPP4
SCHEMBL7694908 0.68
Carbamic Acid SCHEMBL16174718 0.67 ALDH1A1 (0.43) ALDH1A1KDM4EADRB2HTTHSD11B1
SCHEMBL3246146 0.65 DPP4 (0.37) ALDH1A1LMNASMN1; SMN2DPP4HSD11B1
SCHEMBL3246147 0.65 DPP4 (0.37) ALDH1A1LMNASMN1; SMN2DPP4HSD11B1
SCHEMBL3246143 0.65 DPP4 (0.37) ALDH1A1LMNASMN1; SMN2DPP4HSD11B1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 21 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-11796919-B2 Resist pattern formation method OSAKA UNIVERSITY (JP) 2023-10-24 US disclosed
US-20210216016-A1 RESIST PATTERN FORMATION METHOD OSAKA UNIVERSITY (JP) 2021-07-15 US disclosed
EP-3159737-B1 LIQUID CRYSTAL DISPLAY ELEMENT, LIQUID CRYSTAL ALIGNMENT FILM, AND LIQUID CRYSTAL ALIGNMENT TREATMENT AGENT NISSAN CHEMICAL CORP (JP) 2021-05-26 EP disclosed
EP-3809206-A1 RESIST PATTERN FORMATION METHOD Osaka University (JP) 2021-04-21 EP disclosed
US-10647816-B2 Liquid crystal display device NISSAN CHEMICAL INDUSTRIES, LTD. (JP) 2020-05-12 US disclosed
EP-3200022-B1 LIQUID CRYSTAL DISPLAY DEVICE NISSAN CHEMICAL CORP (JP) 2019-06-26 EP disclosed
US-20170247513-A1 LCD ELEMENT NISSAN CHEMMICAL INDUSTRIES, LTD. (JP) 2017-08-31 US disclosed
EP-3200022-A1 LIQUID CRYSTAL DISPLAY ELEMENT Nissan Chemical Industries, Ltd. (JP) 2017-08-02 EP disclosed
US-20170184923-A1 LIQUID CRYSTAL DISPLAY ELEMENT, LIQUID CRYSTAL ALIGNMENT FILM, AND LIQUID CRYSTAL ALIGNMENT TREATMENT AGENT NISSAN CHEMICAL INDUSTRIES, LTD. (JP) 2017-06-29 US disclosed
EP-3159737-A1 LIQUID CRYSTAL DISPLAY ELEMENT, LIQUID CRYSTAL ALIGNMENT FILM, AND LIQUID CRYSTAL ALIGNMENT TREATMENT AGENT Nissan Chemical Industries, Ltd. (JP) 2017-04-26 EP disclosed
US-7977028-B2 Photosensitive resin composition and adhesion promoter TORAY INDUSTRIES, INC. (JP) 2011-07-12 US disclosed
US-20090123867-A1 PHOTOSENSITIVE RESIN COMPOSITION AND ADHESION PROMOTER TORAY INDUSTRIES, INC. (JP) 2009-05-14 US disclosed
EP-1909142-A1 PHOTOSENSITIVE RESIN COMPOSITION AND ADHESION ENHANCER TORAY INDUSTRIES, INC. (JP) 2008-04-09 EP disclosed
US-7212341-B2 Antireflection film, and image display device FUJIFILM CORPORATION (JP) 2007-05-01 US disclosed
US-6873387-B2 Antireflection film, sheet polarizer and liquid crystal display device FUJI PHOTO FILM CO., LTD. (JP) 2005-03-29 US disclosed
US-20040156110-A1 Antireflection film, and image display device FUJIFILM CORPORATION (JP) 2004-08-12 US disclosed
EP-0633502-B1 PATTERN FORMING MATERIAL CLARIANT FINANCE BVI LTD (VG) 2002-03-20 EP disclosed
US-20010050741-A1 Antireflection film, sheet polarizer and liquid crystal display device FUJIFILM CORPORATION (JP) 2001-12-13 US disclosed
US-5691100-A SEMICONDUCTORS HOECHST JAPAN LIMITED (JP) 1997-11-25 US disclosed
EP-0633502-A1 PATTERN FORMING MATERIAL HOECHST JAPAN LIMITED (JP) 1995-01-11 EP disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-20090123867-A1 PHOTOSENSITIVE RESIN COMPOSITION AND ADHESION PROMOTER PCNA, TERB1, SMC2 ALDH1A1 1144/4885LMNA 1926/4885KDM4E 151/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.